SG11201401081UA - Ferromagnetic material sputtering target - Google Patents
Ferromagnetic material sputtering targetInfo
- Publication number
- SG11201401081UA SG11201401081UA SG11201401081UA SG11201401081UA SG11201401081UA SG 11201401081U A SG11201401081U A SG 11201401081UA SG 11201401081U A SG11201401081U A SG 11201401081UA SG 11201401081U A SG11201401081U A SG 11201401081UA SG 11201401081U A SG11201401081U A SG 11201401081UA
- Authority
- SG
- Singapore
- Prior art keywords
- sputtering target
- ferromagnetic material
- material sputtering
- ferromagnetic
- target
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012012546 | 2012-01-25 | ||
PCT/JP2013/051095 WO2013111706A1 (en) | 2012-01-25 | 2013-01-21 | Ferromagnetic material sputtering target |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201401081UA true SG11201401081UA (en) | 2014-08-28 |
Family
ID=48873426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201401081UA SG11201401081UA (en) | 2012-01-25 | 2013-01-21 | Ferromagnetic material sputtering target |
Country Status (7)
Country | Link |
---|---|
US (1) | US20140311899A1 (en) |
JP (1) | JP5646757B2 (en) |
CN (1) | CN103946415B (en) |
MY (1) | MY168036A (en) |
SG (1) | SG11201401081UA (en) |
TW (1) | TWI616545B (en) |
WO (1) | WO2013111706A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108884557B (en) | 2016-03-31 | 2020-12-08 | 捷客斯金属株式会社 | Ferromagnetic material sputtering target |
JP7480533B2 (en) | 2020-03-10 | 2024-05-10 | 東ソー株式会社 | Cr-Si sintered body |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63130769A (en) * | 1986-11-20 | 1988-06-02 | Mitsui Eng & Shipbuild Co Ltd | Target material for base alloy for vapor deposition |
US5036036A (en) * | 1989-06-13 | 1991-07-30 | E. I. Du Pont De Nemours And Company | Chromium oxide catalyst composition |
US20050277002A1 (en) * | 2004-06-15 | 2005-12-15 | Heraeus, Inc. | Enhanced sputter target alloy compositions |
JP4727664B2 (en) * | 2005-06-15 | 2011-07-20 | Jx日鉱日石金属株式会社 | Chromium oxide powder for sputtering target and sputtering target |
US9034153B2 (en) * | 2006-01-13 | 2015-05-19 | Jx Nippon Mining & Metals Corporation | Nonmagnetic material particle dispersed ferromagnetic material sputtering target |
JP2009215617A (en) * | 2008-03-11 | 2009-09-24 | Mitsui Mining & Smelting Co Ltd | Sputtering target material containing cobalt, chromium, and platinum matrix phase and oxide phase and method for producing the same |
JP5530270B2 (en) * | 2010-06-29 | 2014-06-25 | Jx日鉱日石金属株式会社 | Cobalt powder and method for producing the same |
WO2014046040A1 (en) * | 2012-09-18 | 2014-03-27 | Jx日鉱日石金属株式会社 | Sputtering target |
-
2013
- 2013-01-21 JP JP2013526216A patent/JP5646757B2/en active Active
- 2013-01-21 US US14/354,953 patent/US20140311899A1/en not_active Abandoned
- 2013-01-21 WO PCT/JP2013/051095 patent/WO2013111706A1/en active Application Filing
- 2013-01-21 SG SG11201401081UA patent/SG11201401081UA/en unknown
- 2013-01-21 CN CN201380003863.8A patent/CN103946415B/en active Active
- 2013-01-21 MY MYPI2014701134A patent/MY168036A/en unknown
- 2013-01-24 TW TW102102609A patent/TWI616545B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI616545B (en) | 2018-03-01 |
CN103946415B (en) | 2016-02-10 |
US20140311899A1 (en) | 2014-10-23 |
JP5646757B2 (en) | 2014-12-24 |
WO2013111706A1 (en) | 2013-08-01 |
TW201350597A (en) | 2013-12-16 |
JPWO2013111706A1 (en) | 2015-05-11 |
CN103946415A (en) | 2014-07-23 |
MY168036A (en) | 2018-10-11 |
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