SG11201811394UA - Cleaning solution mixing system with ultra-dilute cleaning solution and method of operation thereof - Google Patents

Cleaning solution mixing system with ultra-dilute cleaning solution and method of operation thereof

Info

Publication number
SG11201811394UA
SG11201811394UA SG11201811394UA SG11201811394UA SG11201811394UA SG 11201811394U A SG11201811394U A SG 11201811394UA SG 11201811394U A SG11201811394U A SG 11201811394UA SG 11201811394U A SG11201811394U A SG 11201811394UA SG 11201811394U A SG11201811394U A SG 11201811394UA
Authority
SG
Singapore
Prior art keywords
ultra
dilute
cleaning solution
international
ultrapure water
Prior art date
Application number
SG11201811394UA
Inventor
Abbas Rastegar
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG11201811394UA publication Critical patent/SG11201811394UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/2319—Methods of introducing gases into liquid media
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/405—Methods of mixing liquids with liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/49—Mixing systems, i.e. flow charts or diagrams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/70—Pre-treatment of the materials to be mixed
    • B01F23/708—Filtering materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3942—Inorganic per-compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • C11D2111/44—

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property 111111H1110111111111111111111111111111111111111111111111111111111111111111111111110111111 Organization International Bureau (10) International Publication Number 0 (43) International Publication Date ......0\"\" WO 2018/022370 Al 01 February 2018 (01.02.2018) WIP0 I PCT (51) International Patent Classification: (74) Agent: SERVILLA, Scott S.; Servilla Whitney LLC, 33 GO3F 7/20 (2006.01) Wood Avenue South, Suite 830, Iselin, New Jersey 08830 (21) International Application Number: (US). PCT/US2017/042745 (81) Designated States (unless otherwise indicated, for every (22) International Filing Date: kind of national protection available): AE, AG, AL, AM, 19 July 2017 (19.07.2017) AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, (25) Filing Language: English DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, (26) Publication Language: English HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (30) Priority Data: MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, 62/366,231 25 July 2016 (25.07.2016) US OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, 15/652,497 18 July 2017 (18.07.2017) US SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (71) Applicant: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue, Santa Clara, California 95054 (US). (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, (72) Inventor: RASTEGAR, Abbas; 3018 Patrick Road, Sch-GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, enectady, New York 12303 (US). UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, = (54) Title: CLEANING SOLUTION MIXING SYSTEM WITH ULTRA-DILUTE CLEANING SOLUTION AND METHOD OF OPERATION THEREOF = = = = — BULK CHEMICAL DELIVERY SYSTEM 112 = = EXHAUST ULTRAPURE WATER SOURCE ► 106 = 110 = — ► CLEANING TOOL 100 CLEANING CHAMBER 102 = = = — CLEANING SOLUTION DRAIN = MIXING SYSTEM 108 — — = 104 4 I CONTROL SIGNAL _. 11 FIG. 1 0 IN cr) N (57) : Disclosed are a cleaning solution mixing system, a tool and a method N source for providing ultrapure water; an ammonia filter for filtering ammonia 0 ---. hydrogen peroxide in gas form; an ammonia re-gas membrane for dissolving the GC ammoniated water; a hydrogen peroxide re-gas membrane for dissolving the 1-1 © ultra-dilute hydrogenated water; and a mixer for forming an ultra-dilute cleaning N and the ultra-dilute hydrogenated water. of operation thereof, including an ultrapure water in gas form; a hydrogen peroxide filter for filtering ammonia in the ultrapure water and forming ultra-dilute hydrogen peroxide in the ultrapure water and forming solution by mixing the ultra-dilute ammoniated water O [Continued on next page] WO 2018/022370 Al MIDEDIM01101 DIDIREIH0 110101111111111111111111111111111111111111111 EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, SK, SM, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))
SG11201811394UA 2016-07-25 2017-07-19 Cleaning solution mixing system with ultra-dilute cleaning solution and method of operation thereof SG11201811394UA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662366231P 2016-07-25 2016-07-25
US15/652,497 US10935896B2 (en) 2016-07-25 2017-07-18 Cleaning solution mixing system with ultra-dilute cleaning solution and method of operation thereof
PCT/US2017/042745 WO2018022370A1 (en) 2016-07-25 2017-07-19 Cleaning solution mixing system with ultra-dilute cleaning solution and method of operation thereof

Publications (1)

Publication Number Publication Date
SG11201811394UA true SG11201811394UA (en) 2019-02-27

Family

ID=60988401

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201811394UA SG11201811394UA (en) 2016-07-25 2017-07-19 Cleaning solution mixing system with ultra-dilute cleaning solution and method of operation thereof

Country Status (5)

Country Link
US (1) US10935896B2 (en)
JP (1) JP6932764B2 (en)
SG (1) SG11201811394UA (en)
TW (1) TWI726130B (en)
WO (1) WO2018022370A1 (en)

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Also Published As

Publication number Publication date
TWI726130B (en) 2021-05-01
JP2019523450A (en) 2019-08-22
TW201829053A (en) 2018-08-16
JP6932764B2 (en) 2021-09-08
US10935896B2 (en) 2021-03-02
US20180024447A1 (en) 2018-01-25
WO2018022370A1 (en) 2018-02-01

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