SG11202001953SA - Metal mesh light pipe for transporting light in an image sensor - Google Patents

Metal mesh light pipe for transporting light in an image sensor

Info

Publication number
SG11202001953SA
SG11202001953SA SG11202001953SA SG11202001953SA SG11202001953SA SG 11202001953S A SG11202001953S A SG 11202001953SA SG 11202001953S A SG11202001953S A SG 11202001953SA SG 11202001953S A SG11202001953S A SG 11202001953SA SG 11202001953S A SG11202001953S A SG 11202001953SA
Authority
SG
Singapore
Prior art keywords
light
image sensor
metal mesh
transporting
light pipe
Prior art date
Application number
SG11202001953SA
Inventor
Jian Ma
Biay-Cheng Hseih
Sergiu Radu Goma
Original Assignee
Qualcomm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Inc filed Critical Qualcomm Inc
Publication of SG11202001953SA publication Critical patent/SG11202001953SA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14636Interconnect structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14603Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14625Optical elements or arrangements associated with the device
    • H01L27/14629Reflectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14634Assemblies, i.e. Hybrid structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/50Constructional details
    • H04N23/51Housings
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/703SSIS architectures incorporating pixels for producing signals other than image signals
    • H04N25/705Pixels for depth measurement, e.g. RGBZ
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/79Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • G01S7/4816Constructional features, e.g. arrangements of optical elements of receivers alone
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/1462Coatings
    • H01L27/14621Colour filter arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14625Optical elements or arrangements associated with the device
    • H01L27/14627Microlenses
SG11202001953SA 2017-10-17 2018-10-17 Metal mesh light pipe for transporting light in an image sensor SG11202001953SA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762573612P 2017-10-17 2017-10-17
US16/161,958 US10608036B2 (en) 2017-10-17 2018-10-16 Metal mesh light pipe for transporting light in an image sensor
PCT/US2018/056238 WO2019079415A1 (en) 2017-10-17 2018-10-17 Metal mesh light pipe for transporting light in an image sensor

Publications (1)

Publication Number Publication Date
SG11202001953SA true SG11202001953SA (en) 2020-05-28

Family

ID=66096033

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202001953SA SG11202001953SA (en) 2017-10-17 2018-10-17 Metal mesh light pipe for transporting light in an image sensor

Country Status (7)

Country Link
US (1) US10608036B2 (en)
EP (1) EP3698406B1 (en)
CN (1) CN111213239B (en)
BR (1) BR112020007363A2 (en)
SG (1) SG11202001953SA (en)
TW (1) TW201929254A (en)
WO (1) WO2019079415A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11037966B2 (en) * 2017-09-22 2021-06-15 Qualcomm Incorporated Solid state image sensor with on-chip filter and extended spectral response
CN111712921A (en) * 2017-12-12 2020-09-25 拉芳德利责任有限公司 Semiconductor optical sensor for visible and ultraviolet light detection and corresponding manufacturing process
DE102018126421A1 (en) 2018-09-27 2020-04-02 Taiwan Semiconductor Manufacturing Co. Ltd. BAND PASS FILTER FOR STACKED SENSOR
US10651225B2 (en) * 2018-09-27 2020-05-12 Taiwan Semiconductor Manufacturing Co., Ltd. Band-pass filter for stacked sensor
FR3093377B1 (en) * 2019-03-01 2021-02-26 Isorg COLOR AND INFRARED IMAGE SENSOR
FR3093376B1 (en) 2019-03-01 2022-09-02 Isorg COLOR AND INFRARED IMAGE SENSOR
CN111403428A (en) * 2020-03-23 2020-07-10 中山大学 Photoelectric sensor, random-readable active pixel circuit, image sensor, and camera device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100487898C (en) * 2001-11-05 2009-05-13 佐伊科比株式会社 Solid-state image sensor and its production method
US20040135209A1 (en) * 2002-02-05 2004-07-15 Tzu-Chiang Hsieh Camera with MOS or CMOS sensor array
US20070045642A1 (en) * 2005-08-25 2007-03-01 Micron Technology, Inc. Solid-state imager and formation method using anti-reflective film for optical crosstalk reduction
US7524694B2 (en) * 2005-12-16 2009-04-28 International Business Machines Corporation Funneled light pipe for pixel sensors
US7777287B2 (en) * 2006-07-12 2010-08-17 Micron Technology, Inc. System and apparatus providing analytical device based on solid state image sensor
US8237832B2 (en) * 2008-05-30 2012-08-07 Omnivision Technologies, Inc. Image sensor with focusing interconnections
US8054355B2 (en) * 2008-10-16 2011-11-08 Omnivision Technologies, Inc. Image sensor having multiple sensing layers
JP2011216701A (en) * 2010-03-31 2011-10-27 Sony Corp Solid-state imaging apparatus and electronic device
US9294691B2 (en) * 2011-09-06 2016-03-22 Sony Corporation Imaging device, imaging apparatus, manufacturing apparatus and manufacturing method
CN103258835A (en) * 2013-05-02 2013-08-21 上海华力微电子有限公司 Method for forming light channel in CIS component
JP6196911B2 (en) 2014-02-05 2017-09-13 オリンパス株式会社 Solid-state imaging device and imaging device
US9786705B2 (en) 2015-12-21 2017-10-10 Qualcomm Incorporated Solid state image sensor with extended spectral response

Also Published As

Publication number Publication date
US10608036B2 (en) 2020-03-31
WO2019079415A1 (en) 2019-04-25
US20190115386A1 (en) 2019-04-18
BR112020007363A2 (en) 2020-09-29
CN111213239A (en) 2020-05-29
EP3698406C0 (en) 2023-12-27
CN111213239B (en) 2021-07-16
TW201929254A (en) 2019-07-16
EP3698406A1 (en) 2020-08-26
EP3698406B1 (en) 2023-12-27

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