SG11201600268YA - Method and apparatus for chip-to-wafer integration - Google Patents
Method and apparatus for chip-to-wafer integrationInfo
- Publication number
- SG11201600268YA SG11201600268YA SG11201600268YA SG11201600268YA SG11201600268YA SG 11201600268Y A SG11201600268Y A SG 11201600268YA SG 11201600268Y A SG11201600268Y A SG 11201600268YA SG 11201600268Y A SG11201600268Y A SG 11201600268YA SG 11201600268Y A SG11201600268Y A SG 11201600268YA
- Authority
- SG
- Singapore
- Prior art keywords
- chip
- wafer integration
- wafer
- integration
- Prior art date
Links
- 230000010354 integration Effects 0.000 title 1
Classifications
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- H01L2224/83193—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed on both the semiconductor or solid-state body and another item or body to be connected to the semiconductor or solid-state body
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- H01L2224/832—Applying energy for connecting
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- H01L2224/83209—Compression bonding applying isostatic pressure, e.g. degassing using vacuum or a pressurised liquid
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- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83855—Hardening the adhesive by curing, i.e. thermosetting
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- H01L2224/83855—Hardening the adhesive by curing, i.e. thermosetting
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- H01L2224/83855—Hardening the adhesive by curing, i.e. thermosetting
- H01L2224/83862—Heat curing
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- H01L2224/83905—Combinations of bonding methods provided for in at least two different groups from H01L2224/838 - H01L2224/83904
- H01L2224/83907—Intermediate bonding, i.e. intermediate bonding step for temporarily bonding the semiconductor or solid-state body, followed by at least a further bonding step
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- H01L2224/83909—Post-treatment of the layer connector or bonding area
- H01L2224/8391—Cleaning, e.g. oxide removal step, desmearing
- H01L2224/83911—Chemical cleaning, e.g. etching, flux
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- H01L2224/92—Specific sequence of method steps
- H01L2224/9205—Intermediate bonding steps, i.e. partial connection of the semiconductor or solid-state body during the connecting process
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- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
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- H01L2224/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
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- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06513—Bump or bump-like direct electrical connections between devices, e.g. flip-chip connection, solder bumps
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- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06541—Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
- H01L2225/065—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/06503—Stacked arrangements of devices
- H01L2225/06593—Mounting aids permanently on device; arrangements for alignment
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Wire Bonding (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG11201600268YA SG11201600268YA (en) | 2013-07-16 | 2014-07-16 | Method and apparatus for chip-to-wafer integration |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG2013054390 | 2013-07-16 | ||
SG11201600268YA SG11201600268YA (en) | 2013-07-16 | 2014-07-16 | Method and apparatus for chip-to-wafer integration |
PCT/SG2014/000335 WO2015009238A1 (en) | 2013-07-16 | 2014-07-16 | Method and apparatus for chip-to-wafer integration |
Publications (1)
Publication Number | Publication Date |
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SG11201600268YA true SG11201600268YA (en) | 2016-02-26 |
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SG11201600268YA SG11201600268YA (en) | 2013-07-16 | 2014-07-16 | Method and apparatus for chip-to-wafer integration |
Country Status (4)
Country | Link |
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US (1) | US9613928B2 (ja) |
JP (1) | JP6446450B2 (ja) |
SG (1) | SG11201600268YA (ja) |
WO (1) | WO2015009238A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20190116198A (ko) * | 2019-09-24 | 2019-10-14 | 엘지전자 주식회사 | 마이크로 led를 이용한 디스플레이 장치 및 이의 제조 방법 |
WO2021188042A1 (en) * | 2020-03-18 | 2021-09-23 | Airise Pte. Ltd. | Bonding apparatus, system, and method of bonding |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4933042A (en) * | 1986-09-26 | 1990-06-12 | General Electric Company | Method for packaging integrated circuit chips employing a polymer film overlay layer |
WO1988002551A1 (en) * | 1986-09-26 | 1988-04-07 | General Electric Company | Method and apparatus for packaging integrated circuit chips employing a polymer film overlay layer |
US5352629A (en) * | 1993-01-19 | 1994-10-04 | General Electric Company | Process for self-alignment and planarization of semiconductor chips attached by solder die adhesive to multi-chip modules |
US5605547A (en) * | 1995-03-27 | 1997-02-25 | Micron Technology, Inc. | Method and apparatus for mounting a component to a substrate using an anisotropic adhesive, a compressive cover film, and a conveyor |
JP2010153670A (ja) * | 2008-12-26 | 2010-07-08 | Panasonic Corp | フリップチップ実装方法と半導体装置 |
JP2011124413A (ja) * | 2009-12-11 | 2011-06-23 | Murata Mfg Co Ltd | 電子部品モジュールの製造方法及び電子部品モジュール |
-
2014
- 2014-07-16 US US14/904,670 patent/US9613928B2/en active Active
- 2014-07-16 SG SG11201600268YA patent/SG11201600268YA/en unknown
- 2014-07-16 JP JP2016527976A patent/JP6446450B2/ja active Active
- 2014-07-16 WO PCT/SG2014/000335 patent/WO2015009238A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP6446450B2 (ja) | 2018-12-26 |
JP2016527718A (ja) | 2016-09-08 |
WO2015009238A1 (en) | 2015-01-22 |
US20160155720A1 (en) | 2016-06-02 |
US9613928B2 (en) | 2017-04-04 |
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