SG11202006936RA - Cleaning components and methods in a plating system - Google Patents

Cleaning components and methods in a plating system

Info

Publication number
SG11202006936RA
SG11202006936RA SG11202006936RA SG11202006936RA SG11202006936RA SG 11202006936R A SG11202006936R A SG 11202006936RA SG 11202006936R A SG11202006936R A SG 11202006936RA SG 11202006936R A SG11202006936R A SG 11202006936RA SG 11202006936R A SG11202006936R A SG 11202006936RA
Authority
SG
Singapore
Prior art keywords
methods
plating system
cleaning components
cleaning
components
Prior art date
Application number
SG11202006936RA
Inventor
Kyle M Hanson
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11202006936RA publication Critical patent/SG11202006936RA/en

Links

Classifications

    • B08B1/20—
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • B08B9/0936—Cleaning containers, e.g. tanks by the force of jets or sprays using rotating jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004—Sealing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/08—Rinsing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
SG11202006936RA 2018-02-01 2019-01-30 Cleaning components and methods in a plating system SG11202006936RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862625277P 2018-02-01 2018-02-01
PCT/US2019/015910 WO2019152555A1 (en) 2018-02-01 2019-01-30 Cleaning components and methods in a plating system

Publications (1)

Publication Number Publication Date
SG11202006936RA true SG11202006936RA (en) 2020-08-28

Family

ID=67391903

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202006936RA SG11202006936RA (en) 2018-02-01 2019-01-30 Cleaning components and methods in a plating system

Country Status (6)

Country Link
US (1) US11214890B2 (en)
KR (1) KR102454873B1 (en)
CN (1) CN111655910B (en)
SG (1) SG11202006936RA (en)
TW (1) TWI723337B (en)
WO (1) WO2019152555A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230340687A1 (en) * 2021-03-17 2023-10-26 Ebara Corporation Plating apparatus and cleaning method of contact member of plating apparatus
CN113930835A (en) * 2021-11-25 2022-01-14 博罗县环贸精密电镀有限公司 A belt cleaning device for plating bath is automatic

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6186873B1 (en) * 2000-04-14 2001-02-13 International Business Machines Corporation Wafer edge cleaning
JP3284496B2 (en) * 2000-08-09 2002-05-20 株式会社荏原製作所 Plating apparatus and plating solution removal method
US7029567B2 (en) * 2001-12-21 2006-04-18 Asm Nutool, Inc. Electrochemical edge and bevel cleaning process and system
TWI355298B (en) * 2004-01-26 2012-01-01 Applied Materials Inc Apparatus for electroless deposition of metals ont
CN101389415A (en) * 2006-02-22 2009-03-18 赛迈有限公司 Single side workpiece processing
US8371316B2 (en) * 2009-12-03 2013-02-12 International Test Solutions, Inc. Apparatuses, device, and methods for cleaning tester interface contact elements and support hardware
US9309603B2 (en) * 2011-09-14 2016-04-12 Applied Materials, Inc Component cleaning in a metal plating apparatus
SG11201406133WA (en) * 2012-03-28 2014-10-30 Novellus Systems Inc Methods and apparatuses for cleaning electroplating substrate holders
TWI609100B (en) * 2012-03-30 2017-12-21 諾發系統有限公司 Cleaning electroplating substrate holders using reverse current deplating
JP2015062956A (en) * 2012-09-19 2015-04-09 株式会社荏原製作所 Polishing device
US10416092B2 (en) * 2013-02-15 2019-09-17 Lam Research Corporation Remote detection of plating on wafer holding apparatus
US9399827B2 (en) * 2013-04-29 2016-07-26 Applied Materials, Inc. Microelectronic substrate electro processing system
KR101620420B1 (en) * 2014-09-16 2016-05-12 주식회사 포스코 Apparatus and method for cleaning of roll
US10047453B2 (en) * 2015-05-26 2018-08-14 Applied Materials, Inc. Electroplating apparatus
US10307798B2 (en) * 2015-08-28 2019-06-04 Taiwan Semiconducter Manufacturing Company Limited Cleaning device for cleaning electroplating substrate holder

Also Published As

Publication number Publication date
CN111655910A (en) 2020-09-11
WO2019152555A1 (en) 2019-08-08
TWI723337B (en) 2021-04-01
CN111655910B (en) 2022-07-22
US20190233966A1 (en) 2019-08-01
TW201941837A (en) 2019-11-01
US11214890B2 (en) 2022-01-04
KR20200104944A (en) 2020-09-04
KR102454873B1 (en) 2022-10-13

Similar Documents

Publication Publication Date Title
IL274749B (en) Hand washing system and method
ZA202003999B (en) System and methods
SG10201705206QA (en) Cleaning apparatus, plating apparatus using the same, and cleaning method
SG11202007483TA (en) Device and method for use in cleaning a facade
GB202003743D0 (en) Systems and methods for tank cleaning
EP3823508C0 (en) Cleaning apparatus and cleaning system
SG11202005931XA (en) Local interaction systems and methods
EP3718652C0 (en) Cleaning method and cleaning device
GB201509404D0 (en) Ultrasonic pre-cleaning bath and method
GB2581943B (en) Interactive systems and methods
IL284494A (en) Method and apparatus for deposition cleaning in a pumping line
SG11202011564RA (en) Electroplating apparatus and electroplating method
PL3737257T3 (en) Shaving system with shaving device and cleaning device
SG11202006936RA (en) Cleaning components and methods in a plating system
ZA202107916B (en) Pulse delivery cleaning systems and methods
IL266849A (en) System and method for use in photoplethysmography
SG11202106509UA (en) Plating apparatus and plating method
GB201817362D0 (en) Circuitry and method
GB201803129D0 (en) Method in liquid chiromatorgraphy
GB2564012B (en) System and method for cleaning a receptacle
GB201803519D0 (en) Improvements in frying technology
EP3820344C0 (en) Bucket and cleaning system comprising such a bucket
EP3863857C0 (en) Cleaning system and method
IL244917A0 (en) A modular seating system and a seating unit
GB201602300D0 (en) a method and an arrangement in a flow system