SG11201506995PA - Template for self assembly and method of making a self assembled pattern - Google Patents

Template for self assembly and method of making a self assembled pattern

Info

Publication number
SG11201506995PA
SG11201506995PA SG11201506995PA SG11201506995PA SG11201506995PA SG 11201506995P A SG11201506995P A SG 11201506995PA SG 11201506995P A SG11201506995P A SG 11201506995PA SG 11201506995P A SG11201506995P A SG 11201506995PA SG 11201506995P A SG11201506995P A SG 11201506995PA
Authority
SG
Singapore
Prior art keywords
self
template
making
assembled pattern
assembly
Prior art date
Application number
SG11201506995PA
Inventor
Jihoon Kim
Jingxiu Wan
Shinji Miyazaki
Guanyang Lin
Hengpeng Wu
Original Assignee
Az Electronic Materials Luxembourg S À R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Luxembourg S À R L filed Critical Az Electronic Materials Luxembourg S À R L
Publication of SG11201506995PA publication Critical patent/SG11201506995PA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/227—Removing surface-material, e.g. by engraving, by etching by etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
SG11201506995PA 2013-05-13 2014-05-09 Template for self assembly and method of making a self assembled pattern SG11201506995PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/892,890 US10457088B2 (en) 2013-05-13 2013-05-13 Template for self assembly and method of making a self assembled pattern
PCT/EP2014/059568 WO2014184114A1 (en) 2013-05-13 2014-05-09 Template for self assembly and method of making a self assembled pattern

Publications (1)

Publication Number Publication Date
SG11201506995PA true SG11201506995PA (en) 2015-10-29

Family

ID=50733045

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201800773UA SG10201800773UA (en) 2013-05-13 2014-05-09 Template for self assembly and method of making a self assembled pattern
SG11201506995PA SG11201506995PA (en) 2013-05-13 2014-05-09 Template for self assembly and method of making a self assembled pattern

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10201800773UA SG10201800773UA (en) 2013-05-13 2014-05-09 Template for self assembly and method of making a self assembled pattern

Country Status (9)

