SG108918A1 - Monomer for chemical amplified photoresist compositions - Google Patents

Monomer for chemical amplified photoresist compositions

Info

Publication number
SG108918A1
SG108918A1 SG200302518A SG200302518A SG108918A1 SG 108918 A1 SG108918 A1 SG 108918A1 SG 200302518 A SG200302518 A SG 200302518A SG 200302518 A SG200302518 A SG 200302518A SG 108918 A1 SG108918 A1 SG 108918A1
Authority
SG
Singapore
Prior art keywords
monomer
photoresist compositions
amplified photoresist
chemical amplified
chemical
Prior art date
Application number
SG200302518A
Other languages
English (en)
Inventor
Chen Chi-Sheng
Li Yen-Cheng
Cheng Menghsum
Original Assignee
Everlight Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Everlight Usa Inc filed Critical Everlight Usa Inc
Publication of SG108918A1 publication Critical patent/SG108918A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D493/00—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system
    • C07D493/12—Heterocyclic compounds containing oxygen atoms as the only ring hetero atoms in the condensed system in which the condensed system contains three hetero rings
    • C07D493/14—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/87—Benzo [c] furans; Hydrogenated benzo [c] furans
    • C07D307/88—Benzo [c] furans; Hydrogenated benzo [c] furans with one oxygen atom directly attached in position 1 or 3

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Furan Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
SG200302518A 2002-05-28 2003-05-06 Monomer for chemical amplified photoresist compositions SG108918A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/154,797 US6720430B2 (en) 2002-05-28 2002-05-28 Monomer for chemical amplified photoresist compositions

Publications (1)

Publication Number Publication Date
SG108918A1 true SG108918A1 (en) 2005-02-28

Family

ID=29709578

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200302518A SG108918A1 (en) 2002-05-28 2003-05-06 Monomer for chemical amplified photoresist compositions

Country Status (4)

Country Link
US (1) US6720430B2 (zh)
JP (1) JP2004002416A (zh)
CN (1) CN1197852C (zh)
SG (1) SG108918A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000001684A1 (fr) * 1998-07-03 2000-01-13 Nec Corporation Derives de (meth)acrylate porteurs d'une structure lactone, compositions polymeres et photoresists et procede de formation de modeles a l'aide de ceux-ci
DE60136100D1 (de) * 2000-12-06 2008-11-20 Mitsubishi Rayon Co (meth)acrylatester, alkohol-ausgangsverbindungen für deren herstellung, verfahren zur herstellung dieser beiden verbindungen, polymere der ester, chemisch amplifizierbare schutzlackzusammensetzungen und verfahren zur bildung von mustern
JP2006169147A (ja) * 2004-12-14 2006-06-29 Daicel Chem Ind Ltd 重合性不飽和カルボン酸エステル、高分子化合物、フォトレジスト用樹脂組成物及び半導体の製造法
JP4597655B2 (ja) * 2004-12-20 2010-12-15 東京応化工業株式会社 レジストパターン形成方法
US7960087B2 (en) 2005-03-11 2011-06-14 Fujifilm Corporation Positive photosensitive composition and pattern-forming method using the same
US20110039210A1 (en) * 2009-05-20 2011-02-17 Rohm And Haas Electronic Materials Llc Novel resins and photoresist compositions comprising same
JP5715852B2 (ja) 2011-02-28 2015-05-13 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物及びレジスト膜
JP5927275B2 (ja) * 2014-11-26 2016-06-01 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、及びレジスト膜

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6280898B1 (en) * 1998-09-25 2001-08-28 Shin-Etsu Chemical Co., Ltd. Lactone-containing compounds, polymers, resist compositions, and patterning method
US20010026901A1 (en) * 1998-07-03 2001-10-04 Katsumi Maeda (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
US20010044070A1 (en) * 2000-04-04 2001-11-22 Yasunori Uetani Chemically amplified positive resist composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995024992A1 (en) * 1994-03-16 1995-09-21 Minnesota Mining And Manufacturing Company Abrasive articles and method of making abrasive articles
US6005000A (en) * 1996-08-22 1999-12-21 Oxis International, Inc. 5,5-Disubstituted-3, 4-dihydroxy-2(5H)-furanones and methods of use therefor
US6526556B1 (en) * 1999-09-13 2003-02-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Evolutionary technique for automated synthesis of electronic circuits
US6316159B1 (en) 2000-06-14 2001-11-13 Everlight Usa, Inc. Chemical amplified photoresist composition
US6271412B1 (en) 2000-06-30 2001-08-07 Everlight Usa, Inc. Photosensitive monomer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010026901A1 (en) * 1998-07-03 2001-10-04 Katsumi Maeda (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
US6280898B1 (en) * 1998-09-25 2001-08-28 Shin-Etsu Chemical Co., Ltd. Lactone-containing compounds, polymers, resist compositions, and patterning method
US20010044070A1 (en) * 2000-04-04 2001-11-22 Yasunori Uetani Chemically amplified positive resist composition

Also Published As

Publication number Publication date
US6720430B2 (en) 2004-04-13
CN1197852C (zh) 2005-04-20
CN1462747A (zh) 2003-12-24
JP2004002416A (ja) 2004-01-08
US20030229234A1 (en) 2003-12-11

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