SG10201510382QA - Selective nitride etch - Google Patents

Selective nitride etch

Info

Publication number
SG10201510382QA
SG10201510382QA SG10201510382QA SG10201510382QA SG10201510382QA SG 10201510382Q A SG10201510382Q A SG 10201510382QA SG 10201510382Q A SG10201510382Q A SG 10201510382QA SG 10201510382Q A SG10201510382Q A SG 10201510382QA SG 10201510382Q A SG10201510382Q A SG 10201510382QA
Authority
SG
Singapore
Prior art keywords
nitride etch
selective nitride
selective
etch
nitride
Prior art date
Application number
SG10201510382QA
Inventor
Iii Ivan L Berry
Ivelin A Angelov
Linda Marquez
Faisal Yaqoob
Pilyeon Park
Helen H Zhu
Bayu Atmaja Thedjoisworo
Zhao Li
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG10201510382QA publication Critical patent/SG10201510382QA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Drying Of Semiconductors (AREA)
  • Analytical Chemistry (AREA)
SG10201510382QA 2014-12-18 2015-12-17 Selective nitride etch SG10201510382QA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/576,020 US20160181116A1 (en) 2014-12-18 2014-12-18 Selective nitride etch

Publications (1)

Publication Number Publication Date
SG10201510382QA true SG10201510382QA (en) 2016-07-28

Family

ID=54849769

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201510382QA SG10201510382QA (en) 2014-12-18 2015-12-17 Selective nitride etch

Country Status (6)

Country Link
US (1) US20160181116A1 (en)
EP (1) EP3038142A1 (en)
KR (1) KR20160075358A (en)
CN (1) CN105719949A (en)
SG (1) SG10201510382QA (en)
TW (1) TW201635381A (en)

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Also Published As

Publication number Publication date
CN105719949A (en) 2016-06-29
EP3038142A1 (en) 2016-06-29
KR20160075358A (en) 2016-06-29
TW201635381A (en) 2016-10-01
US20160181116A1 (en) 2016-06-23

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