SG11202005230TA - Wire saw apparatus and method for manufacturing wafer - Google Patents

Wire saw apparatus and method for manufacturing wafer

Info

Publication number
SG11202005230TA
SG11202005230TA SG11202005230TA SG11202005230TA SG11202005230TA SG 11202005230T A SG11202005230T A SG 11202005230TA SG 11202005230T A SG11202005230T A SG 11202005230TA SG 11202005230T A SG11202005230T A SG 11202005230TA SG 11202005230T A SG11202005230T A SG 11202005230TA
Authority
SG
Singapore
Prior art keywords
wire saw
saw apparatus
manufacturing wafer
wafer
manufacturing
Prior art date
Application number
SG11202005230TA
Inventor
Kazutoshi Mizushima
Toshiaki Otaka
Tatsuo Enomoto
Yuichi Shimizu
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Publication of SG11202005230TA publication Critical patent/SG11202005230TA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/042Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with blades or wires mounted in a reciprocating frame
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/045Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0633Grinders for cutting-off using a cutting wire
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
SG11202005230TA 2017-12-25 2018-11-01 Wire saw apparatus and method for manufacturing wafer SG11202005230TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017247854A JP6753390B2 (en) 2017-12-25 2017-12-25 Wire saw equipment and wafer manufacturing method
PCT/JP2018/040633 WO2019130806A1 (en) 2017-12-25 2018-11-01 Wire saw device and wafer manufacturing method

Publications (1)

Publication Number Publication Date
SG11202005230TA true SG11202005230TA (en) 2020-07-29

Family

ID=67066994

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202005230TA SG11202005230TA (en) 2017-12-25 2018-11-01 Wire saw apparatus and method for manufacturing wafer

Country Status (8)

Country Link
US (1) US11584037B2 (en)
JP (1) JP6753390B2 (en)
KR (1) KR102560447B1 (en)
CN (1) CN111418045B (en)
DE (1) DE112018006043T5 (en)
SG (1) SG11202005230TA (en)
TW (1) TWI812652B (en)
WO (1) WO2019130806A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018221922A1 (en) * 2018-12-17 2020-06-18 Siltronic Ag Method for producing semiconductor wafers using a wire saw, wire saw and semiconductor wafer made of single-crystal silicon
EP4029670A1 (en) 2021-01-15 2022-07-20 Lapmaster Wolters GmbH Device and method for cutting a solid substrate

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2967896B2 (en) 1993-06-18 1999-10-25 信越化学工業株式会社 Wafer manufacturing method
JPH09192940A (en) 1996-01-22 1997-07-29 Koganei Corp Workpiece conveying device
JP2000108012A (en) 1998-10-02 2000-04-18 Ebara Corp Wire saw
DE10122628B4 (en) * 2001-05-10 2007-10-11 Siltronic Ag Method for separating slices from a workpiece
JP4816511B2 (en) * 2007-03-06 2011-11-16 信越半導体株式会社 Cutting method and wire saw device
JP2009029078A (en) 2007-07-30 2009-02-12 Toyo Advanced Technologies Co Ltd Wire saw device
JP2010110866A (en) 2008-11-07 2010-05-20 Kanai Hiroaki Wire saw machine
US20130139801A1 (en) 2011-12-01 2013-06-06 Memc Electronic Materials, Spa Methods For Controlling Displacement Of Bearings In A Wire Saw
US20130139800A1 (en) 2011-12-02 2013-06-06 Memc Electronic Materials, Spa Methods For Controlling Surface Profiles Of Wafers Sliced In A Wire Saw
US20130144421A1 (en) 2011-12-01 2013-06-06 Memc Electronic Materials, Spa Systems For Controlling Temperature Of Bearings In A Wire Saw
US20130144420A1 (en) 2011-12-01 2013-06-06 Memc Electronic Materials, Spa Systems For Controlling Surface Profiles Of Wafers Sliced In A Wire Saw
TWI567812B (en) 2011-12-01 2017-01-21 Memc電子材料公司 Systems and methods for controlling surface profiles of wafers sliced in a wire saw
JP2014133272A (en) 2013-01-09 2014-07-24 Komatsu Ntc Ltd Machining wire tool holder
KR20150099656A (en) 2014-02-21 2015-09-01 웅진에너지 주식회사 A adjusting apparatus for guide roller
JP2016135529A (en) 2015-01-23 2016-07-28 信越半導体株式会社 Method for cutting work-piece
DE102018221922A1 (en) * 2018-12-17 2020-06-18 Siltronic Ag Method for producing semiconductor wafers using a wire saw, wire saw and semiconductor wafer made of single-crystal silicon
WO2021013238A1 (en) * 2019-07-24 2021-01-28 徐州鑫晶半导体科技有限公司 Method for cutting silicon rod and diamond multi-wire cutting device
TWI786740B (en) * 2020-07-27 2022-12-11 環球晶圓股份有限公司 Crystal ingot cutting device and crystal ingot cutting method

Also Published As

Publication number Publication date
KR102560447B1 (en) 2023-07-27
US20210362373A1 (en) 2021-11-25
TW201927472A (en) 2019-07-16
US11584037B2 (en) 2023-02-21
TWI812652B (en) 2023-08-21
JP2019114690A (en) 2019-07-11
DE112018006043T5 (en) 2020-11-12
CN111418045B (en) 2023-08-15
WO2019130806A1 (en) 2019-07-04
JP6753390B2 (en) 2020-09-09
KR20200100085A (en) 2020-08-25
CN111418045A (en) 2020-07-14

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