SG11201503197WA - Method for producing ozone gas-dissolved water and method for cleaning electronic material - Google Patents
Method for producing ozone gas-dissolved water and method for cleaning electronic materialInfo
- Publication number
- SG11201503197WA SG11201503197WA SG11201503197WA SG11201503197WA SG11201503197WA SG 11201503197W A SG11201503197W A SG 11201503197WA SG 11201503197W A SG11201503197W A SG 11201503197WA SG 11201503197W A SG11201503197W A SG 11201503197WA SG 11201503197W A SG11201503197W A SG 11201503197WA
- Authority
- SG
- Singapore
- Prior art keywords
- ozone gas
- electronic material
- dissolved water
- producing ozone
- cleaning electronic
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012241891A JP2014093357A (en) | 2012-11-01 | 2012-11-01 | Method for manufacturing ozone gas dissolved water and method for cleaning electronic material |
| PCT/JP2013/077570 WO2014069203A1 (en) | 2012-11-01 | 2013-10-10 | Method for manufacturing ozone-gas-dissolved water and cleaning method for electronic materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201503197WA true SG11201503197WA (en) | 2015-06-29 |
Family
ID=50627117
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201503197WA SG11201503197WA (en) | 2012-11-01 | 2013-10-10 | Method for producing ozone gas-dissolved water and method for cleaning electronic material |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20150303053A1 (en) |
| JP (1) | JP2014093357A (en) |
| KR (1) | KR20150079580A (en) |
| CN (1) | CN104995722B (en) |
| SG (1) | SG11201503197WA (en) |
| TW (1) | TWI601695B (en) |
| WO (1) | WO2014069203A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016064386A (en) * | 2014-09-18 | 2016-04-28 | 株式会社荏原製作所 | Gas dissolved water production device and method |
| KR101776017B1 (en) | 2015-10-27 | 2017-09-07 | 세메스 주식회사 | Dissolved ozone removal unit and Apparatus for treating a substrate including the unit, Method for removing a dissolved ozone, Method for cleaning a substrate |
| JP6428806B2 (en) * | 2017-02-07 | 2018-11-28 | 栗田工業株式会社 | Semiconductor substrate cleaning apparatus and semiconductor substrate cleaning method |
| US11434153B2 (en) | 2018-03-28 | 2022-09-06 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George Claude | Separation of ozone oxidation in liquid media into three unit operations for process optimization |
| US11084744B2 (en) | 2018-03-28 | 2021-08-10 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Method for mixing gas-free liquid oxidant with process liquid |
| US10851000B2 (en) | 2018-03-28 | 2020-12-01 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Systems for producing high-concentration of dissolved ozone in liquid media |
| CN112088422B (en) * | 2018-05-02 | 2023-11-28 | 国立大学法人东北大学 | Method for producing ozone water |
| US20220089981A1 (en) * | 2019-03-26 | 2022-03-24 | Fujimi Incorporated | Composition for surface treatment, method for producing the same, surface treatment method, and method for producing semiconductor substrate |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000197815A (en) * | 1999-01-08 | 2000-07-18 | Kurita Water Ind Ltd | Device for making ozone-dissolved water |
| JP2002316027A (en) * | 2001-04-19 | 2002-10-29 | Ebara Corp | Device and method for manufacturing gas-dissolved water, device and method for ultrasonic cleaning |
| JP2012146690A (en) * | 2009-03-31 | 2012-08-02 | Kurita Water Ind Ltd | Cleaning method for electronic material and cleaning apparatus for electronic material |
| JP2010234298A (en) * | 2009-03-31 | 2010-10-21 | Kurita Water Ind Ltd | Device for supplying water containing dissolved gas and method for producing water containing dissolved gas |
-
2012
- 2012-11-01 JP JP2012241891A patent/JP2014093357A/en active Pending
-
2013
- 2013-10-10 WO PCT/JP2013/077570 patent/WO2014069203A1/en active Application Filing
- 2013-10-10 CN CN201380057522.9A patent/CN104995722B/en active Active
- 2013-10-10 KR KR1020157008238A patent/KR20150079580A/en not_active Application Discontinuation
- 2013-10-10 SG SG11201503197WA patent/SG11201503197WA/en unknown
- 2013-10-10 US US14/439,126 patent/US20150303053A1/en not_active Abandoned
- 2013-10-23 TW TW102138254A patent/TWI601695B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2014069203A1 (en) | 2014-05-08 |
| KR20150079580A (en) | 2015-07-08 |
| TW201431797A (en) | 2014-08-16 |
| CN104995722B (en) | 2018-08-24 |
| CN104995722A (en) | 2015-10-21 |
| JP2014093357A (en) | 2014-05-19 |
| TWI601695B (en) | 2017-10-11 |
| US20150303053A1 (en) | 2015-10-22 |
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