MY197004A - Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing film - Google Patents

Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing film

Info

Publication number
MY197004A
MY197004A MYPI2018702348A MYPI2018702348A MY197004A MY 197004 A MY197004 A MY 197004A MY PI2018702348 A MYPI2018702348 A MY PI2018702348A MY PI2018702348 A MYPI2018702348 A MY PI2018702348A MY 197004 A MY197004 A MY 197004A
Authority
MY
Malaysia
Prior art keywords
holding part
plasma cvd
cvd apparatus
power source
current power
Prior art date
Application number
MYPI2018702348A
Inventor
Honda Yuji
Abe Koji
Watanabe Toshiyuki
Original Assignee
Japan Create Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Create Co Ltd filed Critical Japan Create Co Ltd
Publication of MY197004A publication Critical patent/MY197004A/en

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  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

To provide a plasma CVD apparatus capable of depositing a film having good thickness uniformity. An aspect of the present invention is a plasma CVD apparatus including a chamber (102), a holding part that holds a substrate to be deposited (1), a first direct-current power source (112) connected electrically with the holding part, a first anode (104a) arranged on one side of the holding part, a first cathode (103a) arranged on one side of the holding part, a second direct-current power source (107a) connected electrically with the first anode, a first alternating-current power source (105a) connected electrically with the first cathode, a gas supply mechanism that supplies raw material gas to the inside of the chamber, and a control part (130) that controls the first direct-current power source so as to apply a first voltage to the holding part in a pulse form of a cycle of not less than 1/100 msec and not more than 1 msec and a DUTY cycle of not less than 10% and not more than 90%.
MYPI2018702348A 2017-07-14 2018-07-05 Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing film MY197004A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017138045A JP7219941B2 (en) 2017-07-14 2017-07-14 Plasma CVD device, magnetic recording medium manufacturing method and film forming method

Publications (1)

Publication Number Publication Date
MY197004A true MY197004A (en) 2023-05-18

Family

ID=65354284

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018702348A MY197004A (en) 2017-07-14 2018-07-05 Plasma cvd apparatus, method for manufacturing magnetic recording medium and method for depositing film

Country Status (3)

Country Link
JP (1) JP7219941B2 (en)
MY (1) MY197004A (en)
SG (1) SG10201805811SA (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000096250A (en) 1998-09-24 2000-04-04 Shinko Seiki Co Ltd Plasma cvd device
JP3396175B2 (en) 1998-12-22 2003-04-14 昭和電工株式会社 Manufacturing method of magnetic recording medium
JP4365501B2 (en) 2000-01-31 2009-11-18 神港精機株式会社 Hard carbon laminated film and method for forming the same
CN102428515B (en) 2009-05-22 2014-12-17 昭和电工Hd新加坡有限公司 Method for forming carbon film, method for manufacturing magnetic recording medium, and apparatus for forming carbon film
JP6019343B2 (en) 2012-07-27 2016-11-02 株式会社ユーテック Plasma CVD apparatus, method for manufacturing magnetic recording medium, and film forming method

Also Published As

Publication number Publication date
SG10201805811SA (en) 2019-02-27
JP7219941B2 (en) 2023-02-09
JP2019019368A (en) 2019-02-07

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