SG10201708239YA - Method for separating a nanoimprint template from a substrate - Google Patents
Method for separating a nanoimprint template from a substrateInfo
- Publication number
- SG10201708239YA SG10201708239YA SG10201708239YA SG10201708239YA SG10201708239YA SG 10201708239Y A SG10201708239Y A SG 10201708239YA SG 10201708239Y A SG10201708239Y A SG 10201708239YA SG 10201708239Y A SG10201708239Y A SG 10201708239YA SG 10201708239Y A SG10201708239Y A SG 10201708239YA
- Authority
- SG
- Singapore
- Prior art keywords
- separating
- substrate
- nanoimprint template
- nanoimprint
- template
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/338,735 US10627715B2 (en) | 2016-10-31 | 2016-10-31 | Method for separating a nanoimprint template from a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201708239YA true SG10201708239YA (en) | 2018-05-30 |
Family
ID=62020180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201708239YA SG10201708239YA (en) | 2016-10-31 | 2017-10-06 | Method for separating a nanoimprint template from a substrate |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10627715B2 (en) |
| JP (1) | JP6929196B2 (en) |
| KR (1) | KR102210834B1 (en) |
| CN (1) | CN108020986B (en) |
| SG (1) | SG10201708239YA (en) |
| TW (1) | TWI716644B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11454883B2 (en) | 2016-11-14 | 2022-09-27 | Canon Kabushiki Kaisha | Template replication |
| US10288999B2 (en) | 2016-12-20 | 2019-05-14 | Canon Kabushiki Kaisha | Methods for controlling extrusions during imprint template replication processes |
| US10444624B1 (en) | 2018-11-30 | 2019-10-15 | Canon Kabushiki Kaisha | Active metrology frame and thermal frame temperature control in imprint lithography |
| US11442359B2 (en) | 2019-03-11 | 2022-09-13 | Canon Kabushiki Kaisha | Method of separating a template from a shaped film on a substrate |
| JP7284639B2 (en) * | 2019-06-07 | 2023-05-31 | キヤノン株式会社 | Molding apparatus and article manufacturing method |
| JP2023510449A (en) * | 2019-12-02 | 2023-03-14 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | Method and apparatus for stripping stamp |
| US20230229076A1 (en) * | 2020-07-06 | 2023-07-20 | Ev Group E. Thallner Gmbh | Method and device for producing micro- and/or nanostructures |
| TW202211363A (en) * | 2020-09-01 | 2022-03-16 | 美商伊路米納有限公司 | Fixtures and related systems and methods |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
| WO2002067055A2 (en) * | 2000-10-12 | 2002-08-29 | Board Of Regents, The University Of Texas System | Template for room temperature, low pressure micro- and nano-imprint lithography |
| US6673287B2 (en) * | 2001-05-16 | 2004-01-06 | International Business Machines Corporation | Vapor phase surface modification of composite substrates to form a molecularly thin release layer |
| US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
| US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
| US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| US7591641B2 (en) * | 2005-03-22 | 2009-09-22 | Canon Kabushiki Kaisha | Mold and process of production thereof |
| US7906058B2 (en) | 2005-12-01 | 2011-03-15 | Molecular Imprints, Inc. | Bifurcated contact printing technique |
| US8361371B2 (en) | 2008-02-08 | 2013-01-29 | Molecular Imprints, Inc. | Extrusion reduction in imprint lithography |
| US8652393B2 (en) | 2008-10-24 | 2014-02-18 | Molecular Imprints, Inc. | Strain and kinetics control during separation phase of imprint process |
| JP4940262B2 (en) | 2009-03-25 | 2012-05-30 | 株式会社東芝 | Imprint pattern forming method |
| JP5363165B2 (en) * | 2009-03-31 | 2013-12-11 | 富士フイルム株式会社 | Method and apparatus for forming fine uneven pattern |
| JP2011103362A (en) | 2009-11-10 | 2011-05-26 | Toshiba Corp | Pattern forming method |
| US20110189329A1 (en) | 2010-01-29 | 2011-08-04 | Molecular Imprints, Inc. | Ultra-Compliant Nanoimprint Lithography Template |
| JP5438578B2 (en) * | 2010-03-29 | 2014-03-12 | 富士フイルム株式会社 | Method and apparatus for forming fine uneven pattern |
| WO2011139782A1 (en) * | 2010-04-27 | 2011-11-10 | Molecular Imprints, Inc. | Separation control substrate/template for nanoimprint lithography |
| JP6028413B2 (en) * | 2012-06-27 | 2016-11-16 | 大日本印刷株式会社 | Method for producing nanoimprint template and template |
| JP6127517B2 (en) * | 2013-01-08 | 2017-05-17 | 大日本印刷株式会社 | Manufacturing method of imprint mold |
| SG11201604407WA (en) * | 2013-12-31 | 2016-07-28 | Canon Nanotechnologies Inc | Asymmetric template shape modulation for partial field imprinting |
| US11454883B2 (en) | 2016-11-14 | 2022-09-27 | Canon Kabushiki Kaisha | Template replication |
| US10969680B2 (en) | 2016-11-30 | 2021-04-06 | Canon Kabushiki Kaisha | System and method for adjusting a position of a template |
| US10288999B2 (en) | 2016-12-20 | 2019-05-14 | Canon Kabushiki Kaisha | Methods for controlling extrusions during imprint template replication processes |
-
2016
- 2016-10-31 US US15/338,735 patent/US10627715B2/en active Active
-
2017
- 2017-10-03 TW TW106134194A patent/TWI716644B/en active
- 2017-10-06 SG SG10201708239YA patent/SG10201708239YA/en unknown
- 2017-10-30 KR KR1020170142080A patent/KR102210834B1/en active IP Right Grant
- 2017-10-30 JP JP2017209540A patent/JP6929196B2/en active Active
- 2017-10-30 CN CN201711029734.2A patent/CN108020986B/en active Active
-
2020
- 2020-03-26 US US16/830,427 patent/US11143957B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI716644B (en) | 2021-01-21 |
| US20200225575A1 (en) | 2020-07-16 |
| KR20180048367A (en) | 2018-05-10 |
| TW201833667A (en) | 2018-09-16 |
| US11143957B2 (en) | 2021-10-12 |
| US20180117805A1 (en) | 2018-05-03 |
| JP6929196B2 (en) | 2021-09-01 |
| US10627715B2 (en) | 2020-04-21 |
| JP2018074159A (en) | 2018-05-10 |
| CN108020986A (en) | 2018-05-11 |
| KR102210834B1 (en) | 2021-02-02 |
| CN108020986B (en) | 2021-08-03 |
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