SG10201508354YA - Protective film detecting apparatus and protective film detecting method - Google Patents

Protective film detecting apparatus and protective film detecting method

Info

Publication number
SG10201508354YA
SG10201508354YA SG10201508354YA SG10201508354YA SG10201508354YA SG 10201508354Y A SG10201508354Y A SG 10201508354YA SG 10201508354Y A SG10201508354Y A SG 10201508354YA SG 10201508354Y A SG10201508354Y A SG 10201508354YA SG 10201508354Y A SG10201508354Y A SG 10201508354YA
Authority
SG
Singapore
Prior art keywords
protective film
film detecting
detecting apparatus
detecting method
protective
Prior art date
Application number
SG10201508354YA
Inventor
Kudo Yu
Ito Yusaku
Endo Tomoaki
Ohura Yukinobu
Nakanishi Ayana
Ryo Senichi
Odanaka Kentaro
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201508354YA publication Critical patent/SG10201508354YA/en

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20212—Image combination
    • G06T2207/20224—Image subtraction
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Quality & Reliability (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Manufacturing & Machinery (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG10201508354YA 2014-10-30 2015-10-08 Protective film detecting apparatus and protective film detecting method SG10201508354YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014221400A JP6393583B2 (en) 2014-10-30 2014-10-30 Protective film detection apparatus and protective film detection method

Publications (1)

Publication Number Publication Date
SG10201508354YA true SG10201508354YA (en) 2016-05-30

Family

ID=55853206

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201508354YA SG10201508354YA (en) 2014-10-30 2015-10-08 Protective film detecting apparatus and protective film detecting method

Country Status (6)

Country Link
US (1) US9613415B2 (en)
JP (1) JP6393583B2 (en)
KR (1) KR102340012B1 (en)
CN (1) CN105572075B (en)
SG (1) SG10201508354YA (en)
TW (1) TWI655050B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6688695B2 (en) * 2016-06-24 2020-04-28 株式会社ディスコ Protective film coating device and protective film coating method
JP6765949B2 (en) * 2016-12-12 2020-10-07 株式会社ディスコ Wafer processing method
JP2018121031A (en) * 2017-01-27 2018-08-02 株式会社ディスコ Laser processing device
TWI831656B (en) * 2018-01-04 2024-02-01 日商東京威力科創股份有限公司 Substrate processing device and substrate processing method
WO2019207633A1 (en) * 2018-04-24 2019-10-31 ディスコ ハイテック ヨーロッパ ゲーエムベーハー Alignment device and alignment method
JP7011348B2 (en) * 2018-06-12 2022-01-26 株式会社 エフケー光学研究所 Foreign matter inspection device and foreign matter inspection method
JP7325897B2 (en) * 2019-04-18 2023-08-15 株式会社ディスコ Machining device and machining method of workpiece
CN110084957A (en) * 2019-04-28 2019-08-02 深圳回收宝科技有限公司 A kind of method, apparatus, portable terminal and the storage medium of terminal detection
JP7430451B2 (en) * 2020-04-02 2024-02-13 株式会社ディスコ cutting equipment
GB202014596D0 (en) 2020-09-16 2020-10-28 Third Dimension Software Ltd Optical triangulation measurement apparatus and method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63234141A (en) * 1987-03-23 1988-09-29 Hitachi Plant Eng & Constr Co Ltd Method and device for evaluating cleaning effect
JP3358099B2 (en) * 1994-03-25 2002-12-16 オムロン株式会社 Optical sensor device
JPH10305420A (en) 1997-03-04 1998-11-17 Ngk Insulators Ltd Method for fabricating matrix made up of oxide single crystal and method for manufacturing functional device
JPH1114548A (en) * 1997-06-20 1999-01-22 Iinuma Gauge Seisakusho:Kk Inspection method for orientation film for liquid-crystal display element and manufacture of liquid-crystal display element
US8154711B1 (en) * 2004-10-01 2012-04-10 Ingo Werner Scheer Spray diagnostic and control method and system
US7760355B2 (en) * 2005-07-27 2010-07-20 The Curators Of The University Of Missouri Focused droplet nebulizer for evaporative light scattering detector
JP4777783B2 (en) 2006-01-26 2011-09-21 株式会社ディスコ Laser processing equipment
US7664608B2 (en) * 2006-07-14 2010-02-16 Hitachi High-Technologies Corporation Defect inspection method and apparatus
JP2009158763A (en) * 2007-12-27 2009-07-16 Disco Abrasive Syst Ltd Protective film coating apparatus
WO2010036352A1 (en) * 2008-09-23 2010-04-01 Quantalife, Inc Droplet-based assay system
CN102113021B (en) * 2008-12-25 2013-11-27 松下电器产业株式会社 Image processing device and pseudo-3d image creation device
JP5478173B2 (en) * 2009-09-18 2014-04-23 株式会社ディスコ Laser processing equipment
JP2011176035A (en) * 2010-02-23 2011-09-08 Disco Corp Method for cleaning wafer
CN102331420A (en) * 2010-07-13 2012-01-25 合肥普庆新材料科技有限公司 Reagent and detection method for detecting zirconium membrane on surface of metal
JP2012037425A (en) * 2010-08-09 2012-02-23 Jfe Steel Corp Method for inspecting polycrystal silicon wafer and device thereof
JP5836650B2 (en) * 2011-06-08 2015-12-24 シャープ株式会社 Semiconductor substrate cleaning apparatus and cleaning method, and semiconductor device manufacturing method
JP5949192B2 (en) * 2012-06-12 2016-07-06 富士通セミコンダクター株式会社 Semiconductor device manufacturing method and semiconductor device defect testing apparatus
US20140227889A1 (en) * 2013-02-13 2014-08-14 University Of Central Florida Research Foundation, Inc. Laser-based materials processing apparatus, method and applications
JP2014215068A (en) * 2013-04-23 2014-11-17 株式会社ディスコ Protective film detection apparatus

Also Published As

Publication number Publication date
CN105572075A (en) 2016-05-11
CN105572075B (en) 2020-10-09
US20160125591A1 (en) 2016-05-05
TW201615315A (en) 2016-05-01
TWI655050B (en) 2019-04-01
KR102340012B1 (en) 2021-12-16
JP2016090271A (en) 2016-05-23
US9613415B2 (en) 2017-04-04
KR20160051595A (en) 2016-05-11
JP6393583B2 (en) 2018-09-19

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