SG11202007033WA - Wafer treatment apparatus and method for treating wafer - Google Patents

Wafer treatment apparatus and method for treating wafer

Info

Publication number
SG11202007033WA
SG11202007033WA SG11202007033WA SG11202007033WA SG11202007033WA SG 11202007033W A SG11202007033W A SG 11202007033WA SG 11202007033W A SG11202007033W A SG 11202007033WA SG 11202007033W A SG11202007033W A SG 11202007033WA SG 11202007033W A SG11202007033W A SG 11202007033WA
Authority
SG
Singapore
Prior art keywords
wafer
treatment apparatus
treating
wafer treatment
treating wafer
Prior art date
Application number
SG11202007033WA
Inventor
Kensaku Igarashi
Tatsuo Abe
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of SG11202007033WA publication Critical patent/SG11202007033WA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02098—Cleaning only involving lasers, e.g. laser ablation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/18—Drying solid materials or objects by processes involving the application of heat by conduction, i.e. the heat is conveyed from the heat source, e.g. gas flame, to the materials or objects to be dried by direct contact
    • F26B3/22—Drying solid materials or objects by processes involving the application of heat by conduction, i.e. the heat is conveyed from the heat source, e.g. gas flame, to the materials or objects to be dried by direct contact the heat source and the materials or objects to be dried being in relative motion, e.g. of vibration
    • F26B3/24—Drying solid materials or objects by processes involving the application of heat by conduction, i.e. the heat is conveyed from the heat source, e.g. gas flame, to the materials or objects to be dried by direct contact the heat source and the materials or objects to be dried being in relative motion, e.g. of vibration the movement being rotation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
SG11202007033WA 2018-03-13 2019-02-26 Wafer treatment apparatus and method for treating wafer SG11202007033WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018046043A JP6525080B1 (en) 2018-03-13 2018-03-13 Wafer processing apparatus and processing method
PCT/JP2019/007375 WO2019176531A1 (en) 2018-03-13 2019-02-26 Wafer treatment device and treatment method

Publications (1)

Publication Number Publication Date
SG11202007033WA true SG11202007033WA (en) 2020-08-28

Family

ID=66730601

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202007033WA SG11202007033WA (en) 2018-03-13 2019-02-26 Wafer treatment apparatus and method for treating wafer

Country Status (8)

Country Link
US (1) US20210013031A1 (en)
EP (1) EP3767665A4 (en)
JP (1) JP6525080B1 (en)
KR (1) KR102639128B1 (en)
CN (1) CN111684572A (en)
SG (1) SG11202007033WA (en)
TW (1) TWI801515B (en)
WO (1) WO2019176531A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023045820A (en) * 2021-09-22 2023-04-03 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing device and substrate processing method
WO2023127796A1 (en) * 2021-12-28 2023-07-06 京セラ株式会社 Clamping jig and cleaning device
CN114378031A (en) * 2021-12-31 2022-04-22 江苏启微半导体设备有限公司 Single wafer type wafer cleaning device
CN116344407B (en) * 2023-04-16 2023-09-29 苏州冠礼科技有限公司 Drying equipment after wafer etching and cleaning

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2862754B2 (en) * 1993-04-19 1999-03-03 東京エレクトロン株式会社 Processing device and rotating member
JPH08124844A (en) * 1994-10-27 1996-05-17 Sony Corp Wafer stage
JP2000332085A (en) * 1999-05-19 2000-11-30 Sony Corp Wafer-clamping apparatus
WO2001084621A1 (en) * 2000-04-27 2001-11-08 Ebara Corporation Rotation holding device and semiconductor substrate processing device
JP3846697B2 (en) * 2001-08-14 2006-11-15 大日本スクリーン製造株式会社 Substrate processing equipment
JP4025030B2 (en) * 2001-04-17 2007-12-19 東京エレクトロン株式会社 Substrate processing apparatus and transfer arm
JP2003092278A (en) * 2001-09-18 2003-03-28 Shibaura Mechatronics Corp Apparatus and method for treatment of substrate
JP2004014602A (en) * 2002-06-04 2004-01-15 Sharp Corp Rotating application apparatus
JP2004037234A (en) * 2002-07-03 2004-02-05 Fuji Photo Film Co Ltd Substrate holding-device
JP2004071680A (en) * 2002-08-02 2004-03-04 Dainippon Printing Co Ltd Rotary placement table
JP2007307533A (en) * 2006-05-22 2007-11-29 Sharp Corp Washing device
KR100831988B1 (en) * 2006-06-02 2008-05-23 세메스 주식회사 Spin head and method for holding/unholding wafer using the spin head
KR20070121485A (en) * 2006-06-21 2007-12-27 주식회사 에스앤에스텍 Plate cleaning apparatus and method of cleaning plate
JP2008060107A (en) 2006-08-29 2008-03-13 Toshiba Matsushita Display Technology Co Ltd Spin cleaner
JP2015170639A (en) * 2014-03-05 2015-09-28 株式会社Ｓｃｒｅｅｎホールディングス Substrate drying apparatus and substrate drying method
JP6482402B2 (en) * 2015-06-19 2019-03-13 信越半導体株式会社 Single wafer cleaning apparatus and wafer cleaning method
JP6459801B2 (en) * 2015-06-26 2019-01-30 株式会社Sumco Epitaxial silicon wafer manufacturing method
KR102102320B1 (en) * 2016-06-28 2020-04-22 주식회사 원익아이피에스 Wafer Processing Apparatus And Method of depositing Thin film Using The Same

Also Published As

Publication number Publication date
JP2019161022A (en) 2019-09-19
CN111684572A (en) 2020-09-18
JP6525080B1 (en) 2019-06-05
TW201938280A (en) 2019-10-01
TWI801515B (en) 2023-05-11
WO2019176531A1 (en) 2019-09-19
KR102639128B1 (en) 2024-02-22
KR20200130251A (en) 2020-11-18
EP3767665A1 (en) 2021-01-20
EP3767665A4 (en) 2021-11-17
US20210013031A1 (en) 2021-01-14

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