SG11201400096PA - Discontinuous patterned bonds for semiconductor devices and associated systems and methods - Google Patents
Discontinuous patterned bonds for semiconductor devices and associated systems and methodsInfo
- Publication number
- SG11201400096PA SG11201400096PA SG11201400096PA SG11201400096PA SG11201400096PA SG 11201400096P A SG11201400096P A SG 11201400096PA SG 11201400096P A SG11201400096P A SG 11201400096PA SG 11201400096P A SG11201400096P A SG 11201400096PA SG 11201400096P A SG11201400096P A SG 11201400096PA
- Authority
- SG
- Singapore
- Prior art keywords
- methods
- semiconductor devices
- associated systems
- discontinuous patterned
- bonds
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L2924/12042—LASER
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Led Device Packages (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
- Dicing (AREA)
- Die Bonding (AREA)
- Element Separation (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/220,462 US8754424B2 (en) | 2011-08-29 | 2011-08-29 | Discontinuous patterned bonds for semiconductor devices and associated systems and methods |
PCT/US2012/050768 WO2013032688A2 (en) | 2011-08-29 | 2012-08-14 | Discontinuous patterned bonds for semiconductor devices and associated systems and methods |
Publications (1)
Publication Number | Publication Date |
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SG11201400096PA true SG11201400096PA (en) | 2014-03-28 |
Family
ID=47742351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201400096PA SG11201400096PA (en) | 2011-08-29 | 2012-08-14 | Discontinuous patterned bonds for semiconductor devices and associated systems and methods |
Country Status (8)
Country | Link |
---|---|
US (7) | US8754424B2 (en) |
EP (1) | EP2751831B1 (en) |
JP (1) | JP5964970B2 (en) |
KR (1) | KR101637105B1 (en) |
CN (1) | CN103765556B (en) |
SG (1) | SG11201400096PA (en) |
TW (1) | TWI497612B (en) |
WO (1) | WO2013032688A2 (en) |
Families Citing this family (11)
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WO2007048028A2 (en) | 2005-10-21 | 2007-04-26 | T-Mobile, Usa, Inc. | System and method for determining device location in an ip-based wireless telecommunications network |
KR20120052160A (en) * | 2010-11-15 | 2012-05-23 | 엔지케이 인슐레이터 엘티디 | Composite substrate and composite substrate manufacturing method |
US8754424B2 (en) | 2011-08-29 | 2014-06-17 | Micron Technology, Inc. | Discontinuous patterned bonds for semiconductor devices and associated systems and methods |
TWI546979B (en) * | 2012-03-05 | 2016-08-21 | 晶元光電股份有限公司 | Lighting emitting device with aligned-bonding and the manufacturing method thereof |
JP6339229B2 (en) * | 2014-12-03 | 2018-06-06 | インテル・コーポレーション | Method for making an electronic package |
US10217729B2 (en) * | 2016-09-30 | 2019-02-26 | Intel Corporation | Apparatus for micro pick and bond |
US11056611B2 (en) | 2018-09-11 | 2021-07-06 | Facebook Technologies, Llc | Mesa formation for wafer-to-wafer bonding |
US11145786B2 (en) | 2018-09-11 | 2021-10-12 | Facebook Technologies, Llc | Methods for wafer-to-wafer bonding |
US11342479B2 (en) | 2018-09-11 | 2022-05-24 | Facebook Technologies, Llc | Reducing bowing of materials before wafer-to-wafer bonding for LED manufacturing |
JP7199307B2 (en) * | 2019-05-24 | 2023-01-05 | 株式会社ディスコ | Relocation method |
DE102021108397A1 (en) * | 2021-04-01 | 2022-10-06 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | TRANSFER PROCESS FOR OPTOELECTRONIC SEMICONDUCTOR COMPONENTS |
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US6864570B2 (en) * | 1993-12-17 | 2005-03-08 | The Regents Of The University Of California | Method and apparatus for fabricating self-assembling microstructures |
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JPH11186670A (en) * | 1997-12-22 | 1999-07-09 | Canon Inc | Surface type optical device and its manufacture |
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JP4580633B2 (en) * | 2003-11-14 | 2010-11-17 | スタンレー電気株式会社 | Semiconductor device and manufacturing method thereof |
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EP1864339A4 (en) * | 2005-03-11 | 2010-12-29 | Seoul Semiconductor Co Ltd | Led package having an array of light emitting cells coupled in series |
US7542301B1 (en) * | 2005-06-22 | 2009-06-02 | Alien Technology Corporation | Creating recessed regions in a substrate and assemblies having such recessed regions |
EP1746742B1 (en) | 2005-07-20 | 2008-08-13 | Alcatel Lucent | Method for estimating the time of arrival of an access burst, and apparatus |
JP2007095413A (en) | 2005-09-28 | 2007-04-12 | Toppan Printing Co Ltd | Top-emission type organic electroluminescent element |
JP2007095414A (en) | 2005-09-28 | 2007-04-12 | Toppan Printing Co Ltd | Manufacturing method of top-emission type organic electroluminescent element |
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US7880382B2 (en) | 2006-03-08 | 2011-02-01 | Toppan Printing Co., Ltd. | Organic electroluminescence panel and manufacturing method of the same |
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Also Published As
Publication number | Publication date |
---|---|
EP2751831B1 (en) | 2018-05-16 |
JP2014529908A (en) | 2014-11-13 |
US9362259B2 (en) | 2016-06-07 |
CN103765556B (en) | 2016-09-07 |
JP5964970B2 (en) | 2016-08-03 |
US10242970B2 (en) | 2019-03-26 |
US20220130807A1 (en) | 2022-04-28 |
US20190189597A1 (en) | 2019-06-20 |
US20240186298A1 (en) | 2024-06-06 |
US20130049016A1 (en) | 2013-02-28 |
US20140295594A1 (en) | 2014-10-02 |
US9059380B2 (en) | 2015-06-16 |
TW201316419A (en) | 2013-04-16 |
WO2013032688A3 (en) | 2013-07-11 |
US20160336302A1 (en) | 2016-11-17 |
EP2751831A4 (en) | 2015-04-15 |
KR101637105B1 (en) | 2016-07-06 |
US8754424B2 (en) | 2014-06-17 |
US20150357314A1 (en) | 2015-12-10 |
EP2751831A2 (en) | 2014-07-09 |
US11222874B2 (en) | 2022-01-11 |
KR20140053388A (en) | 2014-05-07 |
CN103765556A (en) | 2014-04-30 |
TWI497612B (en) | 2015-08-21 |
US11901342B2 (en) | 2024-02-13 |
WO2013032688A2 (en) | 2013-03-07 |
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