SG11202006623YA - Replaceable and/or collapsible edge ring assemblies for plasma sheath tuning incorporating edge ring positioning and centering features - Google Patents
Replaceable and/or collapsible edge ring assemblies for plasma sheath tuning incorporating edge ring positioning and centering featuresInfo
- Publication number
- SG11202006623YA SG11202006623YA SG11202006623YA SG11202006623YA SG11202006623YA SG 11202006623Y A SG11202006623Y A SG 11202006623YA SG 11202006623Y A SG11202006623Y A SG 11202006623YA SG 11202006623Y A SG11202006623Y A SG 11202006623YA SG 11202006623Y A SG11202006623Y A SG 11202006623YA
- Authority
- SG
- Singapore
- Prior art keywords
- edge ring
- replaceable
- tuning
- plasma sheath
- collapsible
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
- H01J37/32642—Focus rings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20221—Translation
- H01J2237/20235—Z movement or adjustment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862718112P | 2018-08-13 | 2018-08-13 | |
| PCT/US2018/050273 WO2020036613A1 (en) | 2018-08-13 | 2018-09-10 | Replaceable and/or collapsible edge ring assemblies for plasma sheath tuning incorporating edge ring positioning and centering features |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11202006623YA true SG11202006623YA (en) | 2020-08-28 |
Family
ID=69525639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11202006623YA SG11202006623YA (en) | 2018-08-13 | 2018-09-10 | Replaceable and/or collapsible edge ring assemblies for plasma sheath tuning incorporating edge ring positioning and centering features |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US11798789B2 (en) |
| EP (1) | EP3837713A4 (en) |
| JP (4) | JP6859426B2 (en) |
| KR (3) | KR20230106754A (en) |
| CN (1) | CN111052344B (en) |
| SG (1) | SG11202006623YA (en) |
| TW (3) | TWI757848B (en) |
| WO (1) | WO2020036613A1 (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7105666B2 (en) * | 2018-09-26 | 2022-07-25 | 東京エレクトロン株式会社 | Plasma processing equipment |
| JP7134104B2 (en) * | 2019-01-09 | 2022-09-09 | 東京エレクトロン株式会社 | Plasma processing apparatus and mounting table for plasma processing apparatus |
| US12009236B2 (en) * | 2019-04-22 | 2024-06-11 | Applied Materials, Inc. | Sensors and system for in-situ edge ring erosion monitor |
| JP7321026B2 (en) * | 2019-08-02 | 2023-08-04 | 東京エレクトロン株式会社 | EDGE RING, PLACE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD |
| JP2021040011A (en) * | 2019-09-02 | 2021-03-11 | キオクシア株式会社 | Plasma processing apparatus |
| CN112563186A (en) * | 2019-09-26 | 2021-03-26 | 东京毅力科创株式会社 | Substrate holder and plasma processing apparatus |
| KR20210042749A (en) * | 2019-10-10 | 2021-04-20 | 삼성전자주식회사 | Electro-static chuck and substrate processing apparatus including the same |
| CN112701027A (en) * | 2019-10-22 | 2021-04-23 | 夏泰鑫半导体(青岛)有限公司 | Plasma processing apparatus and method for replacing edge ring |
| TW202137326A (en) * | 2020-03-03 | 2021-10-01 | 日商東京威力科創股份有限公司 | Substrate support, plasma processing system, and method of placing annular member |
| KR20220156915A (en) * | 2020-03-23 | 2022-11-28 | 램 리써치 코포레이션 | High Precision Edge Ring Centering for Substrate Processing Systems |
| CN112397366B (en) | 2020-11-05 | 2023-07-14 | 北京北方华创微电子装备有限公司 | Bearing device and semiconductor reaction chamber |
