SG11201908476PA - Photoetching apparatus and method - Google Patents
Photoetching apparatus and methodInfo
- Publication number
- SG11201908476PA SG11201908476PA SG11201908476PA SG11201908476PA SG 11201908476P A SG11201908476P A SG 11201908476PA SG 11201908476P A SG11201908476P A SG 11201908476PA SG 11201908476P A SG11201908476P A SG 11201908476PA
- Authority
- SG
- Singapore
- Prior art keywords
- photoetching apparatus
- photoetching
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7034—Leveling
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710154356.4A CN107966881B (en) | 2017-03-15 | 2017-03-15 | Lithographic equipment and method |
PCT/CN2018/078829 WO2018166444A1 (en) | 2017-03-15 | 2018-03-13 | Photoetching apparatus and method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201908476PA true SG11201908476PA (en) | 2019-10-30 |
Family
ID=61997383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201908476P SG11201908476PA (en) | 2017-03-15 | 2018-03-13 | Photoetching apparatus and method |
Country Status (7)
Country | Link |
---|---|
US (1) | US11042099B2 (en) |
JP (1) | JP6941685B2 (en) |
KR (1) | KR102370151B1 (en) |
CN (2) | CN107966881B (en) |
SG (1) | SG11201908476PA (en) |
TW (1) | TWI654484B (en) |
WO (1) | WO2018166444A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111123667B (en) * | 2018-10-31 | 2021-09-24 | 上海微电子装备(集团)股份有限公司 | Photoetching device, vertical control method of photoetching device and exposure method |
JP7265827B2 (en) * | 2019-02-18 | 2023-04-27 | キヤノン株式会社 | Exposure system and article manufacturing method |
JP7458950B2 (en) * | 2020-09-23 | 2024-04-01 | 株式会社Screenホールディングス | Drawing System |
CN114236976A (en) * | 2021-12-28 | 2022-03-25 | 杭州新诺微电子有限公司 | Exposure method of double-table LDI system |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
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US4769680A (en) * | 1987-10-22 | 1988-09-06 | Mrs Technology, Inc. | Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems |
JPH01305520A (en) * | 1988-06-03 | 1989-12-08 | Sharp Corp | Optimization method of focal position in exposure treatment of wafer |
US5729331A (en) | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JP3770959B2 (en) * | 1996-05-10 | 2006-04-26 | 株式会社半導体エネルギー研究所 | Projection type stepper exposure apparatus and exposure method using the same |
JP2001168003A (en) | 1999-12-06 | 2001-06-22 | Olympus Optical Co Ltd | Aligner |
JP2001255139A (en) * | 2000-03-08 | 2001-09-21 | Nikon Corp | Controllability evaluation method for control system, and planarity measuring method of aligner and substrate |
JP2001296667A (en) * | 2000-04-14 | 2001-10-26 | Nikon Corp | Scanning exposure method and scanning type aligner, and mask |
JP4617616B2 (en) * | 2001-07-11 | 2011-01-26 | 株式会社ニコン | Exposure apparatus and exposure method |
JP4211272B2 (en) * | 2002-04-12 | 2009-01-21 | 株式会社ニコン | Exposure apparatus and exposure method |
JP4218418B2 (en) | 2003-05-23 | 2009-02-04 | ウシオ電機株式会社 | Double-sided projection exposure system for belt-like workpieces |
JP2005092137A (en) | 2003-09-19 | 2005-04-07 | Nikon Corp | Aligner and exposure method |
US7242456B2 (en) * | 2004-05-26 | 2007-07-10 | Asml Holdings N.V. | System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions |
JP2006313866A (en) * | 2005-05-09 | 2006-11-16 | Canon Inc | Exposure device and method therefor |
CN100526994C (en) * | 2007-08-20 | 2009-08-12 | 上海微电子装备有限公司 | Transmission aligning mark combination and alignment method of light scribing device |
CN101303533B (en) * | 2008-06-24 | 2010-06-02 | 上海微电子装备有限公司 | Aligning system, aligning method for photolithography equipment and enhancement type aligning mark |
TWI502283B (en) * | 2009-04-03 | 2015-10-01 | 尼康股份有限公司 | Exposure device, exposure method and device production method |
CN103197506B (en) * | 2012-01-10 | 2015-11-18 | 上海微电子装备有限公司 | A kind of litho machine adopting mirror image silicon wafer stage |
JP6004157B2 (en) * | 2012-03-02 | 2016-10-05 | 株式会社ブイ・テクノロジー | Manufacturing apparatus and manufacturing method of three-dimensional liquid crystal display device |
JP6078843B2 (en) * | 2012-07-05 | 2017-02-15 | 株式会社ブイ・テクノロジー | Photo-alignment exposure method and photo-alignment exposure apparatus |
CN102968000A (en) | 2012-11-21 | 2013-03-13 | 京东方科技集团股份有限公司 | Dual-sided processing method and exposure device |
EP2994798B1 (en) | 2013-05-07 | 2017-05-31 | ASML Netherlands B.V. | Alignment sensor, lithographic apparatus and alignment method |
CN104166312B (en) * | 2013-05-17 | 2016-08-24 | 上海微电子装备有限公司 | A kind of multiple light courcess big field stitching illuminator |
US10618131B2 (en) * | 2014-06-05 | 2020-04-14 | Nlight, Inc. | Laser patterning skew correction |
JP6519109B2 (en) * | 2014-07-17 | 2019-05-29 | 株式会社ニコン | Exposure method and apparatus, and device manufacturing method |
CN105527795B (en) * | 2014-09-28 | 2018-09-18 | 上海微电子装备(集团)股份有限公司 | Exposure device and defocus tilt error compensation method |
CN106154759B (en) * | 2015-04-15 | 2018-08-24 | 上海微电子装备(集团)股份有限公司 | A kind of lithographic equipment and method of the fluctuating of recoverable material |
-
2017
- 2017-03-15 CN CN201710154356.4A patent/CN107966881B/en active Active
-
2018
- 2018-03-13 US US16/494,120 patent/US11042099B2/en active Active
- 2018-03-13 CN CN201880017103.5A patent/CN110419004B/en active Active
- 2018-03-13 SG SG11201908476P patent/SG11201908476PA/en unknown
- 2018-03-13 KR KR1020197030127A patent/KR102370151B1/en active IP Right Grant
- 2018-03-13 JP JP2019550794A patent/JP6941685B2/en active Active
- 2018-03-13 WO PCT/CN2018/078829 patent/WO2018166444A1/en active Application Filing
- 2018-03-15 TW TW107108866A patent/TWI654484B/en active
Also Published As
Publication number | Publication date |
---|---|
JP6941685B2 (en) | 2021-09-29 |
CN107966881B (en) | 2018-11-23 |
TW201837601A (en) | 2018-10-16 |
CN110419004A (en) | 2019-11-05 |
KR20190125475A (en) | 2019-11-06 |
US11042099B2 (en) | 2021-06-22 |
KR102370151B1 (en) | 2022-03-04 |
CN110419004B (en) | 2020-10-27 |
US20200257207A1 (en) | 2020-08-13 |
CN107966881A (en) | 2018-04-27 |
WO2018166444A1 (en) | 2018-09-20 |
TWI654484B (en) | 2019-03-21 |
JP2020511691A (en) | 2020-04-16 |
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