SG11201601245VA - Plating apparatus and sensing device using same - Google Patents

Plating apparatus and sensing device using same

Info

Publication number
SG11201601245VA
SG11201601245VA SG11201601245VA SG11201601245VA SG11201601245VA SG 11201601245V A SG11201601245V A SG 11201601245VA SG 11201601245V A SG11201601245V A SG 11201601245VA SG 11201601245V A SG11201601245V A SG 11201601245VA SG 11201601245V A SG11201601245V A SG 11201601245VA
Authority
SG
Singapore
Prior art keywords
same
sensing device
plating apparatus
plating
sensing
Prior art date
Application number
SG11201601245VA
Other languages
English (en)
Inventor
Wataru Yamamoto
Kimiko Koiwa
Takayuki Homma
Masahiro Yanagisawa
Mikiko Saito
Tomoyuki Yamamoto
Original Assignee
Yamamoto Ms Co Ltd
Univ Waseda
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamamoto Ms Co Ltd, Univ Waseda filed Critical Yamamoto Ms Co Ltd
Publication of SG11201601245VA publication Critical patent/SG11201601245VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1619—Apparatus for electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1619—Apparatus for electroless plating
    • C23C18/1628—Specific elements or parts of the apparatus
    • C23C18/163—Supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1675—Process conditions
    • C23C18/1683—Control of electrolyte composition, e.g. measurement, adjustment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004—Sealing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008—Current shielding devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)
SG11201601245VA 2013-08-19 2014-07-31 Plating apparatus and sensing device using same SG11201601245VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013169504A JP6226229B2 (ja) 2013-08-19 2013-08-19 めっき装置及びこれを用いたセンサ装置
PCT/JP2014/070252 WO2015025693A1 (ja) 2013-08-19 2014-07-31 めっき装置及びこれを用いたセンサ装置

Publications (1)

Publication Number Publication Date
SG11201601245VA true SG11201601245VA (en) 2016-03-30

Family

ID=52483474

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201601245VA SG11201601245VA (en) 2013-08-19 2014-07-31 Plating apparatus and sensing device using same

Country Status (7)

Country Link
US (1) US20160230285A1 (ja)
EP (1) EP3037573B1 (ja)
JP (1) JP6226229B2 (ja)
KR (1) KR101773308B1 (ja)
CN (1) CN105473770B (ja)
SG (1) SG11201601245VA (ja)
WO (1) WO2015025693A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018136769A1 (en) * 2017-01-19 2018-07-26 Aegion Coating Services, Llc Pipe joint inspection
JP6993288B2 (ja) * 2018-05-07 2022-01-13 株式会社荏原製作所 めっき装置
JP7193418B2 (ja) * 2019-06-13 2022-12-20 株式会社荏原製作所 めっき装置
CN115142104B (zh) * 2022-07-28 2024-04-26 福州一策仪器有限公司 电镀装置、多通道电镀装置组和电镀反应系统
KR20240079097A (ko) * 2022-11-28 2024-06-04 (주)애니캐스팅 기판과 전원 연결이 용이한 ｓ-ｅｃａｍ 프린팅 장치

