SG11201707614UA - Resist liquid storage container, resist liquid supply device, resist liquid application device, resist liquid preservation device, and mask blank manufacturing method - Google Patents

Resist liquid storage container, resist liquid supply device, resist liquid application device, resist liquid preservation device, and mask blank manufacturing method

Info

Publication number
SG11201707614UA
SG11201707614UA SG11201707614UA SG11201707614UA SG11201707614UA SG 11201707614U A SG11201707614U A SG 11201707614UA SG 11201707614U A SG11201707614U A SG 11201707614UA SG 11201707614U A SG11201707614U A SG 11201707614UA SG 11201707614U A SG11201707614U A SG 11201707614UA
Authority
SG
Singapore
Prior art keywords
resist liquid
storage container
mask blank
blank manufacturing
supply device
Prior art date
Application number
SG11201707614UA
Inventor
Hiroshi Shirotori
Mitsuhiro Shirakura
Yusuke Honma
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG11201707614UA publication Critical patent/SG11201707614UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SG11201707614UA 2015-03-26 2016-03-07 Resist liquid storage container, resist liquid supply device, resist liquid application device, resist liquid preservation device, and mask blank manufacturing method SG11201707614UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015063639A JP6495063B2 (en) 2015-03-26 2015-03-26 Resist solution storage container, resist solution supply device, resist solution coating device, resist solution storage device, and mask blank manufacturing method
PCT/JP2016/056937 WO2016152472A1 (en) 2015-03-26 2016-03-07 Resist liquid storage container, resist liquid supply device, resist liquid application device, resist liquid preservation device, and mask blank manufacturing method

Publications (1)

Publication Number Publication Date
SG11201707614UA true SG11201707614UA (en) 2017-10-30

Family

ID=56977413

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201707614UA SG11201707614UA (en) 2015-03-26 2016-03-07 Resist liquid storage container, resist liquid supply device, resist liquid application device, resist liquid preservation device, and mask blank manufacturing method

Country Status (5)

Country Link
JP (1) JP6495063B2 (en)
KR (1) KR102536128B1 (en)
SG (1) SG11201707614UA (en)
TW (1) TWI689356B (en)
WO (1) WO2016152472A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2026157B1 (en) * 2020-07-29 2022-03-29 Suss Microtec Lithography Gmbh Adapter, Connection Device and Supply System

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0408583B1 (en) 1988-02-16 1995-11-15 Now Technologies Inc. Container and dispensing system for liquid chemicals
JPH07123107B2 (en) * 1991-07-22 1995-12-25 株式会社イワキ Fluid dropping supply device
JPH0920359A (en) * 1995-07-05 1997-01-21 Hitachi Ltd Solution supplying device
JP3176540B2 (en) 1995-10-02 2001-06-18 アイセロ化学株式会社 High purity resin composition and molded article of the resin composition
WO2007146892A2 (en) * 2006-06-13 2007-12-21 Advanced Technology Materials, Inc. Liquid dispensing systems encompassing gas removal
JP2008140964A (en) * 2006-12-01 2008-06-19 Matsushita Electric Ind Co Ltd Chemical supply apparatus, and method for manufacturing semiconductor device
KR101470051B1 (en) * 2007-08-28 2014-12-05 엔테그리스, 아이엔씨. Method and apparatus for dispensing fluids
JP2009241056A (en) * 2008-03-10 2009-10-22 Toray Ind Inc Method and apparatus for defoaming coating liquid, and method for manufacturing display member
JP5471281B2 (en) * 2009-10-19 2014-04-16 大日本印刷株式会社 Liquid supply system, liquid supply method, and coating apparatus
JP6106394B2 (en) * 2012-09-20 2017-03-29 Hoya株式会社 Resist solution supply device, resist coating device, resist solution temperature control method, resist solution storage device, and mask blank manufacturing method

Also Published As

Publication number Publication date
WO2016152472A1 (en) 2016-09-29
JP6495063B2 (en) 2019-04-03
JP2016184640A (en) 2016-10-20
KR102536128B1 (en) 2023-05-25
TWI689356B (en) 2020-04-01
TW201703875A (en) 2017-02-01
KR20170129760A (en) 2017-11-27

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