SG11201704357TA - Single-crystal diamond material, single-crystal diamond chip, and perforated tool - Google Patents
Single-crystal diamond material, single-crystal diamond chip, and perforated toolInfo
- Publication number
- SG11201704357TA SG11201704357TA SG11201704357TA SG11201704357TA SG11201704357TA SG 11201704357T A SG11201704357T A SG 11201704357TA SG 11201704357T A SG11201704357T A SG 11201704357TA SG 11201704357T A SG11201704357T A SG 11201704357TA SG 11201704357T A SG11201704357T A SG 11201704357TA
- Authority
- SG
- Singapore
- Prior art keywords
- crystal diamond
- chip
- perforated tool
- diamond material
- perforated
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21C—MANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
- B21C3/00—Profiling tools for metal drawing; Combinations of dies and mandrels
- B21C3/02—Dies; Selection of material therefor; Cleaning thereof
- B21C3/025—Dies; Selection of material therefor; Cleaning thereof comprising diamond parts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
- C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/186—Epitaxial-layer growth characterised by the substrate being specially pre-treated by, e.g. chemical or physical means
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B9/00—Single-crystal growth from melt solutions using molten solvents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/31—Diamond
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Drilling Tools (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015145025 | 2015-07-22 | ||
PCT/JP2016/071603 WO2017014311A1 (en) | 2015-07-22 | 2016-07-22 | Single crystal diamond material, single crystal diamond tip, and drilling tool |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201704357TA true SG11201704357TA (en) | 2017-06-29 |
Family
ID=57834394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201704357TA SG11201704357TA (en) | 2015-07-22 | 2016-07-22 | Single-crystal diamond material, single-crystal diamond chip, and perforated tool |
Country Status (7)
Country | Link |
---|---|
US (2) | US10287708B2 (en) |
EP (1) | EP3327179B1 (en) |
JP (1) | JP6118954B1 (en) |
KR (1) | KR102626684B1 (en) |
CN (1) | CN107109691B (en) |
SG (1) | SG11201704357TA (en) |
WO (1) | WO2017014311A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6118954B1 (en) * | 2015-07-22 | 2017-04-19 | 住友電気工業株式会社 | Single crystal diamond material, single crystal diamond tips and drilling tools |
JPWO2020031871A1 (en) * | 2018-08-06 | 2021-08-26 | 住友電工ハードメタル株式会社 | Turning tool |
CN116348624A (en) * | 2020-10-22 | 2023-06-27 | 住友电工硬质合金株式会社 | Diamond sintered body and tool provided with diamond sintered body |
EP4269004A4 (en) * | 2020-12-24 | 2024-01-24 | Sumitomo Electric Hardmetal Corp | Method for producing diamond tool intermediate and method for determining single crystal diamond |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59229227A (en) | 1983-06-08 | 1984-12-22 | Sumitomo Electric Ind Ltd | Die using single crystal of synthetic diamond |
JP2620252B2 (en) * | 1987-09-17 | 1997-06-11 | 住友電気工業株式会社 | Method for producing nitrogen-containing hard carbon film |
DE69016240T3 (en) * | 1989-04-06 | 1999-03-11 | Sumitomo Electric Industries | Diamond for dressing device |
JP4291886B2 (en) * | 1994-12-05 | 2009-07-08 | 住友電気工業株式会社 | Low defect diamond single crystal and synthesis method thereof |
DE69717635T2 (en) | 1996-07-30 | 2003-04-10 | Drukker Internat B V | METHOD FOR PRODUCING A CUTTING INSERT FOR CUTTING TOOL |
