SG11201811618RA - Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device - Google Patents
Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor deviceInfo
- Publication number
- SG11201811618RA SG11201811618RA SG11201811618RA SG11201811618RA SG11201811618RA SG 11201811618R A SG11201811618R A SG 11201811618RA SG 11201811618R A SG11201811618R A SG 11201811618RA SG 11201811618R A SG11201811618R A SG 11201811618RA SG 11201811618R A SG11201811618R A SG 11201811618RA
- Authority
- SG
- Singapore
- Prior art keywords
- pellicle
- light exposure
- film
- semiconductor device
- frame
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 5
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 4
- 239000002041 carbon nanotube Substances 0.000 abstract 4
- 229910021393 carbon nanotube Inorganic materials 0.000 abstract 4
- 238000001900 extreme ultraviolet lithography Methods 0.000 abstract 1
- 238000002834 transmittance Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/159—Carbon nanotubes single-walled
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/16—Preparation
- C01B32/162—Preparation characterised by catalysts
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/02—Single-walled nanotubes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/30—Purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/34—Length
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/36—Diameter
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Crystallography & Structural Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
PELLICLE FILM, PELLICLE FRAME, PELLICLE, METHOD FOR PRODUCING SAME, ORIGINAL PLATE FOR LIGHT EXPOSURE, LIGHT EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 5 Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure 10 extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet. 15 Fig. 1 Fig. 2
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016133062 | 2016-07-05 | ||
PCT/JP2017/024335 WO2018008594A1 (en) | 2016-07-05 | 2017-07-03 | Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201811618RA true SG11201811618RA (en) | 2019-01-30 |
Family
ID=60912915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201811618RA SG11201811618RA (en) | 2016-07-05 | 2017-07-03 | Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device |
Country Status (8)
Country | Link |
---|---|
US (1) | US11042085B2 (en) |
EP (1) | EP3483655A4 (en) |
JP (1) | JP6781864B2 (en) |
KR (3) | KR20220165812A (en) |
CN (4) | CN116594258A (en) |
SG (1) | SG11201811618RA (en) |
TW (3) | TW202204252A (en) |
WO (1) | WO2018008594A1 (en) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6781864B2 (en) | 2016-07-05 | 2020-11-11 | 三井化学株式会社 | Pellicle film, pellicle frame, pellicle, manufacturing method thereof, exposure original plate, exposure device, manufacturing method of semiconductor device |
EP3404487B1 (en) * | 2017-05-15 | 2021-12-01 | IMEC vzw | Method for forming a carbon nanotube pellicle membrane |
JP7019472B2 (en) * | 2018-03-22 | 2022-02-15 | 三井化学株式会社 | Method for manufacturing carbon nanotube free-standing film and method for manufacturing pellicle |
WO2019188978A1 (en) * | 2018-03-29 | 2019-10-03 | 日本ゼオン株式会社 | Method of manufacturing carbon film |
KR102459119B1 (en) * | 2018-06-12 | 2022-10-26 | 미쯔이가가꾸가부시끼가이샤 | Support frame for pellicle, method for manufacturing pellicle and support frame for pellicle, and exposure disc and exposure apparatus using pellicle |
US10871721B2 (en) | 2018-09-28 | 2020-12-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Mask blank for lithography and method of manufacturing the same |
JP7040427B2 (en) * | 2018-12-03 | 2022-03-23 | 信越化学工業株式会社 | Pellicle, exposure original plate with pellicle, exposure method and semiconductor manufacturing method |
EP3674797B1 (en) | 2018-12-28 | 2021-05-05 | IMEC vzw | An euvl scanner |
JP2020160345A (en) * | 2019-03-27 | 2020-10-01 | 三井化学株式会社 | Producing method of pellicle self-supporting film, producing method of pellicle, and producing method of semiconductor device |