Country Link
US (1) US10457088B2 (en)
EP (1) EP2997422B1 (en)
JP (1) JP6501759B2 (en)
KR (1) KR102011180B1 (en)
CN (1) CN105324716B (en)
IL (1) IL242361B (en)
SG (2) SG10201800773UA (en)
TW (1) TWI690977B (en)
WO (1) WO2014184114A1 (en)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120164389A1 (en) * 2010-12-28 2012-06-28 Yang Xiaomin Imprint template fabrication and repair based on directed block copolymer assembly
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
US8686109B2 (en) 2012-03-09 2014-04-01 Az Electronic Materials (Luxembourg) S.A.R.L. Methods and materials for removing metals in block copolymers
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
US9181449B2 (en) 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
JP6558894B2 (en) * 2013-12-31 2019-08-14 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ DESIGN OF COPOLYMER, METHOD FOR PRODUCING THE SAME AND ARTICLE CONTAINING THE SAME
JP6702649B2 (en) 2013-12-31 2020-06-03 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ Method for controlling the properties of block copolymers and articles made from block copolymers
JP2015129261A (en) 2013-12-31 2015-07-16 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ Method of annealing block copolymer, article produced from block copolymer
US9190285B1 (en) * 2014-05-06 2015-11-17 International Business Machines Corporation Rework and stripping of complex patterning layers using chemical mechanical polishing
KR102156409B1 (en) 2014-09-16 2020-09-15 에스케이하이닉스 주식회사 Method of forming pattern
US9523917B2 (en) 2014-09-16 2016-12-20 SK Hynix Inc. Methods of forming patterns
WO2016080972A1 (en) * 2014-11-18 2016-05-26 Seagate Technology Llc Methods and apparatuses for directed self-assembly
JP6475963B2 (en) * 2014-12-05 2019-02-27 東京応化工業株式会社 Manufacturing method of structure containing base agent composition and phase separation structure
JP6491865B2 (en) * 2014-12-05 2019-03-27 東京応化工業株式会社 Manufacturing method of structure including base agent and phase separation structure
KR102395336B1 (en) * 2014-12-05 2022-05-06 도오꾜오까고오교 가부시끼가이샤 Brush composition, and method of producing structure containing phase-separated structure
US9738765B2 (en) * 2015-02-19 2017-08-22 International Business Machines Corporation Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers
EP3062334B1 (en) * 2015-02-27 2020-08-05 IMEC vzw Method for patterning an underlying layer
JP6581802B2 (en) * 2015-05-11 2019-09-25 東京応化工業株式会社 Method for producing structure including phase separation structure, block copolymer composition
FR3041357B1 (en) * 2015-09-17 2017-09-01 Rhodia Operations DETACHING SOLVENTS OF PHOTOSENSITIVE RESINS
KR20170051886A (en) * 2015-11-03 2017-05-12 삼성전자주식회사 Method for forming a pattern of a semiconductor device
WO2018008734A1 (en) * 2016-07-06 2018-01-11 Jsr株式会社 Film-forming composition, film formation method, and directed self-assembly lithography process
JP6997764B2 (en) 2016-08-18 2022-01-18 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング Polymer composition for self-assembling applications
JP6958561B2 (en) * 2016-09-13 2021-11-02 日産化学株式会社 Upper layer film forming composition and phase separation pattern manufacturing method
WO2018101741A1 (en) 2016-11-30 2018-06-07 주식회사 엘지화학 Laminate
SG10202108825RA (en) 2016-12-21 2021-09-29 Ridgefield Acquisition Novel compositions and processes for self-assembly of block copolymers
KR102308953B1 (en) 2017-03-10 2021-10-05 주식회사 엘지화학 Preparation method of patterened substrate
JP2018154760A (en) * 2017-03-17 2018-10-04 東芝メモリ株式会社 Pattern formation material and pattern formation method
US10964648B2 (en) * 2017-04-24 2021-03-30 International Business Machines Corporation Chip security fingerprint
TWI805617B (en) * 2017-09-15 2023-06-21 南韓商Ｌｇ化學股份有限公司 Laminate
JP7120517B2 (en) * 2017-10-27 2022-08-17 エルジー・ケム・リミテッド Random copolymer and pinning composition containing the same
US10812259B2 (en) 2017-10-31 2020-10-20 International Business Machines Corporation Self-assembly based random number generator
US11398428B2 (en) 2018-03-26 2022-07-26 Intel Corporation Multifunctional molecules for selective polymer formation on conductive surfaces and structures resulting therefrom
JP7310471B2 (en) * 2019-09-12 2023-07-19 Jsr株式会社 Pattern forming method and composition
WO2022243216A1 (en) 2021-05-18 2022-11-24 Merck Patent Gmbh Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB715913A (en) 1951-03-09 1954-09-22 Rohm & Haas Improvements in or relating to esters of vinyloxyalkoxy compounds and unsaturated carboxylic acids
FR1233582A (en) 1959-04-20 1960-10-12 Rhone Poulenc Sa Sulphonated azonitriles
US3285949A (en) 1964-04-17 1966-11-15 Goodrich Co B F Carboxyl-terminated butadiene polymers prepared in tertiary butanol with bis-azocyano acid initiation
US3474054A (en) 1966-09-13 1969-10-21 Permalac Corp The Surface coating compositions containing pyridine salts or aromatic sulfonic acids
US3919077A (en) 1972-12-29 1975-11-11 Darrell Duayne Whitehurst Sorbent for removal of heavy metals
US4251665A (en) 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US4200729A (en) 1978-05-22 1980-04-29 King Industries, Inc Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts
JPS58225103A (en) 1982-06-22 1983-12-27 Sumitomo Bakelite Co Ltd Crosslinking of thermoplastic resin
ATE73143T1 (en) 1985-12-23 1992-03-15 Shell Int Research OLEFINIC BENZOCYCLOBUTENE POLYMERS AND PROCESS FOR THEIR PREPARATION.
US4698394A (en) 1985-12-23 1987-10-06 Shell Oil Company Reactive styrene polymers
CA1293090C (en) 1986-09-29 1991-12-10 Pui Kwan Wong Olefinic benzocyclobutene polymers and processes for the preparation thereof
US5136029A (en) 1988-10-20 1992-08-04 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Hydrolyzable silyl group-containing azo compound
US5446125A (en) 1991-04-01 1995-08-29 Ocg Microelectronic Materials, Inc. Method for removing metal impurities from resist components
US5187019A (en) 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
US5571657A (en) 1993-09-30 1996-11-05 Shipley Company, Inc. Modified cation exhange process
