SG10201808257QA - Supervisory control of radio frequency (rf) impedance tuning operation - Google Patents

Supervisory control of radio frequency (rf) impedance tuning operation

Info

Publication number
SG10201808257QA
SG10201808257QA SG10201808257QA SG10201808257QA SG10201808257QA SG 10201808257Q A SG10201808257Q A SG 10201808257QA SG 10201808257Q A SG10201808257Q A SG 10201808257QA SG 10201808257Q A SG10201808257Q A SG 10201808257QA SG 10201808257Q A SG10201808257Q A SG 10201808257QA
Authority
SG
Singapore
Prior art keywords
radio frequency
signal
frequency
supervisory control
matching network
Prior art date
Application number
SG10201808257QA
Inventor
David J Coumou
Ross REINHARDT
Yuriy Elner
Daniel M Gill
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG10201808257QA publication Critical patent/SG10201808257QA/en

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/56—Modifications of input or output impedances, not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189—High frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19—High frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/195—High frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/24—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers of transmitter output stages
    • H03F3/245—Power amplifiers, e.g. Class B amplifiers, Class C amplifiers of transmitter output stages with semiconductor devices only
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F2200/00—Indexing scheme relating to amplifiers
    • H03F2200/378—A variable capacitor being added in the output circuit, e.g. collector, drain, of an amplifier stage
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F2200/00—Indexing scheme relating to amplifiers
    • H03F2200/387—A circuit being added at the output of an amplifier to adapt the output impedance of the amplifier
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F2200/00—Indexing scheme relating to amplifiers
    • H03F2200/451—Indexing scheme relating to amplifiers the amplifier being a radio frequency amplifier

Abstract

# # # SUPERVISORY CONTROL OF RADIO FREQUENCY (RF) IMPEDANCE TUNING OPERATION A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an imped- Set impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation. FIG. 4 accompanies abstract. 29
SG10201808257QA 2015-08-18 2016-08-08 Supervisory control of radio frequency (rf) impedance tuning operation SG10201808257QA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/828,597 US9876476B2 (en) 2015-08-18 2015-08-18 Supervisory control of radio frequency (RF) impedance tuning operation

Publications (1)

Publication Number Publication Date
SG10201808257QA true SG10201808257QA (en) 2018-10-30

Family

ID=58050933

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201808257QA SG10201808257QA (en) 2015-08-18 2016-08-08 Supervisory control of radio frequency (rf) impedance tuning operation

Country Status (8)

Country Link
US (2) US9876476B2 (en)
EP (1) EP3338295A4 (en)
JP (1) JP6692894B2 (en)
KR (1) KR102330684B1 (en)
CN (1) CN107924804B (en)
SG (1) SG10201808257QA (en)
TW (1) TWI690245B (en)
WO (1) WO2017030816A1 (en)

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US10304660B1 (en) * 2018-03-21 2019-05-28 Lam Research Corporation Multi-level pulsing of DC and RF signals
KR20200142565A (en) * 2018-04-20 2020-12-22 에이이에스 글로벌 홀딩스 피티이 리미티드 System and method for control of high efficiency generator source impedance
CN110416047B (en) * 2018-04-27 2021-03-02 北京北方华创微电子装备有限公司 Radio frequency impedance matching method and device and semiconductor processing equipment
CN110504149B (en) * 2018-05-17 2022-04-22 北京北方华创微电子装备有限公司 Pulse modulation system and method of radio frequency power supply
FR3087809B1 (en) * 2018-10-30 2022-01-21 Continental Automotive France PRESENCE DETECTION SENSOR FOR MOTOR VEHICLE
KR102126937B1 (en) 2018-12-03 2020-06-25 주식회사 뉴파워 프라즈마 Reverse power reducing method and plasma power apparatus using it
GB2580155A (en) * 2018-12-21 2020-07-15 Comet Ag Radiofrequency power amplifier
KR102348338B1 (en) 2019-02-07 2022-01-06 엠케이에스코리아 유한회사 The Driving Frequency Control Method of The Pulsed Frequency Variable RF Generator
US11177115B2 (en) * 2019-06-03 2021-11-16 Applied Materials, Inc. Dual-level pulse tuning
US11587767B2 (en) 2019-06-19 2023-02-21 Analogic Corporation Radio frequency generators, and related systems, methods, and devices
US11626907B2 (en) * 2019-06-19 2023-04-11 Analogic Corporation Radio frequency generators, and related systems, methods, and devices
US11158488B2 (en) 2019-06-26 2021-10-26 Mks Instruments, Inc. High speed synchronization of plasma source/bias power delivery
US11315757B2 (en) * 2019-08-13 2022-04-26 Mks Instruments, Inc. Method and apparatus to enhance sheath formation, evolution and pulse to pulse stability in RF powered plasma applications
US10741363B1 (en) * 2019-10-08 2020-08-11 Mks Instruments, Inc. Extremum seeking control apparatus and method for automatic frequency tuning for RF impedance matching
JP7348101B2 (en) 2020-02-18 2023-09-20 株式会社京三製作所 Control method of high frequency power supply device and high frequency power supply device
US11527384B2 (en) * 2020-11-24 2022-12-13 Mks Instruments, Inc. Apparatus and tuning method for mitigating RF load impedance variations due to periodic disturbances
US20240087850A1 (en) * 2022-09-08 2024-03-14 Mks Instruments, Inc. Extremum Seeking Control Apparatuses With Online Parameter Adjustment And Methods
CN117811531A (en) * 2024-02-28 2024-04-02 深圳市瀚强科技股份有限公司 Matching state feedback circuit and radio frequency power supply equipment

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Also Published As

Publication number Publication date
TWI690245B (en) 2020-04-01
TW201713171A (en) 2017-04-01
EP3338295A4 (en) 2019-04-10
US10666206B2 (en) 2020-05-26
US20170054418A1 (en) 2017-02-23
KR102330684B1 (en) 2021-11-24
EP3338295A1 (en) 2018-06-27
KR20180031789A (en) 2018-03-28
CN107924804B (en) 2020-01-07
US9876476B2 (en) 2018-01-23
JP6692894B2 (en) 2020-05-13
US20180109230A1 (en) 2018-04-19
WO2017030816A1 (en) 2017-02-23
CN107924804A (en) 2018-04-17
JP2018533855A (en) 2018-11-15

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