SG10201705359WA - Inspecting method for inspecting influence of installation environment upon processing apparatus - Google Patents
Inspecting method for inspecting influence of installation environment upon processing apparatusInfo
- Publication number
- SG10201705359WA SG10201705359WA SG10201705359WA SG10201705359WA SG10201705359WA SG 10201705359W A SG10201705359W A SG 10201705359WA SG 10201705359W A SG10201705359W A SG 10201705359WA SG 10201705359W A SG10201705359W A SG 10201705359WA SG 10201705359W A SG10201705359W A SG 10201705359WA
- Authority
- SG
- Singapore
- Prior art keywords
- inspecting
- influence
- processing apparatus
- installation environment
- inspecting method
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0626—Energy control of the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/22—Connection or disconnection of sub-entities or redundant parts of a device in response to a measurement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2881—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to environmental aspects other than temperature, e.g. humidity or vibrations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Automation & Control Theory (AREA)
- General Engineering & Computer Science (AREA)
- Dicing (AREA)
- Machine Tool Sensing Apparatuses (AREA)
- Image Processing (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016141331A JP2018013342A (en) | 2016-07-19 | 2016-07-19 | Inspection method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201705359WA true SG10201705359WA (en) | 2018-02-27 |
Family
ID=60989579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201705359WA SG10201705359WA (en) | 2016-07-19 | 2017-06-29 | Inspecting method for inspecting influence of installation environment upon processing apparatus |
Country Status (7)
Country | Link |
---|---|
US (1) | US10643909B2 (en) |
JP (1) | JP2018013342A (en) |
KR (1) | KR20180009708A (en) |
CN (1) | CN107627468A (en) |
MY (1) | MY181951A (en) |
SG (1) | SG10201705359WA (en) |
TW (1) | TW201812246A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7145643B2 (en) * | 2018-05-17 | 2022-10-03 | 株式会社ディスコ | Inspection jig and inspection method |
CN111180350B (en) * | 2018-11-12 | 2022-05-17 | 长鑫存储技术有限公司 | Semiconductor process control method, device, equipment and readable storage medium |
JP7286456B2 (en) * | 2019-07-19 | 2023-06-05 | 株式会社ディスコ | Processing equipment control method |
CN111010764B (en) * | 2019-12-25 | 2021-10-08 | 深圳市美斯特光电技术有限公司 | Control device and method for parallel connection of multiple LED power supplies with light control and dimming functions |
JP7353190B2 (en) * | 2020-01-10 | 2023-09-29 | 東京エレクトロン株式会社 | Foreign object detection method on mounting table and detection device |
CN111515864B (en) * | 2020-04-30 | 2022-04-05 | 华虹半导体(无锡)有限公司 | Monitoring method and system for diamond disk |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5644245A (en) * | 1993-11-24 | 1997-07-01 | Tokyo Electron Limited | Probe apparatus for inspecting electrical characteristics of a microelectronic element |
JPH11274027A (en) * | 1998-03-19 | 1999-10-08 | Nikon Corp | Method for measuring characteristics of stage device and aligner using the same |
US7308368B2 (en) * | 2004-09-15 | 2007-12-11 | Asml Netherlands B.V. | Method and apparatus for vibration detection, method and apparatus for vibration analysis, lithographic apparatus, device manufacturing method, and computer program |
JP2010091517A (en) * | 2008-10-10 | 2010-04-22 | Soka Univ | Position measuring device |
WO2012013451A1 (en) * | 2010-07-30 | 2012-02-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP5331771B2 (en) * | 2010-09-27 | 2013-10-30 | 株式会社日立ハイテクノロジーズ | Inspection device |
JP2012096274A (en) * | 2010-11-04 | 2012-05-24 | Disco Corp | Laser processing apparatus |
JP2013044421A (en) | 2011-08-26 | 2013-03-04 | Disco Corp | Vibration isolation support structure |
JP6063656B2 (en) | 2012-06-28 | 2017-01-18 | 株式会社ディスコ | Chuck table mechanism of cutting equipment |
JP5728065B2 (en) * | 2013-11-12 | 2015-06-03 | 株式会社片岡製作所 | Laser processing machine |
JP6329435B2 (en) * | 2014-05-27 | 2018-05-23 | キヤノン株式会社 | Measuring apparatus, lithography apparatus, article manufacturing method, and measuring method |
JP6515819B2 (en) * | 2016-01-08 | 2019-05-22 | 三菱電機株式会社 | Evaluation device, inspection method of probe position |
-
2016
- 2016-07-19 JP JP2016141331A patent/JP2018013342A/en active Pending
-
2017
- 2017-06-09 TW TW106119309A patent/TW201812246A/en unknown
- 2017-06-29 SG SG10201705359WA patent/SG10201705359WA/en unknown
- 2017-07-04 MY MYPI2017702437A patent/MY181951A/en unknown
- 2017-07-12 US US15/647,998 patent/US10643909B2/en active Active
- 2017-07-14 CN CN201710573935.2A patent/CN107627468A/en active Pending
- 2017-07-17 KR KR1020170090238A patent/KR20180009708A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US20180025953A1 (en) | 2018-01-25 |
TW201812246A (en) | 2018-04-01 |
MY181951A (en) | 2021-01-15 |
US10643909B2 (en) | 2020-05-05 |
KR20180009708A (en) | 2018-01-29 |
JP2018013342A (en) | 2018-01-25 |
CN107627468A (en) | 2018-01-26 |
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