JP3363051B2 (en) 1997-02-21 2003-01-07 丸善石油化学株式会社 Metal removal method for vinylphenol polymer
NL1014545C2 (en) 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim derivatives and their use as latent acids.
EP1095711B1 (en) 1999-10-27 2004-01-28 Novartis AG Process for coating a material surface
JP2003048929A (en) 2001-05-29 2003-02-21 Nippon Shokubai Co Ltd Curable resin composition
CN100378140C (en) 2001-06-20 2008-04-02 日本化药株式会社 Block copolymer reduced in impurity content, polymeric carrier, pharmaceutical preparations in polymeric form and process for preparation of the same
JP2003238682A (en) 2002-02-19 2003-08-27 Sumitomo Bakelite Co Ltd Method for removing metal from polyamide compound
CA2512586A1 (en) 2003-01-09 2004-07-29 Alcon, Inc. Dual function uv-absorbers for ophthalmic lens materials
US7471614B2 (en) 2003-08-29 2008-12-30 International Business Machines Corporation High density data storage medium
JP4377186B2 (en) 2003-09-24 2009-12-02 富士フイルム株式会社 Ink jet recording head and ink jet recording apparatus
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8168284B2 (en) 2005-10-06 2012-05-01 Wisconsin Alumni Research Foundation Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
US7411053B2 (en) 2006-05-25 2008-08-12 Harruna Issifu I Ligand-functionalized/azo compounds and methods of use thereof
JP2008088368A (en) 2006-10-04 2008-04-17 Canon Inc Process for producing composition containing polymer compound, composition and liquid imparting method
JP4752754B2 (en) 2006-12-20 2011-08-17 Ｊｓｒ株式会社 Two-layer laminated film and pattern forming method using the same
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US8372295B2 (en) * 2007-04-20 2013-02-12 Micron Technology, Inc. Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method
US8080615B2 (en) 2007-06-19 2011-12-20 Micron Technology, Inc. Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
JP2009017975A (en) * 2007-07-10 2009-01-29 Aruze Corp Game machine
US7790350B2 (en) 2007-07-30 2010-09-07 International Business Machines Corporation Method and materials for patterning a neutral surface
KR100930966B1 (en) 2007-09-14 2009-12-10 한국과학기술원 Nanostructures of block copolymers formed on surface patterns of shapes inconsistent with the nanostructures of block copolymers and methods for manufacturing the same
US9183870B2 (en) 2007-12-07 2015-11-10 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8017194B2 (en) 2008-01-17 2011-09-13 International Business Machines Corporation Method and material for a thermally crosslinkable random copolymer
US8999492B2 (en) * 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
US8426313B2 (en) 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
CN101364044B (en) * 2008-09-26 2011-07-27 北京大学 Minuteness processing method for upper substrate of glass
US7560141B1 (en) 2008-11-11 2009-07-14 International Business Machines Corporation Method of positioning patterns from block copolymer self-assembly
US8362179B2 (en) 2008-11-19 2013-01-29 Wisconsin Alumni Research Foundation Photopatternable imaging layers for controlling block copolymer microdomain orientation
JP5431012B2 (en) 2009-04-30 2014-03-05 株式会社ダイセル Copolymer, resin composition containing the copolymer, and cured product thereof
JP5222805B2 (en) 2009-07-09 2013-06-26 パナソニック株式会社 Self-organized pattern forming method
US8623458B2 (en) 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
US8309278B2 (en) 2010-07-07 2012-11-13 Massachusetts Institute Of Technology Guided self-assembly of block copolymer line structures for integrated circuit interconnects
DE102010034577B4 (en) 2010-08-17 2013-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. A process for making impact resistant ultra-thin dielectrics in electronic devices using crosslinkable polymeric dielectric materials
KR101781517B1 (en) 2010-09-30 2017-09-26 삼성디스플레이 주식회사 Block copolymer and method of forming patterns by using the same
KR20140027915A (en) * 2010-12-01 2014-03-07 모르포시스 아게 Simultaneous detection of biomolecules in single cells
US9469525B2 (en) * 2011-01-31 2016-10-18 Seagate Technology Llc Modified surface for block copolymer self-assembly
JP5846568B2 (en) * 2011-04-13 2016-01-20 東京応化工業株式会社 Method of manufacturing substrate having layer having phase separation structure on surface
KR101892623B1 (en) 2011-04-29 2018-08-30 삼성디스플레이 주식회사 Random copolymer for forming neutral surface and methods of manufacturing and using thereof
JP6064360B2 (en) 2011-05-11 2017-01-25 Jsr株式会社 Pattern forming method and resist underlayer film forming composition
WO2012161106A1 (en) 2011-05-26 2012-11-29 住友化学株式会社 Organic thin-film transistor insulating layer material
JP5240380B1 (en) 2011-07-05 2013-07-17 Ｊｓｒ株式会社 Resin composition, polymer, cured film and electronic component
US9182673B2 (en) * 2011-07-18 2015-11-10 Asml Netherlands B.V. Method for providing a template for a self-assemblable polymer for use in device lithography
US8691925B2 (en) 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof
WO2013050338A1 (en) 2011-10-03 2013-04-11 Asml Netherlands B.V. Method to provide a patterned orientation template for a self-assemblable polymer
CN104303103B (en) 2012-02-10 2019-04-26 得克萨斯大学体系董事会 The finishing coat of the acid anhydride copolymer of tropism control for film block copolymer
US8686109B2 (en) 2012-03-09 2014-04-01 Az Electronic Materials (Luxembourg) S.A.R.L. Methods and materials for removing metals in block copolymers
WO2013156240A1 (en) 2012-04-20 2013-10-24 Asml Netherlands B.V. Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
WO2013160027A1 (en) 2012-04-27 2013-10-31 Asml Netherlands B.V. Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers
US8835581B2 (en) 2012-06-08 2014-09-16 Az Electronic Materials (Luxembourg) S.A.R.L. Neutral layer polymer composition for directed self assembly and processes thereof
US9093263B2 (en) 2013-09-27 2015-07-28 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
US9181449B2 (en) 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using

