SG10202100810QA - Processing method and processing apparatus - Google Patents

Processing method and processing apparatus

Info

Publication number
SG10202100810QA
SG10202100810QA SG10202100810QA SG10202100810QA SG10202100810QA SG 10202100810Q A SG10202100810Q A SG 10202100810QA SG 10202100810Q A SG10202100810Q A SG 10202100810QA SG 10202100810Q A SG10202100810Q A SG 10202100810QA SG 10202100810Q A SG10202100810Q A SG 10202100810QA
Authority
SG
Singapore
Prior art keywords
processing
processing apparatus
processing method
Prior art date
Application number
SG10202100810QA
Inventor
Kojima Yoshimasa
Kajihara Yusuke
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10202100810QA publication Critical patent/SG10202100810QA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D5/00Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D5/007Control means comprising cameras, vision or image processing systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/023Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0064Devices for the automatic drive or the program control of the machines
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/22Safety devices specially adapted for cutting machines

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Dicing (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG10202100810QA 2020-01-30 2021-01-26 Processing method and processing apparatus SG10202100810QA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020013520A JP7370265B2 (en) 2020-01-30 2020-01-30 Processing method and processing equipment

Publications (1)

Publication Number Publication Date
SG10202100810QA true SG10202100810QA (en) 2021-08-30

Family

ID=76853734

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202100810QA SG10202100810QA (en) 2020-01-30 2021-01-26 Processing method and processing apparatus

Country Status (7)

Country Link
US (1) US20210237297A1 (en)
JP (1) JP7370265B2 (en)
KR (1) KR20210097619A (en)
CN (1) CN113199651A (en)
DE (1) DE102021200656B4 (en)
SG (1) SG10202100810QA (en)
TW (1) TW202128345A (en)

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5539514A (en) * 1991-06-26 1996-07-23 Hitachi, Ltd. Foreign particle inspection apparatus and method with front and back illumination
JP3183046B2 (en) * 1994-06-06 2001-07-03 キヤノン株式会社 Foreign particle inspection apparatus and method for manufacturing semiconductor device using the same
US5515167A (en) * 1994-09-13 1996-05-07 Hughes Aircraft Company Transparent optical chuck incorporating optical monitoring
US5978078A (en) * 1996-12-17 1999-11-02 Texas Instruments Incorporated System and method for detecting particles on substrate-supporting chucks of photolithography equipment
JP3330089B2 (en) * 1998-09-30 2002-09-30 株式会社大協精工 Inspection method and apparatus for rubber products
JP2000216227A (en) 1999-01-25 2000-08-04 Disco Abrasive Syst Ltd Chuck table inspection method
US6134014A (en) * 1999-02-08 2000-10-17 Taiwan Semiconductor Manufacturing Company Apparatus and method of inspecting phase shift masks using comparison of a mask die image to the mask image database
US6836560B2 (en) * 2000-11-13 2004-12-28 Kla - Tencor Technologies Corporation Advanced phase shift inspection method
JP2008109015A (en) * 2006-10-27 2008-05-08 Disco Abrasive Syst Ltd Method and apparatus for dividing semiconductor wafer
JP2009130287A (en) 2007-11-27 2009-06-11 Toshiba Corp Apparatus and method for manufacturing semiconductor device
JP5198203B2 (en) * 2008-09-30 2013-05-15 株式会社ディスコ Processing equipment
JP5274966B2 (en) * 2008-09-30 2013-08-28 株式会社ディスコ Processing equipment
US8934091B2 (en) * 2012-09-09 2015-01-13 Kla-Tencor Corp. Monitoring incident beam position in a wafer inspection system
JP6672053B2 (en) * 2016-04-18 2020-03-25 株式会社ディスコ Wafer processing method
JP6692578B2 (en) * 2016-06-30 2020-05-13 株式会社ディスコ Wafer processing method
JP2018121031A (en) 2017-01-27 2018-08-02 株式会社ディスコ Laser processing device
JP2018176320A (en) * 2017-04-07 2018-11-15 株式会社ディスコ Processing device
JP7017949B2 (en) * 2018-03-02 2022-02-09 株式会社ディスコ Processing equipment
JP7126849B2 (en) * 2018-04-13 2022-08-29 株式会社ディスコ processing equipment
JP7217165B2 (en) * 2019-02-14 2023-02-02 株式会社ディスコ Chuck table and inspection device
JP7282461B2 (en) * 2019-04-16 2023-05-29 株式会社ディスコ Inspection equipment and processing equipment
JP7325897B2 (en) * 2019-04-18 2023-08-15 株式会社ディスコ Machining device and machining method of workpiece

Also Published As

Publication number Publication date
TW202128345A (en) 2021-08-01
CN113199651A (en) 2021-08-03
US20210237297A1 (en) 2021-08-05
DE102021200656B4 (en) 2024-05-23
JP7370265B2 (en) 2023-10-27
DE102021200656A1 (en) 2021-08-05
JP2021120166A (en) 2021-08-19
KR20210097619A (en) 2021-08-09

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