TW200734197A - Pattern printing transfer process for macromolecule resist of non-solvent liquid - Google Patents

Pattern printing transfer process for macromolecule resist of non-solvent liquid

Info

Publication number
TW200734197A
TW200734197A TW095107072A TW95107072A TW200734197A TW 200734197 A TW200734197 A TW 200734197A TW 095107072 A TW095107072 A TW 095107072A TW 95107072 A TW95107072 A TW 95107072A TW 200734197 A TW200734197 A TW 200734197A
Authority
TW
Taiwan
Prior art keywords
macromolecule
resist
solvent liquid
pattern printing
macromolecule resist
Prior art date
Application number
TW095107072A
Other languages
Chinese (zh)
Other versions
TWI300386B (en
Inventor
Wen-Chang Liao
Lian-Chong Xu
Min-Hsiung Hon
Chau-Nan Hong
Original Assignee
Univ Nat Cheng Kung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Cheng Kung filed Critical Univ Nat Cheng Kung
Priority to TW095107072A priority Critical patent/TW200734197A/en
Priority to US11/655,288 priority patent/US20070205180A1/en
Publication of TW200734197A publication Critical patent/TW200734197A/en
Application granted granted Critical
Publication of TWI300386B publication Critical patent/TWI300386B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

The present invention relates to the pattern printing transfer process for macromolecule resist of non-solvent liquid. The characteristic are that the macromolecule material is utilized to uniformly mix with monomer, and the thermal initiator then is added therein to form the macromolecule resist of non-solvent liquid. The prepared macromolecule resist is employed to the pattern printing transfer fabrication. Since the mobility of the macromolecule resist is well to produce lesser residual layer during printing process, the time consuming for etching the residual layer is also decreased. The excessive etching is prevented to avoid damaging the transfer pattern. The prepared macromolecule resist of the present invention can be applied to the hard substrate of the silicon chip and the flexible substrate of polyethylene terephthalate.
TW095107072A 2006-03-02 2006-03-02 Pattern printing transfer process for macromolecule resist of non-solvent liquid TW200734197A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW095107072A TW200734197A (en) 2006-03-02 2006-03-02 Pattern printing transfer process for macromolecule resist of non-solvent liquid
US11/655,288 US20070205180A1 (en) 2006-03-02 2007-01-19 Nanoimprint lithography having solvent-free liquid polymer resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095107072A TW200734197A (en) 2006-03-02 2006-03-02 Pattern printing transfer process for macromolecule resist of non-solvent liquid

Publications (2)

Publication Number Publication Date
TW200734197A true TW200734197A (en) 2007-09-16
TWI300386B TWI300386B (en) 2008-09-01

Family

ID=38470599

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095107072A TW200734197A (en) 2006-03-02 2006-03-02 Pattern printing transfer process for macromolecule resist of non-solvent liquid

Country Status (2)

Country Link
US (1) US20070205180A1 (en)
TW (1) TW200734197A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130143002A1 (en) 2011-12-05 2013-06-06 Seagate Technology Llc Method and system for optical callibration discs

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6203911B1 (en) * 1998-06-17 2001-03-20 E. I. Du Pont De Nemours And Company Thermoset volatile monomer molding compositions
US6755984B2 (en) * 2002-10-24 2004-06-29 Hewlett-Packard Development Company, L.P. Micro-casted silicon carbide nano-imprinting stamp
US7618574B2 (en) * 2005-07-14 2009-11-17 National Cheng Kung University Imprint lithography utilizing silated acidic polymers
US20070092733A1 (en) * 2005-10-26 2007-04-26 3M Innovative Properties Company Concurrently curable hybrid adhesive composition
US7768628B2 (en) * 2006-10-12 2010-08-03 Hewlett-Packard Development Company, L.P. Contact lithography apparatus and method

Also Published As

Publication number Publication date
TWI300386B (en) 2008-09-01
US20070205180A1 (en) 2007-09-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees