SG11202007897UA - Sputtering target material - Google Patents

Sputtering target material

Info

Publication number
SG11202007897UA
SG11202007897UA SG11202007897UA SG11202007897UA SG11202007897UA SG 11202007897U A SG11202007897U A SG 11202007897UA SG 11202007897U A SG11202007897U A SG 11202007897UA SG 11202007897U A SG11202007897U A SG 11202007897UA SG 11202007897U A SG11202007897U A SG 11202007897UA
Authority
SG
Singapore
Prior art keywords
target material
sputtering target
sputtering
target
Prior art date
Application number
SG11202007897UA
Inventor
Yumeki SHINMURA
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG11202007897UA publication Critical patent/SG11202007897UA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
SG11202007897UA 2018-02-19 2019-02-08 Sputtering target material SG11202007897UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018026578A JP6814758B2 (en) 2018-02-19 2018-02-19 Sputtering target
PCT/JP2019/004750 WO2019159856A1 (en) 2018-02-19 2019-02-08 Sputtering target material

Publications (1)

Publication Number Publication Date
SG11202007897UA true SG11202007897UA (en) 2020-09-29

Family

ID=67619052

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202007897UA SG11202007897UA (en) 2018-02-19 2019-02-08 Sputtering target material

Country Status (5)

Country Link
JP (1) JP6814758B2 (en)
CN (1) CN111712587A (en)
SG (1) SG11202007897UA (en)
TW (1) TW201936938A (en)
WO (1) WO2019159856A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT15220U1 (en) * 2016-03-07 2017-03-15 Ceratizit Austria Gmbh Process for producing a hard material layer on a substrate, hard material layer, cutting tool and coating source
CN112404443A (en) * 2020-11-25 2021-02-26 河南东微电子材料有限公司 Preparation method of chromium-tantalum-boron alloy powder

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04308080A (en) * 1991-04-02 1992-10-30 Hitachi Metals Ltd Co-cr-ta alloy target and production thereof
JP2911675B2 (en) * 1992-04-07 1999-06-23 功二 橋本 High temperature corrosion resistant amorphous alloy
JP2000057554A (en) * 1998-08-18 2000-02-25 Mitsubishi Chemicals Corp Magnetic disk
JP2000232206A (en) * 1999-02-09 2000-08-22 Oki Electric Ind Co Ltd Ferroelectric memory
JP2001131673A (en) * 1999-11-05 2001-05-15 Sony Corp Electronic thin film material, dielectric capacitor and nonvolatile memory
JP2002260218A (en) * 2001-03-05 2002-09-13 Anelva Corp Magnetic recording disk and its manufacturing method and device
JP2004039196A (en) * 2002-07-08 2004-02-05 Showa Denko Kk Magnetic recording medium, its manufacturing method, and magnetic recording/reproducing device
JP4331182B2 (en) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 Soft magnetic target material
JP6180755B2 (en) * 2013-02-25 2017-08-16 山陽特殊製鋼株式会社 Cr alloy for magnetic recording, target material for sputtering, and perpendicular magnetic recording medium using them
CN105473758B (en) * 2013-10-07 2018-02-27 三菱综合材料株式会社 Sputtering target and its manufacture method
JPWO2016052371A1 (en) * 2014-09-30 2017-06-08 Ｊｘ金属株式会社 Mother alloy for sputtering target and method for producing sputtering target
AT15220U1 (en) * 2016-03-07 2017-03-15 Ceratizit Austria Gmbh Process for producing a hard material layer on a substrate, hard material layer, cutting tool and coating source

Also Published As

Publication number Publication date
TW201936938A (en) 2019-09-16
CN111712587A (en) 2020-09-25
JP2019143179A (en) 2019-08-29
WO2019159856A1 (en) 2019-08-22
JP6814758B2 (en) 2021-01-20

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