KR20210153109A (en) * | 2019-04-16 | 2021-12-16 | 신에쓰 가가꾸 고교 가부시끼가이샤 | A pellicle, an exposed master plate with a pellicle, a method for manufacturing a semiconductor device, a method for manufacturing a liquid crystal display panel, a method for regenerating an exposed master plate, and a method for reducing peeling residue |
EP3764163B1 (en) * | 2019-07-11 | 2023-04-12 | IMEC vzw | An extreme ultraviolet lithography device |
KR102242356B1 (en) * | 2019-08-05 | 2021-04-20 | 주식회사 에프에스티 | Pellicle including integrated frame and membrane, Manufacturing method for the same, Exposure apparatus including the Pellicle and Manufacturing apparatus for the Pellicle |
KR102242341B1 (en) * | 2019-08-05 | 2021-04-20 | 주식회사 에프에스티 | Manufacturing method for A Pellicle frame and Manufacturing apparatus for the Pellicle |
KR102463517B1 (en) * | 2019-10-22 | 2022-11-09 | 주식회사 에스앤에스텍 | Pellicle Using Boron Nitride Nanotube for Extreme Ultraviolet(EUV) Lithography and method for fabricating of the same |
KR102273266B1 (en) * | 2019-10-23 | 2021-07-06 | 주식회사 에프에스티 | Manufacturing method for a Pellicle including integrated frame and membrane |
JP7434810B2 (en) | 2019-11-05 | 2024-02-21 | Toppanホールディングス株式会社 | Pellicle membrane and pellicle |
EP3842861A1 (en) * | 2019-12-23 | 2021-06-30 | Imec VZW | A method for forming an euvl pellicle |
KR20220116021A (en) * | 2020-02-26 | 2022-08-19 | 미쯔이가가꾸가부시끼가이샤 | A pellicle film, a pellicle, an exposure master plate, an exposure apparatus, a method for manufacturing a pellicle, and a method for manufacturing a semiconductor device |
JP2021135403A (en) | 2020-02-27 | 2021-09-13 | 凸版印刷株式会社 | Pellicle film, pellicle, film, graphene sheet and manufacturing method thereof |
US11443916B2 (en) * | 2020-04-15 | 2022-09-13 | Kla Corporation | Thin pellicle material for protection of solid-state electron detectors |
CN115398334B (en) * | 2020-04-17 | 2023-09-26 | 三井化学株式会社 | Exposure pellicle, pellicle assembly, exposure master, exposure apparatus, and method for producing exposure pellicle |
KR102229118B1 (en) * | 2020-07-08 | 2021-03-18 | 솔브레인 주식회사 | Growth inhibitor for forming pellicle protection thin film, method for forming pellicle protection thin film and mask prepared therefrom |
KR102482649B1 (en) * | 2020-07-09 | 2022-12-29 | (주)에프에스티 | Method for fabricating a pellicle for EUV(extreme ultraviolet) lithography |
KR102405669B1 (en) * | 2020-07-16 | 2022-06-07 | 솔브레인 주식회사 | Growth inhibitor for forming thin film, method for forming thin film and semiconductor substrate prepared therefrom |
KR102514088B1 (en) * | 2020-08-04 | 2023-03-27 | 주식회사 에스앤에스텍 | Pellicle Using 1-dimensinal Materials for Extreme Ultraviolet(EUV) Lithography and Method for Fabricating of the same |
KR102585401B1 (en) * | 2020-11-17 | 2023-10-10 | 주식회사 에스앤에스텍 | Pellicle for EUV lithography with Capping Layer of Independent Thin-film Type, and Method for manufacturing the same |
KR102482650B1 (en) * | 2021-02-25 | 2022-12-29 | (주)에프에스티 | Pellicle film with BN nano structure layer for EUV(extreme ultraviolet) lithography and method for fabricating the same |
JPWO2022210731A1 (en) | 2021-03-31 | 2022-10-06 | ||
US20220365420A1 (en) * | 2021-05-12 | 2022-11-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-layer pellicle membrane |
JP2022174894A (en) * | 2021-05-12 | 2022-11-25 | 日本電気株式会社 | Bolometer and method for manufacturing the same |
JP2022191120A (en) * | 2021-06-15 | 2022-12-27 | 信越化学工業株式会社 | Pellicle for exposure with easy air pressure adjustment |
KR20230012708A (en) | 2021-07-16 | 2023-01-26 | 인투워드 주식회사 | A pellicle for EUV and a manufacturing method therefor |
TW202307556A (en) * | 2021-07-30 | 2023-02-16 | 日商信越化學工業股份有限公司 | Pellicle film, pellicle, exposure original plate with pellicle, exposure method, semiconductor manufacturing method, and liquid crystal display panel manufacturing method |
US11860534B2 (en) * | 2021-08-06 | 2024-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
US20240103357A1 (en) * | 2021-08-26 | 2024-03-28 | Mitsui Chemicals, Inc. | Pellicle film, pellicle, exposure original plate, exposure device, and method for manufacturing pellicle film |
EP4202546A1 (en) * | 2021-12-22 | 2023-06-28 | Imec VZW | An euv pellicle |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3335330B2 (en) | 1999-08-09 | 2002-10-15 | 株式会社東芝 | Method for producing carbon nanotube and method for producing carbon nanotube film |