Also Published As

Publication number Publication date
CN105324716B (en) 2019-09-27
TWI690977B (en) 2020-04-11
KR102011180B1 (en) 2019-08-14
CN105324716A (en) 2016-02-10
TW201515062A (en) 2015-04-16
US20140335324A1 (en) 2014-11-13
JP2016528713A (en) 2016-09-15
JP6501759B2 (en) 2019-04-17
IL242361B (en) 2019-08-29
WO2014184114A1 (en) 2014-11-20
US10457088B2 (en) 2019-10-29
KR20160006789A (en) 2016-01-19
EP2997422A1 (en) 2016-03-23
EP2997422B1 (en) 2019-08-14
SG10201800773UA (en) 2018-03-28

Similar Documents

Publication Publication Date Title
IL242361B (en) Template for self assembly and method of making a self assembled pattern
GB201313840D0 (en) Method of Manufacturing a Component
GB201313841D0 (en) Method of Manufacturing a Component
GB201313839D0 (en) Method of Manufacturing a Component
GB201317195D0 (en) Method of manufacturing a pattern and apparatus therefor
HUE060567T2 (en) Method of manufacturing a worked component
HK1209475A1 (en) A valve and a method of operating a valve
GB2515608B (en) Method of making a templating agent
GB201302013D0 (en) Screen assembly and a method of making same
IL239737A0 (en) Method of producing a protein
EP2986385A4 (en) Method of making a droplet-generating device
EP2860020C0 (en) Method of producing a three-dimensional object and corresponding object
SG11201507321WA (en) Template assembly and method of producing template assembly
SG11201507705TA (en) Pattern forming method
SG11201505242UA (en) Method for making a covering
ZA201506677B (en) Firelog and method of making a firelog
GB201313054D0 (en) Method of forming a desired pattern on a substrate
HK1219460A1 (en) Method of making a radial pattern assembly
GB2523422B (en) Web component and method of making a web component
GB2540066B (en) Method of making a templating agent
PL3007939T3 (en) Connection arrangement and method for producing a connection arrangement
GB2510609B (en) Method of manufacturing a beam
HK1222540A1 (en) Emulsion and production method therefor
GB2517929B (en) A method of making an improved hairnet
PL3043911T3 (en) Method for producing a mini-vial with a reduced number of components and the mini-vial thus obtained