SG11201406532YA - System for delivery of purified multiple phases of carbon dioxide to a process tool - Google Patents

System for delivery of purified multiple phases of carbon dioxide to a process tool

Info

Publication number
SG11201406532YA
SG11201406532YA SG11201406532YA SG11201406532YA SG11201406532YA SG 11201406532Y A SG11201406532Y A SG 11201406532YA SG 11201406532Y A SG11201406532Y A SG 11201406532YA SG 11201406532Y A SG11201406532Y A SG 11201406532YA SG 11201406532Y A SG11201406532Y A SG 11201406532YA
Authority
SG
Singapore
Prior art keywords
delivery
carbon dioxide
process tool
multiple phases
purified multiple
Prior art date
Application number
SG11201406532YA
Inventor
Souvik Banerjee
William R Gerristead
Original Assignee
Praxair Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Praxair Technology Inc filed Critical Praxair Technology Inc
Publication of SG11201406532YA publication Critical patent/SG11201406532YA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02101—Cleaning only involving supercritical fluids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
SG11201406532YA 2012-04-17 2013-04-15 System for delivery of purified multiple phases of carbon dioxide to a process tool SG11201406532YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261625265P 2012-04-17 2012-04-17
PCT/US2013/036547 WO2013158526A1 (en) 2012-04-17 2013-04-15 System for delivery of purified multiple phases of carbon dioxide to a process tool

Publications (1)

Publication Number Publication Date
SG11201406532YA true SG11201406532YA (en) 2014-11-27

Family

ID=49323970

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201406532YA SG11201406532YA (en) 2012-04-17 2013-04-15 System for delivery of purified multiple phases of carbon dioxide to a process tool
SG10201608702RA SG10201608702RA (en) 2012-04-17 2013-04-15 System for delivery of purified multiple phases of carbon dioxide to a process tool

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201608702RA SG10201608702RA (en) 2012-04-17 2013-04-15 System for delivery of purified multiple phases of carbon dioxide to a process tool

Country Status (8)

Country Link
US (1) US20130269732A1 (en)
EP (2) EP3667705A1 (en)
JP (1) JP6326041B2 (en)
KR (1) KR20150008404A (en)
CN (2) CN104380438B (en)
SG (2) SG11201406532YA (en)
TW (1) TWI576173B (en)
WO (1) WO2013158526A1 (en)

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FR3021553B1 (en) * 2014-05-28 2018-03-30 Dfd - Dense Fluid Degreasing METHOD AND DEVICE FOR SUPERCRITICAL FLUID TREATMENT WITH PASSIVE PUMPING
KR102411946B1 (en) 2015-07-08 2022-06-22 삼성전자주식회사 Apparatus for treating substrates using supercritical fluid, substrate treatment system including the same and method of treating substrates using the same
JP6498573B2 (en) * 2015-09-15 2019-04-10 東京エレクトロン株式会社 Substrate processing method, substrate processing apparatus, and storage medium
KR20180006716A (en) 2016-07-11 2018-01-19 세메스 주식회사 Apparatus and method fdr treating substrates
US10428306B2 (en) 2016-08-12 2019-10-01 Warsaw Orthopedic, Inc. Method and system for tissue treatment with critical/supercritical carbon dioxide
US10576493B2 (en) * 2017-03-14 2020-03-03 Tokyo Electron Limited Substrate processing apparatus and substrate processing method
CN109382403A (en) * 2017-08-08 2019-02-26 寰宇生物科技股份有限公司 Soil pollution processing system and its method
JP7109328B2 (en) * 2018-09-26 2022-07-29 東京エレクトロン株式会社 Substrate processing system
KR102075683B1 (en) * 2018-12-17 2020-03-02 세메스 주식회사 Apparatus and method fdr treating substrates
US20210340469A1 (en) * 2020-04-30 2021-11-04 Ashley Zachariah Method to remove explosive and toxic gases and clean metal surfaces in hydrocarbon equipment
US11640115B2 (en) 2020-09-04 2023-05-02 Samsung Electronics Co., Ltd. Substrate processing apparatus, semiconductor manufacturing equipment, and substrate processing method
CN112974412A (en) * 2021-02-23 2021-06-18 中国核动力研究设计院 Chemical decontamination method and device for radioactive pollution by supercritical carbon dioxide

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US7064070B2 (en) * 1998-09-28 2006-06-20 Tokyo Electron Limited Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
US6361696B1 (en) * 2000-01-19 2002-03-26 Aeronex, Inc. Self-regenerative process for contaminant removal from liquid and supercritical CO2 fluid streams
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US6960242B2 (en) * 2002-10-02 2005-11-01 The Boc Group, Inc. CO2 recovery process for supercritical extraction
US20040112409A1 (en) * 2002-12-16 2004-06-17 Supercritical Sysems, Inc. Fluoride in supercritical fluid for photoresist and residue removal
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Also Published As

Publication number Publication date
CN104380438A (en) 2015-02-25
TW201402234A (en) 2014-01-16
JP2015515147A (en) 2015-05-21
TWI576173B (en) 2017-04-01
EP2839503A1 (en) 2015-02-25
EP2839503A4 (en) 2016-03-23
WO2013158526A1 (en) 2013-10-24
CN108435679A (en) 2018-08-24
SG10201608702RA (en) 2016-12-29
KR20150008404A (en) 2015-01-22
JP6326041B2 (en) 2018-05-16
CN104380438B (en) 2018-11-06
US20130269732A1 (en) 2013-10-17
EP3667705A1 (en) 2020-06-17

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