JP4296328B2 (en) | 2001-11-28 | 2009-07-15 | 東レ株式会社 | Hollow nanofiber-containing composition and method for producing hollow nanofiber |
SG141416A1 (en) * | 2003-04-30 | 2008-04-28 | Asml Netherlands Bv | Lithographic apparatus,device manufacturing methods, mask and method of characterising a mask and/or pellicle |
EP3181518A1 (en) * | 2004-07-27 | 2017-06-21 | National Institute of Advanced Industrial Science and Technology | Aligned single-walled carbon nanotube bulk structure, production process and use |
JP2006069165A (en) | 2004-09-06 | 2006-03-16 | Japan Science & Technology Agency | Carbon nanotube composite sheet and its production method |
JP5028744B2 (en) | 2005-02-15 | 2012-09-19 | 富士通株式会社 | Method for forming carbon nanotube and method for manufacturing electronic device |
US8329135B2 (en) * | 2006-01-06 | 2012-12-11 | National Institute Of Advanced Industrial Science And Technology | Aligned carbon nanotube bulk structure having portions different in density |
US7767985B2 (en) * | 2006-12-26 | 2010-08-03 | Globalfoundries Inc. | EUV pellicle and method for fabricating semiconductor dies using same |
CN101284662B (en) * | 2007-04-13 | 2011-01-05 | 清华大学 | Preparing process for carbon nano-tube membrane |
JP5266907B2 (en) | 2007-06-29 | 2013-08-21 | 東レ株式会社 | Carbon nanotube aggregate, dispersion and conductive film |
CN101480858B (en) * | 2008-01-11 | 2014-12-10 | 清华大学 | Carbon nano-tube composite material and preparation method thereof |
US8193430B2 (en) * | 2008-01-03 | 2012-06-05 | The University Of Connecticut | Methods for separating carbon nanotubes |
US8546067B2 (en) * | 2008-03-21 | 2013-10-01 | The Board Of Trustees Of The University Of Illinois | Material assisted laser ablation |
KR20110055601A (en) | 2008-08-06 | 2011-05-25 | 에이에스엠엘 네델란즈 비.브이. | Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element |
US8351220B2 (en) | 2009-01-28 | 2013-01-08 | Florida State University Research Foundation | Electromagnetic interference shielding structure including carbon nanotube or nanofiber films and methods |
CN103201214B (en) * | 2010-11-05 | 2016-01-13 | 独立行政法人产业技术综合研究所 | CNT dispersion liquid, CNT formed body, CNT composition, CNT aggregate and their manufacture method |
CN102796991B (en) * | 2011-05-27 | 2014-08-20 | 清华大学 | Method for preparing graphene carbon nanotube composite membrane structure |
US20160137505A1 (en) | 2013-03-08 | 2016-05-19 | Kyushu University, National University Corporation | Method for separating metallic single-walled carbon nanotube from semiconductive single-walled carbon nanotube |
CN105051604B (en) | 2013-03-15 | 2019-07-23 | 旭化成株式会社 | Pellicle film and pellicle |
CN103246157A (en) * | 2013-05-21 | 2013-08-14 | 上海和辉光电有限公司 | Dustproof film framework, optical mask and installation method thereof |
CN105229776B (en) * | 2013-05-24 | 2019-05-03 | 三井化学株式会社 | Protect membrane module and the EUV exposure device containing it |
JP2014227331A (en) | 2013-05-27 | 2014-12-08 | 日立造船株式会社 | Carbon nanotube sheet and production method for carbon nanotube sheet |
US20160367971A1 (en) * | 2013-07-30 | 2016-12-22 | Northeastern University | Catalyst and Method for Synthesis of Carbon Nanomaterials |
KR20180072844A (en) | 2014-05-19 | 2018-06-29 | 미쯔이가가꾸가부시끼가이샤 | Pellicle film, pellicle, exposure master, exposure device, and method for manufacturing semiconductor device |
EP3196699A4 (en) | 2014-09-19 | 2018-05-16 | Mitsui Chemicals, Inc. | Pellicle, production method thereof, exposure method |
EP3196700B1 (en) | 2014-09-19 | 2019-01-30 | Mitsui Chemicals, Inc. | Pellicle, pellicle production method and exposure method using pellicle |
EP3221748B1 (en) * | 2014-11-17 | 2024-01-03 | ASML Netherlands B.V. | Pellicle attachment apparatus |
JP2016133062A (en) | 2015-01-20 | 2016-07-25 | いすゞ自動車株式会社 | Exhaust emission control system |
KR102345543B1 (en) | 2015-08-03 | 2021-12-30 | 삼성전자주식회사 | Pellicle and photomask assembly including the same |
JP6649100B2 (en) | 2016-02-04 | 2020-02-19 | 日立造船株式会社 | Method for producing CNT laminate and method for producing carbon nanotube twisted yarn |
