SG10201901384PA - Apparatus of plural charged-particle beams - Google Patents

Apparatus of plural charged-particle beams

Info

Publication number
SG10201901384PA
SG10201901384PA SG10201901384PA SG10201901384PA SG10201901384PA SG 10201901384P A SG10201901384P A SG 10201901384PA SG 10201901384P A SG10201901384P A SG 10201901384PA SG 10201901384P A SG10201901384P A SG 10201901384PA SG 10201901384P A SG10201901384P A SG 10201901384PA
Authority
SG
Singapore
Prior art keywords
source
plural
probe spots
particle beams
array
Prior art date
Application number
SG10201901384PA
Inventor
Weiming Ren
Shuai Li
Xuedong Liu
Zhongwei Chen
Original Assignee
Microvision Incorporated B V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microvision Incorporated B V filed Critical Microvision Incorporated B V
Publication of SG10201901384PA publication Critical patent/SG10201901384PA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/083—Beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1516—Multipoles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Apparatus of Plural Charged-Particle Beams A multi-beam apparatus for observing a sample with high resolution and high 5 throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the 10 beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. [Figure 3A] 15 20 25
SG10201901384PA 2015-03-10 2016-04-13 Apparatus of plural charged-particle beams SG10201901384PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201562130819P 2015-03-10 2015-03-10

Publications (1)

Publication Number Publication Date
SG10201901384PA true SG10201901384PA (en) 2019-03-28

Family

ID=56878946

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201707178RA SG11201707178RA (en) 2015-03-10 2016-04-13 Apparatus of plural charged-particle beams
SG10201901384PA SG10201901384PA (en) 2015-03-10 2016-04-13 Apparatus of plural charged-particle beams

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201707178RA SG11201707178RA (en) 2015-03-10 2016-04-13 Apparatus of plural charged-particle beams

Country Status (2)

Country Link
US (7) US9691588B2 (en)
SG (2) SG11201707178RA (en)

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Also Published As

Publication number Publication date
US9691588B2 (en) 2017-06-27
US11107657B2 (en) 2021-08-31
US9691586B2 (en) 2017-06-27
US20190259573A1 (en) 2019-08-22
US20190057837A1 (en) 2019-02-21
US10109456B2 (en) 2018-10-23
SG11201707178RA (en) 2017-10-30
US20170309449A1 (en) 2017-10-26
US20160268096A1 (en) 2016-09-15
US10643820B2 (en) 2020-05-05
US20200388464A1 (en) 2020-12-10
US10276347B2 (en) 2019-04-30
US20170125206A1 (en) 2017-05-04
US20220148851A1 (en) 2022-05-12

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