SG11201710822TA - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
SG11201710822TA
SG11201710822TA SG11201710822TA SG11201710822TA SG11201710822TA SG 11201710822T A SG11201710822T A SG 11201710822TA SG 11201710822T A SG11201710822T A SG 11201710822TA SG 11201710822T A SG11201710822T A SG 11201710822TA SG 11201710822T A SG11201710822T A SG 11201710822TA
Authority
SG
Singapore
Prior art keywords
recording medium
magnetic recording
magnetic
medium
recording
Prior art date
Application number
SG11201710822TA
Inventor
Shinji Uchida
Hitoshi Nakata
Tomohiro Moriya
Akira Furuta
Takehito Shimatsu
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Publication of SG11201710822TA publication Critical patent/SG11201710822TA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7379—Seed layer, e.g. at least one non-magnetic layer is specifically adapted as a seed or seeding layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/657—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing inorganic, non-oxide compound of Si, N, P, B, H or C, e.g. in metal alloy or compound
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • G11B5/737—Physical structure of underlayer, e.g. texture
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/252—Al
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/254—Noble metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/257—Refractory metals
    • C03C2217/258—Ti, Zr, Hf
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/257—Refractory metals
    • C03C2217/259—V, Nb, Ta
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/261—Iron-group metals, i.e. Fe, Co or Ni
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
SG11201710822TA 2016-01-12 2017-01-05 Magnetic recording medium SG11201710822TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016003577 2016-01-12
PCT/JP2017/000160 WO2017122575A1 (en) 2016-01-12 2017-01-05 Magnetic recording medium

Publications (1)

Publication Number Publication Date
SG11201710822TA true SG11201710822TA (en) 2018-02-27

Family

ID=59312119

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201710822TA SG11201710822TA (en) 2016-01-12 2017-01-05 Magnetic recording medium

Country Status (6)

Country Link
US (1) US10847181B2 (en)
JP (1) JP6406462B2 (en)
CN (1) CN107735835B (en)
MY (1) MY181803A (en)
SG (1) SG11201710822TA (en)
WO (1) WO2017122575A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111435703B (en) * 2019-01-14 2024-03-22 联华电子股份有限公司 Magnetic tunneling junction device and forming method thereof
JP7388226B2 (en) * 2020-02-13 2023-11-29 株式会社レゾナック Magnetic recording medium, manufacturing method thereof, and magnetic storage device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7158346B2 (en) * 2003-12-23 2007-01-02 Seagate Technology Llc Heat assisted magnetic recording film including superparamagnetic nanoparticles dispersed in an antiferromagnetic or ferrimagnetic matrix
JP2005276365A (en) * 2004-03-25 2005-10-06 Toshiba Corp Granular thin film, vertical magnetic recording medium, and magnetic recording/reproducing device
US7405011B2 (en) 2004-06-30 2008-07-29 Hitachi Global Storage Technologies Netherlands B.V. Magnetic recording media for tilted recording
JP2006155865A (en) 2004-10-29 2006-06-15 Ken Takahashi Perpendicular magnetic recording medium and perpendicular magnetic recording/reproducing device
JP4975335B2 (en) * 2006-02-16 2012-07-11 株式会社東芝 Magnetoresistive element, magnetic head, and magnetic recording / reproducing apparatus
US8063459B2 (en) * 2007-02-12 2011-11-22 Avalanche Technologies, Inc. Non-volatile magnetic memory element with graded layer
JP4993296B2 (en) 2007-11-29 2012-08-08 富士電機株式会社 Perpendicular magnetic recording medium
JP5561773B2 (en) 2010-06-29 2014-07-30 昭和電工株式会社 Thermally assisted magnetic recording medium and magnetic storage device
EP2628198B1 (en) * 2010-10-15 2016-06-29 The Regents of the University of Michigan Materials for controlling the epitaxial growth of photoactive layers in photovoltaic devices
JP2012195027A (en) 2011-03-15 2012-10-11 Toshiba Corp Magnetic recording medium, method of manufacturing the same, and magnetic recording/reproducing apparatus
US9245563B2 (en) * 2011-05-17 2016-01-26 Showa Denko K.K. Magnetic medium with an orientation control layer
JP5613910B2 (en) * 2011-05-17 2014-10-29 三菱マテリアル株式会社 Method for manufacturing PZT ferroelectric thin film
JP5444447B2 (en) 2012-12-21 2014-03-19 株式会社東芝 Magnetic recording medium, manufacturing method thereof, and magnetic recording / reproducing apparatus
JP6199618B2 (en) * 2013-04-12 2017-09-20 昭和電工株式会社 Magnetic recording medium, magnetic storage device
JP6145332B2 (en) * 2013-06-20 2017-06-07 昭和電工株式会社 Magnetic recording medium, magnetic storage device
JP6317896B2 (en) 2013-07-26 2018-04-25 昭和電工株式会社 Magnetic recording medium and magnetic storage device
JP2015135713A (en) 2014-01-17 2015-07-27 株式会社東芝 Perpendicular magnetic recording medium, perpendicular magnetic recording medium manufacturing method, and magnetic recording-reproducing apparatus

Also Published As

Publication number Publication date
CN107735835A (en) 2018-02-23
US10847181B2 (en) 2020-11-24
WO2017122575A1 (en) 2017-07-20
JP6406462B2 (en) 2018-10-17
MY181803A (en) 2021-01-07
US20180122415A1 (en) 2018-05-03
JPWO2017122575A1 (en) 2018-04-12
CN107735835B (en) 2019-09-27

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