US6858080B2 (en) * | 1998-05-15 | 2005-02-22 | Apollo Diamond, Inc. | Tunable CVD diamond structures |
JP2000288804A (en) | 1999-04-06 | 2000-10-17 | Osaka Diamond Ind Co Ltd | Diamond cutting tool |
JP3554700B2 (en) | 2000-09-27 | 2004-08-18 | 株式会社アライドマテリアル | Diamond dies |
GB0220772D0 (en) * | 2002-09-06 | 2002-10-16 | Diamanx Products Ltd | Coloured diamond |
JP2004214264A (en) * | 2002-12-27 | 2004-07-29 | Sumitomo Electric Ind Ltd | LOW-RESISTANCE n-TYPE SEMICONDUCTOR DIAMOND AND ITS MANUFACTURING METHOD |
EP1671726B1 (en) * | 2003-10-10 | 2013-02-13 | Sumitomo Electric Industries, Ltd. | Diamond tool |
WO2007018555A2 (en) * | 2004-09-10 | 2007-02-15 | Carnegie Institution Of Washington | Ultratough cvd single crystal diamond and three dimensional growth thereof |
JP5323492B2 (en) * | 2005-12-09 | 2013-10-23 | エレメント シックス テクノロジーズ (プロプライアタリー) リミテッド | Synthetic diamond with high crystal quality |
GB2481283B (en) * | 2010-06-03 | 2013-07-17 | Element Six Ltd | A method of increasing the toughness and/or wear resistance of diamond tool pieces and diamond tool pieces fabricated by said method |
GB201121642D0 (en) * | 2011-12-16 | 2012-01-25 | Element Six Ltd | Single crtstal cvd synthetic diamond material |
CN104395508B (en) * | 2012-06-29 | 2016-12-21 | 住友电气工业株式会社 | Diamond single crystal, its manufacture method and MONOCRYSTAL DIAMOND TOOLS |
EP2824649A1 (en) * | 2013-07-12 | 2015-01-14 | GN Store Nord A/S | Audio based learning system comprising a portable terminal connected to an audio unit and plurality of zones |
JP6228404B2 (en) * | 2013-08-09 | 2017-11-08 | 住友電気工業株式会社 | Diamond composite, diamond bonded body, single crystal diamond and tool including the same |
EP3170926A4 (en) | 2014-07-15 | 2018-07-11 | Sumitomo Electric Industries, Ltd. | Single crystal diamond, method for producing single crystal diamond, and tool using single crystal diamond |
JP6708972B2 (en) | 2014-07-22 | 2020-06-10 | 住友電気工業株式会社 | Single crystal diamond and its manufacturing method, tool containing single crystal diamond, and component containing single crystal diamond |
CN107109690B (en) * | 2014-10-29 | 2019-08-20 | 住友电气工业株式会社 | Single crystal diamond material and tool, radiation temperature monitor and infrared optics component including the diamond |
JP6118954B1 (en) * | 2015-07-22 | 2017-04-19 | 住友電気工業株式会社 | Single crystal diamond material, single crystal diamond tips and drilling tools |
-
2016
- 2016-07-22 JP JP2016575598A patent/JP6118954B1/en active Active
- 2016-07-22 WO PCT/JP2016/071603 patent/WO2017014311A1/en active Application Filing
- 2016-07-22 EP EP16827871.1A patent/EP3327179B1/en active Active
- 2016-07-22 KR KR1020177018690A patent/KR102626684B1/en active IP Right Grant
- 2016-07-22 US US15/519,757 patent/US10287708B2/en active Active
- 2016-07-22 CN CN201680006136.0A patent/CN107109691B/en active Active
- 2016-07-22 SG SG11201704357TA patent/SG11201704357TA/en unknown
-
2019
- 2019-03-20 US US16/359,638 patent/US10774442B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20190218685A1 (en) | 2019-07-18 |
JPWO2017014311A1 (en) | 2017-07-20 |
US10774442B2 (en) | 2020-09-15 |
EP3327179A1 (en) | 2018-05-30 |
US20170241042A1 (en) | 2017-08-24 |
KR20180034301A (en) | 2018-04-04 |
EP3327179B1 (en) | 2023-08-23 |
WO2017014311A9 (en) | 2017-05-11 |
KR102626684B1 (en) | 2024-01-17 |
EP3327179A4 (en) | 2019-01-23 |
WO2017014311A1 (en) | 2017-01-26 |
CN107109691A (en) | 2017-08-29 |
CN107109691B (en) | 2021-05-25 |
US10287708B2 (en) | 2019-05-14 |
JP6118954B1 (en) | 2017-04-19 |
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