SG11201908001VA - Control method of driving frequency of pulsed variable frequency rf generator - Google Patents

Control method of driving frequency of pulsed variable frequency rf generator

Info

Publication number
SG11201908001VA
SG11201908001VA SG11201908001VA SG11201908001VA SG11201908001VA SG 11201908001V A SG11201908001V A SG 11201908001VA SG 11201908001V A SG11201908001V A SG 11201908001VA SG 11201908001V A SG11201908001V A SG 11201908001VA SG 11201908001V A SG11201908001V A SG 11201908001VA
Authority
SG
Singapore
Prior art keywords
generator
frequency
control method
pulsed variable
variable frequency
Prior art date
Application number
SG11201908001VA
Other languages
English (en)
Inventor
Changhee Lee
Hanam Kim
Jongmin Kim
Jin Huh
Ka Sing Leung
Original Assignee
Mks Korea Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Korea Ltd filed Critical Mks Korea Ltd
Publication of SG11201908001VA publication Critical patent/SG11201908001VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
SG11201908001VA 2019-02-07 2019-06-27 Control method of driving frequency of pulsed variable frequency rf generator SG11201908001VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020190014594A KR102348338B1 (ko) 2019-02-07 2019-02-07 펄스형 가변 주파수 rf 발생기의 구동 주파수 제어 방법
PCT/KR2019/007802 WO2020162653A1 (ko) 2019-02-07 2019-06-27 펄스형 가변 주파수 rf 발생기의 구동 주파수 제어 방법

Publications (1)

Publication Number Publication Date
SG11201908001VA true SG11201908001VA (en) 2020-09-29

Family

ID=71947882

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201908001VA SG11201908001VA (en) 2019-02-07 2019-06-27 Control method of driving frequency of pulsed variable frequency rf generator

Country Status (8)

Country Link
US (1) US11244809B2 (zh)
EP (1) EP3694104B1 (zh)
JP (1) JP7104057B2 (zh)
KR (1) KR102348338B1 (zh)
CN (1) CN111801766B (zh)
SG (1) SG11201908001VA (zh)
TW (1) TWI713416B (zh)
WO (1) WO2020162653A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11823869B2 (en) * 2021-10-15 2023-11-21 Mks Instruments, Inc. Impedance matching in a RF power generation system
US20230360886A1 (en) * 2022-05-05 2023-11-09 Applied Materials, Inc. Control and prediction of multiple plasma coupling surfaces and corresponding power transfer

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* Cited by examiner, † Cited by third party
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US6804129B2 (en) * 1999-07-22 2004-10-12 02 Micro International Limited High-efficiency adaptive DC/AC converter
US6259615B1 (en) * 1999-07-22 2001-07-10 O2 Micro International Limited High-efficiency adaptive DC/AC converter
EP1952533A1 (en) * 2005-10-31 2008-08-06 MKS Instruments, Inc. Radio frequency power delivery system
US20080179948A1 (en) * 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
TWI425767B (zh) * 2005-10-31 2014-02-01 Mks Instr Inc 無線電頻率電力傳送系統
KR100895689B1 (ko) 2007-11-14 2009-04-30 주식회사 플라즈마트 임피던스 매칭 방법 및 이 방법을 위한 전기 장치
US7839223B2 (en) * 2008-03-23 2010-11-23 Advanced Energy Industries, Inc. Method and apparatus for advanced frequency tuning
KR20120022251A (ko) * 2010-09-01 2012-03-12 삼성전자주식회사 플라즈마 식각방법 및 그의 장치
JP5576819B2 (ja) * 2011-03-23 2014-08-20 パナソニック株式会社 点灯装置及び照明器具
JP5867701B2 (ja) * 2011-12-15 2016-02-24 東京エレクトロン株式会社 プラズマ処理装置
US8576013B2 (en) * 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
CN106955834A (zh) 2012-06-01 2017-07-18 诺森有限公司 阻抗匹配装置及方法
KR20140058787A (ko) * 2012-11-06 2014-05-15 세메스 주식회사 플라즈마 처리 장치 및 상기 플라즈마 처리 장치의 임피던스를 매칭하는 방법
US9294100B2 (en) 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
KR101544975B1 (ko) * 2013-09-30 2015-08-18 주식회사 플라즈마트 임피던스 매칭 방법 및 임피던스 매칭 시스템
CN103632927B (zh) * 2013-12-19 2016-03-16 中微半导体设备(上海)有限公司 等离子体刻蚀系统的阻抗匹配方法
US9520795B2 (en) * 2014-01-08 2016-12-13 Semiconductor Components Industries, Llc Method of forming a power supply controller and structure therefor
US9336901B2 (en) * 2014-03-17 2016-05-10 Lam Research Corporation Track and hold feedback control of pulsed RF
US9544987B2 (en) 2014-06-30 2017-01-10 Advanced Energy Industries, Inc. Frequency tuning for pulsed radio frequency plasma processing
KR101677748B1 (ko) * 2014-10-29 2016-11-29 삼성전자 주식회사 펄스 플라즈마 장치 및 펄스 플라즈마 장치 구동 방법
CN105826154B (zh) * 2015-01-06 2017-12-19 北京北方华创微电子装备有限公司 针对脉冲射频电源的阻抗匹配方法及装置
KR101983873B1 (ko) * 2015-03-24 2019-05-29 엠케이에스코리아 유한회사 임피던스 매칭 방법 및 임피던스 매칭 시스템
US9876476B2 (en) 2015-08-18 2018-01-23 Mks Instruments, Inc. Supervisory control of radio frequency (RF) impedance tuning operation
US10483854B2 (en) * 2017-05-19 2019-11-19 Semiconductor Components Industries, Llc Resonant power supply converter circuit and method therefor
CN109148250B (zh) * 2017-06-15 2020-07-17 北京北方华创微电子装备有限公司 阻抗匹配装置和阻抗匹配方法

Also Published As

Publication number Publication date
KR20200097161A (ko) 2020-08-18
CN111801766B (zh) 2023-08-25
US11244809B2 (en) 2022-02-08
KR102348338B1 (ko) 2022-01-06
EP3694104A1 (en) 2020-08-12
US20210335576A1 (en) 2021-10-28
WO2020162653A1 (ko) 2020-08-13
TW202031098A (zh) 2020-08-16
JP7104057B2 (ja) 2022-07-20
EP3694104B1 (en) 2023-10-11
CN111801766A (zh) 2020-10-20
JP2021516412A (ja) 2021-07-01
TWI713416B (zh) 2020-12-11

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