SG11201401353RA - Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same - Google Patents

Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same

Info

Publication number
SG11201401353RA
SG11201401353RA SG11201401353RA SG11201401353RA SG11201401353RA SG 11201401353R A SG11201401353R A SG 11201401353RA SG 11201401353R A SG11201401353R A SG 11201401353RA SG 11201401353R A SG11201401353R A SG 11201401353RA SG 11201401353R A SG11201401353R A SG 11201401353RA
Authority
SG
Singapore
Prior art keywords
sunlight
electromagnetic radiation
selective reflection
wavelength spectrum
producing same
Prior art date
Application number
SG11201401353RA
Inventor
Roland Thielsch
Ronny Kleinhempel
Andre Wahl
Original Assignee
Southwall Europ Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Southwall Europ Gmbh filed Critical Southwall Europ Gmbh
Publication of SG11201401353RA publication Critical patent/SG11201401353RA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
    • G02B5/0866—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers incorporating one or more organic, e.g. polymeric layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
SG11201401353RA 2011-10-13 2012-09-28 Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same SG11201401353RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011116191A DE102011116191A1 (en) 2011-10-13 2011-10-13 Multi-layer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for its production
PCT/EP2012/069204 WO2013053608A1 (en) 2011-10-13 2012-09-28 Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same

Publications (1)

Publication Number Publication Date
SG11201401353RA true SG11201401353RA (en) 2014-09-26

Family

ID=46982572

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401353RA SG11201401353RA (en) 2011-10-13 2012-09-28 Multilayer systems for selective reflection of electromagnetic radiation from the wavelength spectrum of sunlight and method for producing same

Country Status (14)

Country Link
US (1) US20140233093A1 (en)
EP (1) EP2766751A1 (en)
JP (1) JP2015502559A (en)
KR (1) KR20140084169A (en)
CN (1) CN103874939A (en)
AU (1) AU2012323155C1 (en)
BR (1) BR112014008831A2 (en)
CA (1) CA2848581A1 (en)
DE (1) DE102011116191A1 (en)
IL (1) IL231956A0 (en)
MX (1) MX2014003751A (en)
SG (1) SG11201401353RA (en)
UA (1) UA109973C2 (en)
WO (1) WO2013053608A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10870740B2 (en) 2007-08-12 2020-12-22 Toyota Jidosha Kabushiki Kaisha Non-color shifting multilayer structures and protective coatings thereon
US10690823B2 (en) 2007-08-12 2020-06-23 Toyota Motor Corporation Omnidirectional structural color made from metal and dielectric layers
US10788608B2 (en) 2007-08-12 2020-09-29 Toyota Jidosha Kabushiki Kaisha Non-color shifting multilayer structures
KR101917589B1 (en) 2011-10-24 2018-11-13 아디트야 비를라 누보 리미티드 An improved process for the production of carbon black
TWI577543B (en) 2013-12-30 2017-04-11 聖高拜塑膠製品公司 Optical film exhibiting improved light to solar gain heat ratio
DE112015001639B4 (en) 2014-04-01 2023-12-14 Toyota Jidosha Kabushiki Kaisha NON-COLOR-SHIFTING MULTI-LAYER STRUCTURES
DE102015102496B4 (en) * 2014-10-27 2024-06-20 Almeco Gmbh Temperature and corrosion-resistant surface reflector
DE102016110314A1 (en) * 2015-07-07 2017-01-12 Toyota Motor Engineering & Manufacturing North America, Inc. OMNIDIRECTIONAL RED STRUCTURAL COLOR HIGH CHROMA WITH COMBINATION OF SEMICONDUCTOR ABSORBER AND DIELECTRIC ABSORBENT LAYERS
WO2017007750A1 (en) * 2015-07-08 2017-01-12 3M Innovative Properties Company Article and method of making the same
EP3136141A1 (en) 2015-08-26 2017-03-01 Saint-Gobain Performance Plastics Corporation Infrared reflecting film
DE102016114186A1 (en) 2016-08-01 2018-02-01 Von Ardenne Gmbh Low-emission optical multilayer system, low-emission laminate, and optical bandpass filter multilayer system, and methods of making same
CN107092046A (en) * 2017-04-26 2017-08-25 上海默奥光学薄膜器件有限公司 A kind of high reflective mirror of wide spectrum
CN109239820A (en) * 2018-10-19 2019-01-18 布勒莱宝光学设备（北京）有限公司 Light-permeable is used for the Photospot solar reflecting mirror of plant growth
CN113518937A (en) * 2018-11-15 2021-10-19 宁波融光纳米科技有限公司 Optical filter and manufacturing method thereof, display device and toner
DE102019203856A1 (en) * 2019-03-21 2020-09-24 Robert Bosch Gmbh Mirror device for a micromechanical interferometer device, microspectrometer device, and method for producing a microspectrometer device
US11531148B2 (en) 2019-10-02 2022-12-20 Gentex Corporation Optical coatings for glass and glass laminates
CN113403583B (en) * 2021-06-18 2023-02-07 陕西科技大学 Flexible photo-thermal absorption material and preparation method and application thereof

