SG11202006652PA - Semiconductor equipment - Google Patents
Semiconductor equipmentInfo
- Publication number
- SG11202006652PA SG11202006652PA SG11202006652PA SG11202006652PA SG11202006652PA SG 11202006652P A SG11202006652P A SG 11202006652PA SG 11202006652P A SG11202006652P A SG 11202006652PA SG 11202006652P A SG11202006652P A SG 11202006652PA SG 11202006652P A SG11202006652P A SG 11202006652PA
- Authority
- SG
- Singapore
- Prior art keywords
- semiconductor equipment
- semiconductor
- equipment
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810043867.3A CN108461417A (en) | 2018-01-17 | 2018-01-17 | Semiconductor equipment |
CN201820074885.3U CN207818535U (en) | 2018-01-17 | 2018-01-17 | Semiconductor equipment |
PCT/CN2018/114600 WO2019140989A1 (en) | 2018-01-17 | 2018-11-08 | Semiconductor equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202006652PA true SG11202006652PA (en) | 2020-08-28 |
Family
ID=67301264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202006652PA SG11202006652PA (en) | 2018-01-17 | 2018-11-08 | Semiconductor equipment |
Country Status (2)
Country | Link |
---|---|
SG (1) | SG11202006652PA (en) |
WO (1) | WO2019140989A1 (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7566900B2 (en) * | 2005-08-31 | 2009-07-28 | Applied Materials, Inc. | Integrated metrology tools for monitoring and controlling large area substrate processing chambers |
US20100162955A1 (en) * | 2008-12-31 | 2010-07-01 | Lawrence Chung-Lai Lei | Systems and methods for substrate processing |
US20110097878A1 (en) * | 2009-10-28 | 2011-04-28 | Applied Materials, Inc. | Chamber for pecvd |
CN207818535U (en) * | 2018-01-17 | 2018-09-04 | 北京北方华创微电子装备有限公司 | Semiconductor equipment |
CN108461417A (en) * | 2018-01-17 | 2018-08-28 | 北京北方华创微电子装备有限公司 | Semiconductor equipment |
CN108281414A (en) * | 2018-01-17 | 2018-07-13 | 北京北方华创微电子装备有限公司 | A kind of capacitance and preparation method thereof, semiconductor equipment |
-
2018
- 2018-11-08 SG SG11202006652PA patent/SG11202006652PA/en unknown
- 2018-11-08 WO PCT/CN2018/114600 patent/WO2019140989A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2019140989A1 (en) | 2019-07-25 |
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