SG11201402924XA - Optical calibration discs - Google Patents

Optical calibration discs

Info

Publication number
SG11201402924XA
SG11201402924XA SG11201402924XA SG11201402924XA SG11201402924XA SG 11201402924X A SG11201402924X A SG 11201402924XA SG 11201402924X A SG11201402924X A SG 11201402924XA SG 11201402924X A SG11201402924X A SG 11201402924XA SG 11201402924X A SG11201402924X A SG 11201402924XA
Authority
SG
Singapore
Prior art keywords
optical calibration
calibration discs
discs
optical
calibration
Prior art date
Application number
SG11201402924XA
Inventor
Nobuo Kurataka
Gennady Gauzner
Zhaoning Yu
Original Assignee
Seagate Technology Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seagate Technology Llc filed Critical Seagate Technology Llc
Publication of SG11201402924XA publication Critical patent/SG11201402924XA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B1/00—Layered products having a non-planar shape
    • B32B1/08—Tubular products
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00—Optical elements
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SG11201402924XA 2011-12-05 2012-12-04 Optical calibration discs SG11201402924XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/311,302 US20130143002A1 (en) 2011-12-05 2011-12-05 Method and system for optical callibration discs
PCT/US2012/067808 WO2013085930A1 (en) 2011-12-05 2012-12-04 Optical calibration discs

Publications (1)

Publication Number Publication Date
SG11201402924XA true SG11201402924XA (en) 2014-09-26

Family

ID=48524214

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201402924XA SG11201402924XA (en) 2011-12-05 2012-12-04 Optical calibration discs

Country Status (8)

Country Link
US (1) US20130143002A1 (en)
EP (1) EP2788981A4 (en)
JP (1) JP2015500547A (en)
KR (1) KR20140098848A (en)
CN (1) CN104126202A (en)
SG (1) SG11201402924XA (en)
TW (1) TWI606443B (en)
WO (1) WO2013085930A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8619528B2 (en) * 2011-08-31 2013-12-31 Seagate Technology Llc Method and system for optical calibration
WO2014171929A1 (en) * 2013-04-17 2014-10-23 Seagate Technology Llc Calibration standard with pre-determined features
KR102536039B1 (en) * 2016-12-22 2023-05-23 일루미나, 인코포레이티드 imprinting device

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4512659A (en) * 1983-08-10 1985-04-23 Tencor Instruments Apparatus for calibrating a surface scanner
US4636073A (en) * 1984-10-31 1987-01-13 International Business Machines Corporation Universal calibration standard for surface inspection systems
US5453830A (en) * 1992-06-19 1995-09-26 Vlsi Standards, Inc. Spatially isolated diffractor on a calibration substrate for a pellicle inspection system
US5534359A (en) * 1994-06-07 1996-07-09 International Business Machines Corporation Calibration standard for 2-D and 3-D profilometry in the sub-nanometer range and method of producing it
US5691812A (en) * 1996-03-22 1997-11-25 Ade Optical Systems Corporation Calibration standard for calibrating a defect inspection system and a method of forming same
US5847823A (en) * 1997-04-28 1998-12-08 International Business Machines Corporation Surface inspection tool
US6408677B1 (en) * 1998-09-30 2002-06-25 Komag Corporation Calibration disk having discrete bands of composite roughness
US6641978B1 (en) * 2000-07-17 2003-11-04 Creo Srl Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation
US6861181B1 (en) * 2001-09-19 2005-03-01 Dupont Photomasks, Inc. Photomask and method for evaluating an initial calibration for a scanning electron microscope
DE10151406B4 (en) * 2001-10-18 2004-04-22 Infineon Technologies Ag Photo mask and method for its production
JP3908970B2 (en) * 2002-03-18 2007-04-25 住友化学株式会社 Optical panel mold and its manufacture and use
JP4015079B2 (en) * 2003-07-18 2007-11-28 株式会社東芝 Reticle, exposure apparatus inspection system, exposure apparatus inspection method, and reticle manufacturing method
US20050151283A1 (en) * 2004-01-08 2005-07-14 Bajorek Christopher H. Method and apparatus for making a stamper for patterning CDs and DVDs
US7378028B2 (en) * 2004-06-03 2008-05-27 Seagate Technology Llc Method for fabricating patterned magnetic recording media
US7163888B2 (en) * 2004-11-22 2007-01-16 Motorola, Inc. Direct imprinting of etch barriers using step and flash imprint lithography
TW200734197A (en) * 2006-03-02 2007-09-16 Univ Nat Cheng Kung Pattern printing transfer process for macromolecule resist of non-solvent liquid
US7599051B1 (en) * 2006-11-21 2009-10-06 Kla-Tencor Technologies Corporation Calibration of a substrate inspection tool
JP2008287762A (en) * 2007-05-15 2008-11-27 Canon Inc Light transmissible stamper and its original plate
JP4908369B2 (en) * 2007-10-02 2012-04-04 株式会社東芝 Imprint method and imprint system
US20090148619A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Controlling Thickness of Residual Layer
JP4940122B2 (en) * 2007-12-21 2012-05-30 株式会社日立製作所 Method and apparatus for inspecting patterns on hard disk media
JP2009217903A (en) * 2008-03-11 2009-09-24 Fuji Electric Device Technology Co Ltd Manufacturing method of magnetic recording medium
JP5539380B2 (en) * 2008-12-04 2014-07-02 エーエスエムエル ネザーランズ ビー．ブイ． Imprint lithography apparatus and method
JP2010157281A (en) * 2008-12-26 2010-07-15 Fujitsu Ltd Magnetic recording medium, magnetic recording device, and method of manufacturing magnetic recording medium
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
NL2005265A (en) 2009-10-07 2011-04-11 Asml Netherlands Bv Imprint lithography apparatus and method.
JP2011210327A (en) * 2010-03-30 2011-10-20 Hitachi High-Technologies Corp Apparatus for inspecting defect of patterned media and method of inspecting stamper for patterned media using the same
JP5491931B2 (en) 2010-03-30 2014-05-14 富士フイルム株式会社 Nanoimprint method and mold manufacturing method
KR20110136299A (en) * 2010-06-14 2011-12-21 삼성전자주식회사 Device for calibrating an optical scanner, method of producing the same and method for calibrating an optical scanner using the same
JP5982386B2 (en) * 2010-11-05 2016-08-31 モレキュラー・インプリンツ・インコーポレーテッド Pattern formation of non-convex nanostructures
JP2012234603A (en) * 2011-05-09 2012-11-29 Hitachi High-Technologies Corp Method for inspecting film thickness of transferred object, method for producing transferred object, apparatus for producing transferred object, and stamper for transfer
US20130337176A1 (en) * 2012-06-19 2013-12-19 Seagate Technology Llc Nano-scale void reduction

Also Published As

Publication number Publication date
JP2015500547A (en) 2015-01-05
EP2788981A1 (en) 2014-10-15
EP2788981A4 (en) 2015-06-17
WO2013085930A1 (en) 2013-06-13
KR20140098848A (en) 2014-08-08
CN104126202A (en) 2014-10-29
US20130143002A1 (en) 2013-06-06
TW201337921A (en) 2013-09-16
TWI606443B (en) 2017-11-21

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