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2711270A1 (de) * 1976-03-16 1977-09-22 Ici Ltd Organische materialien mit spezifisch reaktiven gruppen
JPS61172167U (ja) * 1985-04-15 1986-10-25
KR200142727Y1 (ko) * 1996-11-08 1999-06-01 정몽규 Egr밸브 장착구조
JPH11195622A (ja) * 1997-12-26 1999-07-21 Ebara Corp ウエハのメッキ用治具
KR100597024B1 (ko) * 1998-03-02 2006-07-04 가부시키가이샤 에바라 세이사꾸쇼 기판의 도금장치
JP3939456B2 (ja) * 1998-03-05 2007-07-04 株式会社荏原製作所 基板のめっき方法及び装置
US20060049038A1 (en) * 2003-02-12 2006-03-09 Surfect Technologies, Inc. Dynamic profile anode
JP2006299367A (ja) * 2005-04-22 2006-11-02 Yamamoto Mekki Shikenki:Kk 電気めっき試験器
JP2006348373A (ja) * 2005-06-20 2006-12-28 Yamamoto Mekki Shikenki:Kk 電気めっき用治具
US7935230B2 (en) * 2006-06-29 2011-05-03 Semitool, Inc. Electro-chemical processor
JP2008076143A (ja) * 2006-09-20 2008-04-03 Citizen Holdings Co Ltd ヘモグロビン濃度測定装置
CN101250726B (zh) * 2007-11-28 2010-08-18 北京矿冶研究总院 密闭式电解槽及电解系统
JP4939484B2 (ja) * 2008-05-30 2012-05-23 株式会社山本鍍金試験器 電気めっき用陰極カートリッジ
CN201713591U (zh) * 2009-12-30 2011-01-19 中国电子科技集团公司第二研究所 硅太阳能电池片电极电镀设备
JP5540789B2 (ja) * 2010-03-17 2014-07-02 マツダ株式会社 電気自動車のバッテリ及びモータの搭載構造
AT510593B1 (de) * 2010-12-15 2012-05-15 Markus Dipl Ing Dr Hacksteiner Vorrichtung zum metallisieren von wafern
JP5719687B2 (ja) * 2011-05-19 2015-05-20 日東電工株式会社 無電解めっき装置、無電解めっき方法および配線回路基板の製造方法
JP5576848B2 (ja) * 2011-12-07 2014-08-20 株式会社山本鍍金試験器 板状部材保持用冶具

Also Published As

Publication number Publication date
EP3037573A4 (en) 2017-04-19
US20160230285A1 (en) 2016-08-11
CN105473770A (zh) 2016-04-06
EP3037573A1 (en) 2016-06-29
CN105473770B (zh) 2017-09-08
KR101773308B1 (ko) 2017-08-30
EP3037573B1 (en) 2018-03-14
JP2015038232A (ja) 2015-02-26
KR20160045758A (ko) 2016-04-27
WO2015025693A1 (ja) 2015-02-26
JP6226229B2 (ja) 2017-11-08

Similar Documents

Publication Publication Date Title
GB2521611B (en) Electrosurgical apparatus and electrosurgical device
GB201323171D0 (en) Electrosurgical apparatus and device
GB201309568D0 (en) Methods and apparatus
EP2994785A4 (en) METHODS AND APPARATUS FOR DETECTING HYDROCARBON
EP2980007A4 (en) METHOD AND DEVICE FOR CLEANING A FILLING DEVICE
EP2953116A4 (en) DISPLAY DEVICE AND DEVICE
EP2980558A4 (en) MEASURING DEVICE AND MEASURING METHOD
EP2956788A4 (en) APPARATUS AND METHOD FOR POSITION DETECTION
EP2977754A4 (en) DEVICE FOR DETECTING MAGNETIC CHARACTERISTICS
EP3024273A4 (en) SIGNAL MEASUREMENT METHOD AND DEVICE
EP3040708A4 (en) DEVICE AND METHOD FOR MEASURING OPTICAL CHARACTERISTICS
HK1212541A1 (en) Electronic device carrying apparatus
EP2952877A4 (en) GAS BARRIER PERFORMANCE EVALUATION DEVICE AND EVALUATION METHOD
GB201322029D0 (en) Electronic apparatus and associated methods
EP2952876A4 (en) GAS BARRIER PERFORMANCE EVALUATION DEVICE AND EVALUATION METHOD
EP2975417A4 (en) MEASURING DEVICE AND MOUNTING UNIT
EP2978139A4 (en) RECEIVING DEVICE AND RECEIVING METHOD
EP2946614A4 (en) METHOD AND APPARATUS
ZA201509241B (en) Signal measurement method and device
GB201604534D0 (en) Nucleic-acid-sequence determination device and nucleic-acid-sequence determination method
SG11201601245VA (en) Plating apparatus and sensing device using same
EP2980838A4 (en) PROBE DEVICE
EP2980839A4 (en) PROBE DEVICE
SG11201505549QA (en) Communication-information measuring device and program
GB201300403D0 (en) Flow sensors and apparatus