| WO2022108789A1 (en) * | 2020-11-19 | 2022-05-27 | Applied Materials, Inc. | Ring for substrate extreme edge protection |
| KR102327270B1 (en) * | 2020-12-03 | 2021-11-17 | 피에스케이 주식회사 | Support unit, apparatus for treating a substrate and method for treating a substrate |
| KR20220090894A (en) * | 2020-12-23 | 2022-06-30 | 세메스 주식회사 | Focus ring and apparatus for processing a substrate including a focus ring |
| CN112857647B (en) * | 2021-03-25 | 2023-01-03 | 哈尔滨工程大学 | Piston ring circumference elasticity detection device |
| KR102491002B1 (en) * | 2021-06-28 | 2023-01-27 | 세메스 주식회사 | A ring member and an apparatus for treating a substrate with the ring member |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US6003185A (en) * | 1994-07-15 | 1999-12-21 | Ontrak Systems, Inc. | Hesitation free roller |
| DE69813014T2 (en) | 1997-11-03 | 2004-02-12 | Asm America Inc., Phoenix | IMPROVED SMALL WAFERHALL EQUIPMENT |
| US6048403A (en) * | 1998-04-01 | 2000-04-11 | Applied Materials, Inc. | Multi-ledge substrate support for a thermal processing chamber |
| JP3076791B2 (en) | 1998-10-19 | 2000-08-14 | アプライド マテリアルズ インコーポレイテッド | Semiconductor manufacturing equipment |
| JP4592849B2 (en) | 1999-10-29 | 2010-12-08 | アプライド マテリアルズ インコーポレイテッド | Semiconductor manufacturing equipment |
| US7311784B2 (en) | 2002-11-26 | 2007-12-25 | Tokyo Electron Limited | Plasma processing device |
| US20070032081A1 (en) * | 2005-08-08 | 2007-02-08 | Jeremy Chang | Edge ring assembly with dielectric spacer ring |
| US7875824B2 (en) | 2006-10-16 | 2011-01-25 | Lam Research Corporation | Quartz guard ring centering features |
| DE202010015933U1 (en) * | 2009-12-01 | 2011-03-31 | Lam Research Corp.(N.D.Ges.D.Staates Delaware), Fremont | An edge ring arrangement for plasma etching chambers |
| JP5584517B2 (en) * | 2010-05-12 | 2014-09-03 | 東京エレクトロン株式会社 | Plasma processing apparatus and semiconductor device manufacturing method |
| US20140017900A1 (en) * | 2011-03-29 | 2014-01-16 | Tokyo Electron Limited | Plasma etching apparatus and plasma etching method |
| KR102037542B1 (en) * | 2012-01-17 | 2019-10-28 | 도쿄엘렉트론가부시키가이샤 | Substrate mounting table and plasma treatment device |
| CN102610476B (en) * | 2012-03-12 | 2015-05-27 | 中微半导体设备(上海)有限公司 | Electrostatic chuck |
| US9948214B2 (en) | 2012-04-26 | 2018-04-17 | Applied Materials, Inc. | High temperature electrostatic chuck with real-time heat zone regulating capability |
| CN104299929A (en) | 2013-07-19 | 2015-01-21 | 朗姆研究公司 | Systems and methods for in-situ wafer edge and backside plasma cleaning |
| US20150020848A1 (en) | 2013-07-19 | 2015-01-22 | Lam Research Corporation | Systems and Methods for In-Situ Wafer Edge and Backside Plasma Cleaning |
| US10804081B2 (en) * | 2013-12-20 | 2020-10-13 | Lam Research Corporation | Edge ring dimensioned to extend lifetime of elastomer seal in a plasma processing chamber |
| US9865437B2 (en) | 2014-12-30 | 2018-01-09 | Applied Materials, Inc. | High conductance process kit |
| US10658222B2 (en) | 2015-01-16 | 2020-05-19 | Lam Research Corporation | Moveable edge coupling ring for edge process control during semiconductor wafer processing |
| CN108369922B (en) | 2016-01-26 | 2023-03-21 | 应用材料公司 | Wafer edge ring lifting solution |
| US11011353B2 (en) * | 2016-03-29 | 2021-05-18 | Lam Research Corporation | Systems and methods for performing edge ring characterization |
