SG10201805811SA - Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing film - Google Patents
Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing filmInfo
- Publication number
- SG10201805811SA SG10201805811SA SG10201805811SA SG10201805811SA SG10201805811SA SG 10201805811S A SG10201805811S A SG 10201805811SA SG 10201805811S A SG10201805811S A SG 10201805811SA SG 10201805811S A SG10201805811S A SG 10201805811SA SG 10201805811S A SG10201805811S A SG 10201805811SA
- Authority
- SG
- Singapore
- Prior art keywords
- plasma cvd
- cvd apparatus
- holding part
- power source
- current power
- Prior art date
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
OF THE DISCLOSURE PLASMA CVD APPARATUS, METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM AND METHOD FOR DEPOSITING FILM To provide a plasma CVD apparatus capable of depositing a film having good thickness uniformity. An aspect of the 5 present invention is a plasma CVD apparatus including a chamber 102, a holding part that holds a substrate to be deposited 1, a first direct-current power source 112 connected electrically with the holding part, a first anode 104a arranged on one side of the holding part, a first cathode 10 103a arranged on one side of the holding part, a second direct-current power source 107a connected electrically with the first anode, a first alternating-current power source 105a connected electrically with the first cathode, a gas supply mechanism that supplies raw material gas to the inside 15 of the chamber, and a control part 130 that controls the first direct-current power source so as to apply a first voltage to the holding part in a pulse form of a cycle of not less than 1/100 msec and not more than 1 msec and a DUTY cycle of not less than 10% and not more than 90%. 20 (No drawing to be published)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017138045A JP7219941B2 (en) | 2017-07-14 | 2017-07-14 | Plasma CVD device, magnetic recording medium manufacturing method and film forming method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201805811SA true SG10201805811SA (en) | 2019-02-27 |
Family
ID=65354284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201805811SA SG10201805811SA (en) | 2017-07-14 | 2018-07-05 | Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing film |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7219941B2 (en) |
| MY (1) | MY197004A (en) |
| SG (1) | SG10201805811SA (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000096250A (en) | 1998-09-24 | 2000-04-04 | Shinko Seiki Co Ltd | Plasma cvd device |
| JP3396175B2 (en) | 1998-12-22 | 2003-04-14 | 昭和電工株式会社 | Manufacturing method of magnetic recording medium |
| JP4365501B2 (en) | 2000-01-31 | 2009-11-18 | 神港精機株式会社 | Hard carbon laminated film and method for forming the same |
| CN102428515B (en) | 2009-05-22 | 2014-12-17 | 昭和电工Hd新加坡有限公司 | Method for forming carbon film, method for manufacturing magnetic recording medium, and apparatus for forming carbon film |
| JP6019343B2 (en) | 2012-07-27 | 2016-11-02 | 株式会社ユーテック | Plasma CVD apparatus, method for manufacturing magnetic recording medium, and film forming method |
-
2017
- 2017-07-14 JP JP2017138045A patent/JP7219941B2/en active Active
-
2018
- 2018-07-05 MY MYPI2018702348A patent/MY197004A/en unknown
- 2018-07-05 SG SG10201805811SA patent/SG10201805811SA/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| MY197004A (en) | 2023-05-18 |
| JP7219941B2 (en) | 2023-02-09 |
| JP2019019368A (en) | 2019-02-07 |
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