SG11202005465SA - Laser-releasable bonding materials for 3-d ic applications - Google Patents

Laser-releasable bonding materials for 3-d ic applications

Info

Publication number
SG11202005465SA
SG11202005465SA SG11202005465SA SG11202005465SA SG11202005465SA SG 11202005465S A SG11202005465S A SG 11202005465SA SG 11202005465S A SG11202005465S A SG 11202005465SA SG 11202005465S A SG11202005465S A SG 11202005465SA SG 11202005465S A SG11202005465S A SG 11202005465SA
Authority
SG
Singapore
Prior art keywords
laser
applications
bonding materials
releasable bonding
releasable
Prior art date
Application number
SG11202005465SA
Inventor
Xiao Liu
Qi Wu
Rama Puligadda
Dongshun Bai
Baron Huang
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of SG11202005465SA publication Critical patent/SG11202005465SA/en

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    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • CCHEMISTRY; METALLURGY
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    • C08L71/08Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10490525B1 (en) * 2018-05-10 2019-11-26 International Business Machines Corporation High speed handling of ultra-small chips by selective laser bonding and debonding
US11073572B2 (en) * 2019-01-17 2021-07-27 Infineon Technologies Ag Current sensor device with a routable molded lead frame
US11610801B2 (en) * 2019-01-22 2023-03-21 Brewer Science, Inc. Laser-releasable bonding materials for 3-D IC applications
CN110396404B (en) * 2019-07-12 2022-06-17 新乡医学院 Fluorescent molecular probe based on hydrazone derivative, preparation method thereof and application thereof in cation recognition
EP4007799A4 (en) * 2019-08-02 2023-09-06 Brewer Science Inc. Permanent bonding and patterning material
KR20210087337A (en) 2020-01-02 2021-07-12 삼성전자주식회사 A semiconductor package, an electronic apparatus and a method of manufacturing the semiconductor package
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Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5989700A (en) * 1996-01-05 1999-11-23 Tekscan Incorporated Pressure sensitive ink means, and methods of use
US7052597B2 (en) * 2001-03-27 2006-05-30 Exxonmobil Research And Engineering Company Tuning fuel composition for driving cycle conditions in spark ignition engines
ATE384150T1 (en) * 2005-03-22 2008-02-15 Ems Chemie Ag THERMOPLASTIC FIBER MATERIAL SPUN FROM A RAW MATERIAL CONTAINING POLYHYDROXYETHER, METHOD FOR THE PRODUCTION THEREOF AND USES THEREOF
KR101096142B1 (en) 2008-01-24 2011-12-19 브레우어 사이언스 인코포레이션 Method for reversibly mounting a device wafer to a carrier substrate
CN101393400B (en) * 2008-10-29 2011-12-14 清溢精密光电(深圳)有限公司 Method for removing glue at surface of liquid light-sensitive resin letterpress
US8859672B2 (en) * 2011-06-27 2014-10-14 Sabic Global Technologies B.V. Poly(arylene ether)-poly(hydroxy ether) block copolymer and method of making
US9827757B2 (en) 2011-07-07 2017-11-28 Brewer Science Inc. Methods of transferring device wafers or layers between carrier substrates and other surfaces
WO2013102146A1 (en) * 2011-12-30 2013-07-04 Deca Technologies, Inc. Die up fully molded fan-out wafer level packaging
US9127126B2 (en) 2012-04-30 2015-09-08 Brewer Science Inc. Development of high-viscosity bonding layer through in-situ polymer chain extension
JP2015021082A (en) * 2013-07-19 2015-02-02 日東電工株式会社 Thermal peeling type adhesive tape for cutting-off electronic component and cutting-off method of electronic component
US9865490B2 (en) * 2014-01-07 2018-01-09 Brewer Science Inc. Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes
US9496164B2 (en) * 2014-01-07 2016-11-15 Brewer Science Inc. Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes
US9827740B2 (en) 2014-07-22 2017-11-28 Brewer Science Inc. Polyimides as laser release materials for 3-D IC applications
US9324601B1 (en) * 2014-11-07 2016-04-26 International Business Machines Corporation Low temperature adhesive resins for wafer bonding
US9850406B2 (en) * 2014-11-07 2017-12-26 International Business Machines Corporation Adhesive resins for wafer bonding
US10522383B2 (en) * 2015-03-25 2019-12-31 International Business Machines Corporation Thermoplastic temporary adhesive for silicon handler with infra-red laser wafer de-bonding
JP7356902B2 (en) 2016-07-15 2023-10-05 ブルーワー サイエンス アイ エヌ シー. Dielectric materials for laser ablation
US10617010B2 (en) 2016-08-29 2020-04-07 Brewer Science, Inc. Polymer film stencil process for fan-out wafer-level packaging of semiconductor devices
US10217637B1 (en) * 2017-09-20 2019-02-26 International Business Machines Corporation Chip handling and electronic component integration
JP2021502272A (en) * 2017-11-08 2021-01-28 サイテック インダストリーズ インコーポレイテッド A method for producing a composite having interlayer strengthening particles and the composite thereof.

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