| DE102016212780A1 (en) | 2016-07-13 | 2018-01-18 | Siltronic Ag | Device for handling a semiconductor wafer in an epitaxial reactor and method for producing a semiconductor wafer with an epitaxial layer |
| US10410832B2 (en) | 2016-08-19 | 2019-09-10 | Lam Research Corporation | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment |
| JP6812224B2 (en) * | 2016-12-08 | 2021-01-13 | 東京エレクトロン株式会社 | Board processing equipment and mounting table |
| US10553404B2 (en) * | 2017-02-01 | 2020-02-04 | Applied Materials, Inc. | Adjustable extended electrode for edge uniformity control |
| TWM589358U (en) * | 2019-05-10 | 2020-01-11 | 美商蘭姆研究公司 | Semiconductor process module top ring |
| KR20220018014A (en) * | 2019-06-06 | 2022-02-14 | 램 리써치 코포레이션 | Automated transport of edge rings requiring rotational alignment |
| US11823937B2 (en) * | 2019-08-19 | 2023-11-21 | Applied Materials, Inc. | Calibration of an aligner station of a processing system |
| JP2021040011A (en) * | 2019-09-02 | 2021-03-11 | キオクシア株式会社 | Plasma processing apparatus |
| KR20210042749A (en) * | 2019-10-10 | 2021-04-20 | 삼성전자주식회사 | Electro-static chuck and substrate processing apparatus including the same |
| US11759954B2 (en) * | 2020-03-17 | 2023-09-19 | Applied Materials, Inc. | Calibration of an electronics processing system |
-
2018
- 2018-09-10 US US16/960,818 patent/US11798789B2/en active Active
- 2018-09-10 JP JP2019505020A patent/JP6859426B2/en active Active
- 2018-09-10 KR KR1020237023024A patent/KR20230106754A/en not_active Application Discontinuation
- 2018-09-10 CN CN201880002160.6A patent/CN111052344B/en active Active
- 2018-09-10 WO PCT/US2018/050273 patent/WO2020036613A1/en unknown
- 2018-09-10 KR KR1020217027521A patent/KR20210111872A/en not_active Application Discontinuation
- 2018-09-10 EP EP18929891.2A patent/EP3837713A4/en active Pending
- 2018-09-10 KR KR1020187028683A patent/KR20200066537A/en active Application Filing
- 2018-09-10 SG SG11202006623YA patent/SG11202006623YA/en unknown
- 2018-12-13 TW TW109128923A patent/TWI757848B/en active
- 2018-12-13 TW TW111104002A patent/TWI830138B/en active
- 2018-12-13 TW TW107144916A patent/TWI705474B/en active
-
2021
- 2021-03-25 JP JP2021051128A patent/JP7035246B2/en active Active
-
2022
- 2022-03-02 JP JP2022031361A patent/JP7368520B2/en active Active
-
2023
- 2023-10-05 US US18/377,141 patent/US20240038504A1/en active Pending
- 2023-10-12 JP JP2023176355A patent/JP2023182766A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023182766A (en) | 2023-12-26 |
| KR20200066537A (en) | 2020-06-10 |
| JP2020532852A (en) | 2020-11-12 |
| JP2022071086A (en) | 2022-05-13 |
| TW202009972A (en) | 2020-03-01 |
| CN111052344B (en) | 2024-04-02 |
| US20240038504A1 (en) | 2024-02-01 |
| TWI830138B (en) | 2024-01-21 |
| TW202117785A (en) | 2021-05-01 |
| KR20230106754A (en) | 2023-07-13 |
| US20200395195A1 (en) | 2020-12-17 |
| KR20210111872A (en) | 2021-09-13 |
| TW202226307A (en) | 2022-07-01 |
| JP2021103788A (en) | 2021-07-15 |
| TWI705474B (en) | 2020-09-21 |
| JP7368520B2 (en) | 2023-10-24 |
| EP3837713A4 (en) | 2022-07-20 |
| WO2020036613A1 (en) | 2020-02-20 |
| US11798789B2 (en) | 2023-10-24 |
| CN111052344A (en) | 2020-04-21 |
| JP7035246B2 (en) | 2022-03-14 |
| JP6859426B2 (en) | 2021-04-14 |
| TWI757848B (en) | 2022-03-11 |
| EP3837713A1 (en) | 2021-06-23 |
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