SG11201503912WA - Composition for forming overlay film, and resist pattern formation method using same - Google Patents

Composition for forming overlay film, and resist pattern formation method using same

Info

Publication number
SG11201503912WA
SG11201503912WA SG11201503912WA SG11201503912WA SG11201503912WA SG 11201503912W A SG11201503912W A SG 11201503912WA SG 11201503912W A SG11201503912W A SG 11201503912WA SG 11201503912W A SG11201503912W A SG 11201503912WA SG 11201503912W A SG11201503912W A SG 11201503912WA
Authority
SG
Singapore
Prior art keywords
composition
same
resist pattern
formation method
pattern formation
Prior art date
Application number
SG11201503912WA
Inventor
Xiaowei Wang
Masato Suzuki
Tetsuo Okayasu
Georg Pawlowski
Wang Xiaowei
Suzuki Masato
Okayasu Tetsuo
Pawlowski Georg
Original Assignee
Az Electronic Materials Luxembourg Sarl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Luxembourg Sarl filed Critical Az Electronic Materials Luxembourg Sarl
Publication of SG11201503912WA publication Critical patent/SG11201503912WA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
    • C09D125/02—Homopolymers or copolymers of hydrocarbons
    • C09D125/04—Homopolymers or copolymers of styrene
    • C09D125/06—Polystyrene
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/02—Homopolymers or copolymers of unsaturated alcohols
    • C09D129/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
SG11201503912WA 2012-12-13 2013-12-12 Composition for forming overlay film, and resist pattern formation method using same SG11201503912WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012272516A JP5563051B2 (en) 2012-12-13 2012-12-13 Upper layer film forming composition and resist pattern forming method using the same
PCT/JP2013/083319 WO2014092149A1 (en) 2012-12-13 2013-12-12 Composition for forming overlay film, and resist pattern formation method using same

Publications (1)

Publication Number Publication Date
SG11201503912WA true SG11201503912WA (en) 2015-06-29

Family

ID=50934432

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201503912WA SG11201503912WA (en) 2012-12-13 2013-12-12 Composition for forming overlay film, and resist pattern formation method using same

Country Status (8)

Country Link
US (1) US9810988B2 (en)
EP (1) EP2933682B1 (en)
JP (1) JP5563051B2 (en)
KR (1) KR101936566B1 (en)
CN (1) CN104919370B (en)
SG (1) SG11201503912WA (en)
TW (1) TWI636332B (en)
WO (1) WO2014092149A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016013598A1 (en) * 2014-07-24 2016-01-28 日産化学工業株式会社 Composition for forming upper-layer resist film, and method for manufacturing semiconductor device using said composition
JP6419581B2 (en) 2015-01-08 2018-11-07 株式会社東芝 Semiconductor device manufacturing apparatus and semiconductor device manufacturing apparatus management method
KR20170108079A (en) * 2015-02-26 2017-09-26 후지필름 가부시키가이샤 A composition for forming an upper layer film, a pattern forming method using the same, and a manufacturing method of an electronic device
WO2017094860A1 (en) * 2015-12-02 2017-06-08 富士フイルム株式会社 Pattern formation method, method for manufacturing electronic device, laminate film, and upper layer film formation composition
JP6852234B2 (en) * 2019-03-29 2021-03-31 太陽インキ製造株式会社 Photoresist composition and its cured product
CN111925701A (en) * 2020-07-31 2020-11-13 江苏华夏制漆科技有限公司 Water-based thick-paste type outdoor floor coating
CN116003666B (en) * 2021-10-22 2024-04-26 上海芯刻微材料技术有限责任公司 Polymer and preparation method of 193nm photoetching top coating film containing same
CN116003665B (en) * 2021-10-22 2024-03-29 上海芯刻微材料技术有限责任公司 Polymer and preparation method of 193nm photoetching top coating film containing same
CN114395068B (en) * 2021-12-28 2023-11-03 宁波南大光电材料有限公司 BARC resin for 193nm deep ultraviolet photoresist with narrow distribution and preparation method thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG115693A1 (en) 2003-05-21 2005-10-28 Asml Netherlands Bv Method for coating a substrate for euv lithography and substrate with photoresist layer
JP2006189612A (en) * 2005-01-06 2006-07-20 Matsushita Electric Ind Co Ltd Material for forming barrier film and method for forming pattern using the same
JP4434984B2 (en) * 2005-02-18 2010-03-17 信越化学工業株式会社 Pattern forming method and pattern forming material
JP4496432B2 (en) * 2005-02-18 2010-07-07 信越化学工業株式会社 Photoresist underlayer film forming material and pattern forming method
JP4716027B2 (en) * 2006-08-11 2011-07-06 信越化学工業株式会社 Resist protective film material and pattern forming method
US8105754B2 (en) * 2008-01-04 2012-01-31 University Of Florida Research Foundation, Inc. Functionalized fullerenes for nanolithography applications
US20120021555A1 (en) 2010-07-23 2012-01-26 Taiwan Semiconductor Manufacturing Company, Ltd. Photovoltaic cell texturization
JP5395012B2 (en) * 2010-08-23 2014-01-22 信越化学工業株式会社 Resist underlayer film material, resist underlayer film forming method, pattern forming method, fullerene derivative
CN103168274B (en) 2010-10-21 2016-07-06 日产化学工业株式会社 EUV lithography resistant upper layer film formation compositions
CN102798902A (en) * 2012-07-23 2012-11-28 中国科学院长春光学精密机械与物理研究所 Novel multilayer film for improving extreme ultraviolet (EUV) spectral purity

Also Published As

Publication number Publication date
JP2014119497A (en) 2014-06-30
CN104919370A (en) 2015-09-16
EP2933682A4 (en) 2016-08-17
KR20150095828A (en) 2015-08-21
US20150331323A1 (en) 2015-11-19
JP5563051B2 (en) 2014-07-30
WO2014092149A1 (en) 2014-06-19
EP2933682A1 (en) 2015-10-21
TW201435511A (en) 2014-09-16
KR101936566B1 (en) 2019-01-10
EP2933682B1 (en) 2019-07-17
CN104919370B (en) 2019-07-19
US9810988B2 (en) 2017-11-07
TWI636332B (en) 2018-09-21

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