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US5061568A (en) * 1989-12-20 1991-10-29 Monsanto Company Solar screening assembly
CZ296563B6 (en) * 1998-12-18 2006-04-12 Glaverbel Glazing panel and process for producing thereof
US6586101B2 (en) * 2001-04-18 2003-07-01 Applied Vacuum Coating Technologies Co., Ltd. Anti-reflection coating with transparent surface conductive layer
JP3788613B2 (en) * 2002-12-06 2006-06-21 北海道電力株式会社 Method for forming ZnO transparent conductive film
JP2006156927A (en) * 2004-11-04 2006-06-15 Asahi Glass Co Ltd Electromagnetic wave cutoff film for plasma display, and protective plate for plasma display
US7537677B2 (en) * 2005-01-19 2009-05-26 Guardian Industries Corp. Method of making low-E coating using ceramic zinc inclusive target, and target used in same
JP2008015312A (en) * 2006-07-07 2008-01-24 Mitsui Chemicals Inc Reflector and method for manufacturing the same
WO2008083308A1 (en) * 2006-12-28 2008-07-10 3M Innovative Properties Company Nucleation layer for thin film metal layer formation
KR101550946B1 (en) * 2007-12-28 2015-09-07 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Infrared reflecting films for solar control and other uses
US7824777B2 (en) * 2008-03-26 2010-11-02 Southwall Technologies, Inc. Robust optical filter utilizing pairs of dielectric and metallic layers
WO2010003066A2 (en) * 2008-07-03 2010-01-07 University Of Florida Research Foundation, Inc. Transparent conducting electrode
SG195564A1 (en) * 2008-10-21 2013-12-30 Applied Materials Inc Transparent conductive zinc oxide display film and production method therefor
WO2010055832A1 (en) * 2008-11-11 2010-05-20 旭硝子株式会社 Electrically conductive laminate, and protective plate for plasma display
KR20100089962A (en) * 2009-02-05 2010-08-13 충남대학교산학협력단 PREPARTION METHOD FOR TRANSPARENT CONDUCTING FILM COATED BY AZO/Ag/AZO MULTILAYER

Also Published As

Publication number Publication date
CA2848581A1 (en) 2013-04-18
DE102011116191A1 (en) 2013-04-18
UA109973C2 (en) 2015-10-26
IL231956A0 (en) 2014-05-28
BR112014008831A2 (en) 2017-04-25
AU2012323155A1 (en) 2014-04-17
JP2015502559A (en) 2015-01-22
WO2013053608A1 (en) 2013-04-18
AU2012323155C1 (en) 2015-12-24
AU2012323155B2 (en) 2015-07-09
CN103874939A (en) 2014-06-18
KR20140084169A (en) 2014-07-04
MX2014003751A (en) 2014-08-27
US20140233093A1 (en) 2014-08-21
EP2766751A1 (en) 2014-08-20

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