JP6781864B2 (en) | 2016-07-05 | 2020-11-11 | 三井化学株式会社 | Pellicle film, pellicle frame, pellicle, manufacturing method thereof, exposure original plate, exposure device, manufacturing method of semiconductor device |
EP3404487B1 (en) * | 2017-05-15 | 2021-12-01 | IMEC vzw | Method for forming a carbon nanotube pellicle membrane |
-
2017
- 2017-07-03 JP JP2018526366A patent/JP6781864B2/en active Active
- 2017-07-03 CN CN202310652861.7A patent/CN116594258A/en active Pending
- 2017-07-03 CN CN202310651908.8A patent/CN116609996A/en active Pending
- 2017-07-03 KR KR1020227041813A patent/KR20220165812A/en not_active Application Discontinuation
- 2017-07-03 EP EP17824197.2A patent/EP3483655A4/en active Pending
- 2017-07-03 CN CN201780038819.9A patent/CN109416503B/en active Active
- 2017-07-03 SG SG11201811618RA patent/SG11201811618RA/en unknown
- 2017-07-03 KR KR1020227041816A patent/KR20220162888A/en not_active Application Discontinuation
- 2017-07-03 CN CN202310652312.XA patent/CN116594257A/en active Pending
- 2017-07-03 WO PCT/JP2017/024335 patent/WO2018008594A1/en unknown
- 2017-07-03 KR KR1020187035244A patent/KR20190003752A/en active Application Filing
- 2017-07-04 TW TW110136705A patent/TW202204252A/en unknown
- 2017-07-04 TW TW111149066A patent/TW202321146A/en unknown
- 2017-07-04 TW TW106122342A patent/TWI744348B/en active
-
2018
- 2018-12-18 US US16/224,028 patent/US11042085B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN109416503B (en) | 2023-06-09 |
CN116594258A (en) | 2023-08-15 |
KR20190003752A (en) | 2019-01-09 |
EP3483655A4 (en) | 2020-02-26 |
EP3483655A1 (en) | 2019-05-15 |
KR20220165812A (en) | 2022-12-15 |
TW201821359A (en) | 2018-06-16 |
CN116609996A (en) | 2023-08-18 |
KR20220162888A (en) | 2022-12-08 |
JP6781864B2 (en) | 2020-11-11 |
CN109416503A (en) | 2019-03-01 |
TWI744348B (en) | 2021-11-01 |
US20190129300A1 (en) | 2019-05-02 |
WO2018008594A1 (en) | 2018-01-11 |
TW202204252A (en) | 2022-02-01 |
US11042085B2 (en) | 2021-06-22 |
JPWO2018008594A1 (en) | 2019-04-11 |
TW202321146A (en) | 2023-06-01 |
CN116594257A (en) | 2023-08-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11201811618RA (en) | Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device | |
EP3809202A4 (en) | Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle | |
TW201614362A (en) | Reflective mask blank, method for manufacturing same, reflective mask, method for manufacturing same, and method for manufacturing semiconductor device | |
EP4286941A3 (en) | Pellicle attachment apparatus | |
SG11201907482YA (en) | Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method | |
JP2011511465A5 (en) | ||
TW200619832A (en) | Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same | |
JP5806692B2 (en) | Lithographic original plate inspection method | |
JP2015511769A5 (en) | ||
JP2016122684A5 (en) | ||
Brouns et al. | NXE pellicle: offering a EUV pellicle solution to the industry | |
TW200734830A (en) | Lithogrpahic apparatus and device manufacturing method using multiple exposures and multiple exposure types | |
US11237474B2 (en) | Pellicle and method for producing the same | |
JP2008310232A5 (en) | ||
WO2010030018A3 (en) | Pattern forming method and device production method | |
Khusnatdinov et al. | High-throughput jet and flash imprint lithography for advanced semiconductor memory | |
KR101291719B1 (en) | Large area imprinting apparatus with uniform pressing structure | |
WO2015124457A8 (en) | Lithographic apparatus and method | |
Hatano et al. | NIL defect performance toward high volume mass production | |
Lai et al. | Computational lithography platform for 193i-guided directed self-assembly | |
JP2013219089A5 (en) | ||
Ye et al. | Defect reduction for semiconductor memory applications using jet and flash imprint lithography | |
EP2120091A3 (en) | Method for stripping pellicle and stripping apparatus used therein | |
TW200722935A (en) | Exposure apparatus, exposure method, projection optical system and device manufacturing method | |
US20180370084A1 (en) | Three-dimensional article and method of making the same |