SG120965A1 - Lithographic apparatus, device manufacturing method, and device manufactured thereby - Google Patents

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Info

Publication number
SG120965A1
SG120965A1 SG200307146A SG200307146A SG120965A1 SG 120965 A1 SG120965 A1 SG 120965A1 SG 200307146 A SG200307146 A SG 200307146A SG 200307146 A SG200307146 A SG 200307146A SG 120965 A1 SG120965 A1 SG 120965A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
device manufacturing
manufactured
device manufactured
manufacturing
Prior art date
Application number
SG200307146A
Other languages
English (en)
Inventor
Van De Marcus Adrianus Kerkhof
De Wilhelmus Petrus Boeij
Marcel Maurice Hemerik
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG120965A1 publication Critical patent/SG120965A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/58—Photometry, e.g. photographic exposure meter using luminescence generated by light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Radiation (AREA)
  • Optical Filters (AREA)
SG200307146A 2002-12-04 2003-12-03 Lithographic apparatus, device manufacturing method, and device manufactured thereby SG120965A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02080107A EP1426824A1 (en) 2002-12-04 2002-12-04 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Publications (1)

Publication Number Publication Date
SG120965A1 true SG120965A1 (en) 2006-04-26

Family

ID=32309445

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200307146A SG120965A1 (en) 2002-12-04 2003-12-03 Lithographic apparatus, device manufacturing method, and device manufactured thereby

Country Status (7)

Country Link
US (1) US6906787B2 (ko)
EP (1) EP1426824A1 (ko)
JP (1) JP3986495B2 (ko)
KR (1) KR100586910B1 (ko)
CN (1) CN100520580C (ko)
SG (1) SG120965A1 (ko)
TW (1) TWI261149B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1530091A1 (en) * 2003-11-07 2005-05-11 ASML Netherlands B.V. Radiation detector
US7863763B2 (en) * 2005-11-22 2011-01-04 Asml Netherlands B.V. Binary sinusoidal sub-wavelength gratings as alignment marks
JP2009250904A (ja) * 2008-04-10 2009-10-29 Jeol Ltd 検査装置及び検査方法
NL2003157A1 (nl) 2008-07-11 2010-01-12 Asml Netherlands Bv Radiation source, lithographic apparatus, and device manufacturing method.
JP5689059B2 (ja) * 2008-08-14 2015-03-25 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ、放射源モジュール、リソグラフィ装置およびデバイス製造方法
WO2010124910A1 (en) * 2009-04-27 2010-11-04 Asml Netherlands B.V. Lithographic apparatus and detector apparatus
JP5657352B2 (ja) * 2010-11-10 2015-01-21 株式会社東芝 露光量評価方法および反射型基板
JP6336124B2 (ja) * 2014-05-07 2018-06-06 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用のダイヤモンドベースの監視装置、およびダイヤモンドベースの監視装置を備えるリソグラフィ装置
KR20200039000A (ko) * 2017-09-18 2020-04-14 에이에스엠엘 네델란즈 비.브이. 빔 이미지 시스템용 스위치 매트릭스 디자인

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19724903A1 (de) * 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
AU2184799A (en) * 1998-01-29 1999-08-16 Nikon Corporation Illumination meter and exposure system
US6327284B1 (en) * 1998-10-14 2001-12-04 Lambda Physik Ag Detector with frequency converting coating
JP2000205966A (ja) * 1999-01-20 2000-07-28 Komatsu Ltd 真空紫外レ―ザの波長測定装置
DE19936000A1 (de) * 1999-07-30 2001-02-08 Osram Opto Semiconductors Gmbh UV-Photodetektor mit verbesserter Empfindlichkeit
EP1566695B1 (en) * 2000-08-25 2007-10-31 ASML Netherlands B.V. Lithographic apparatus
JP3564104B2 (ja) * 2002-01-29 2004-09-08 キヤノン株式会社 露光装置及びその制御方法、これを用いたデバイスの製造方法

Also Published As

Publication number Publication date
CN100520580C (zh) 2009-07-29
JP3986495B2 (ja) 2007-10-03
US6906787B2 (en) 2005-06-14
TWI261149B (en) 2006-09-01
CN1504831A (zh) 2004-06-16
KR20040048859A (ko) 2004-06-10
TW200422784A (en) 2004-11-01
JP2004186691A (ja) 2004-07-02
EP1426824A1 (en) 2004-06-09
KR100586910B1 (ko) 2006-06-07
US20040114120A1 (en) 2004-06-17

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