SG10201700441SA - Diffusion-rate-limited thermal chemical vapor deposition coating - Google Patents

Diffusion-rate-limited thermal chemical vapor deposition coating

Info

Publication number
SG10201700441SA
SG10201700441SA SG10201700441SA SG10201700441SA SG10201700441SA SG 10201700441S A SG10201700441S A SG 10201700441SA SG 10201700441S A SG10201700441S A SG 10201700441SA SG 10201700441S A SG10201700441S A SG 10201700441SA SG 10201700441S A SG10201700441S A SG 10201700441SA
Authority
SG
Singapore
Prior art keywords
diffusion
rate
vapor deposition
chemical vapor
thermal chemical
Prior art date
Application number
SG10201700441SA
Other languages
English (en)
Inventor
F Vezza Thomas
A Condo Steven
Peter Deskevich Nicholas
B Mattzela James
H Silvis Paul
Original Assignee
Silcotek Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silcotek Corp filed Critical Silcotek Corp
Publication of SG10201700441SA publication Critical patent/SG10201700441SA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
SG10201700441SA 2016-01-22 2017-01-19 Diffusion-rate-limited thermal chemical vapor deposition coating SG10201700441SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15/004,455 US20170211180A1 (en) 2016-01-22 2016-01-22 Diffusion-rate-limited thermal chemical vapor deposition coating

Publications (1)

Publication Number Publication Date
SG10201700441SA true SG10201700441SA (en) 2017-08-30

Family

ID=57860771

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201700441SA SG10201700441SA (en) 2016-01-22 2017-01-19 Diffusion-rate-limited thermal chemical vapor deposition coating

Country Status (8)

Country Link
US (1) US20170211180A1 (ja)
EP (1) EP3196335A1 (ja)
JP (1) JP2017150068A (ja)
KR (1) KR20170088307A (ja)
CN (1) CN107267955A (ja)
AU (1) AU2017200337A1 (ja)
SG (1) SG10201700441SA (ja)
TW (1) TWI772285B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018100686A1 (de) * 2018-01-12 2018-03-01 Peter Lell Elektrisches Unterbrechungsschaltglied mit Reaktivbeschichtung in der Reaktionskammer

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4579752A (en) * 1984-10-29 1986-04-01 At&T Bell Laboratories Enhanced corrosion resistance of metal surfaces
US4792460A (en) * 1986-07-15 1988-12-20 Electric Power Research Institute, Inc. Method for production of polysilanes and polygermanes, and deposition of hydrogenated amorphous silicon, alloys thereof, or hydrogenated amorphous germanium
US4684542A (en) * 1986-08-11 1987-08-04 International Business Machines Corporation Low pressure chemical vapor deposition of tungsten silicide
GB2195663B (en) * 1986-08-15 1990-08-22 Nippon Telegraph & Telephone Chemical vapour deposition method and apparatus therefor
JP3507072B2 (ja) * 1991-07-16 2004-03-15 セイコーエプソン株式会社 化学気相推積装置及び半導体膜形成方法と薄膜半導体装置の製造方法
US5299731A (en) * 1993-02-22 1994-04-05 L'air Liquide Corrosion resistant welding of stainless steel
JPH10321819A (ja) * 1997-05-22 1998-12-04 Toshiba Corp 半導体素子の製造方法
JP2001345379A (ja) * 2000-05-30 2001-12-14 Fujitsu Ltd 半導体装置およびその製造方法
JP4484185B2 (ja) * 2000-08-29 2010-06-16 コバレントマテリアル株式会社 シリコン半導体基板の化学的気相薄膜成長方法
EP1421607A2 (en) * 2001-02-12 2004-05-26 ASM America, Inc. Improved process for deposition of semiconductor films
US7175713B2 (en) * 2002-01-25 2007-02-13 Applied Materials, Inc. Apparatus for cyclical deposition of thin films
GB2395492A (en) * 2002-11-25 2004-05-26 Thermo Electron Corp Improvements in deposition methods for the production of semiconductors
CN101066842A (zh) * 2007-06-05 2007-11-07 浙江大学 制备非晶氢硅薄膜的方法及装置
JP5735522B2 (ja) * 2009-10-27 2015-06-17 シルコテック コーポレイション 化学気相成長コーティング、物品、及び方法
WO2014123084A1 (ja) * 2013-02-07 2014-08-14 ピーエスフォー ルクスコ エスエイアールエル 半導体装置およびその製造方法

Also Published As

Publication number Publication date
TW201739950A (zh) 2017-11-16
US20170211180A1 (en) 2017-07-27
KR20170088307A (ko) 2017-08-01
TWI772285B (zh) 2022-08-01
JP2017150068A (ja) 2017-08-31
CN107267955A (zh) 2017-10-20
AU2017200337A1 (en) 2017-08-10
EP3196335A1 (en) 2017-07-26

Similar Documents

Publication Publication Date Title
EP3345210A4 (en) CHEMICAL STEAM SEPARATION SYSTEM WITH MULTIPLE CHAMBERS
SG11201702258TA (en) Atomic layer deposition chamber with thermal lid
SG11201610304SA (en) Design of susceptor in chemical vapor deposition reactor
IL257957B (en) Starting compounds for molecular coatings
EP3471959A4 (en) COATINGS FORMING THERMAL BARRIERS
AU201712272S (en) Vapor transfer cartridge
GB201412058D0 (en) Thermal control coating
EP3543370A4 (en) STEAM DEPOSIT MASK
SG11201810530YA (en) Deposition apparatus and physical vapor deposition chamber
PL3433393T3 (pl) W pełni odczytywalna powłoka natryskiwana termicznie
EP2989229A4 (en) Methods for the photo-initiated chemical vapor deposition (picvd) of coatings and coatings produced by these methods
SG11202001592XA (en) High aspect ratio deposition
GB201515985D0 (en) Deposition process
RS63684B1 (sr) Unapređeno nanošenje obloge toplotnim prskanjem na površine koje nisu glatke
EP3321391A4 (en) CHEMICAL VAPOR DEPOSITION DEVICE AND CHEMICAL VAPOR DEPOSITION METHOD
SG10201506020UA (en) Chemical vapor deposition system, arrangement of chemical vapor deposition systems, and chemical vapor deposition method
SG10201700441SA (en) Diffusion-rate-limited thermal chemical vapor deposition coating
GB2562384B (en) High temperature hydrophobic chemical resistant coating for downhole applications
GB201603988D0 (en) Plasma deposition method
GB201713385D0 (en) Ion-enhanced deposition
SG10201506694QA (en) Chemical vapor deposition process and coated article
GB2553813B (en) Coating
GB201610481D0 (en) Coating
HUP1600384A1 (hu) Antireflexiós bevonat
GB201608332D0 (en) Coating