SG10201507997XA - TUNNELING MAGNETORESISTIVE (TMR) DEVICE WITH MgO TUNNELING BARRIER LAYER AND NITROGEN-CONTAINING LAYER FOR MINIMIZATION OF BORON DIFFUSION - Google Patents

TUNNELING MAGNETORESISTIVE (TMR) DEVICE WITH MgO TUNNELING BARRIER LAYER AND NITROGEN-CONTAINING LAYER FOR MINIMIZATION OF BORON DIFFUSION

Info

Publication number
SG10201507997XA
SG10201507997XA SG10201507997XA SG10201507997XA SG10201507997XA SG 10201507997X A SG10201507997X A SG 10201507997XA SG 10201507997X A SG10201507997X A SG 10201507997XA SG 10201507997X A SG10201507997X A SG 10201507997XA SG 10201507997X A SG10201507997X A SG 10201507997XA
Authority
SG
Singapore
Prior art keywords
tmr
minimization
nitrogen
tunneling
boron diffusion
Prior art date
Application number
SG10201507997XA
Other languages
English (en)
Inventor
Mac Freitag James
Gao Zheng
Original Assignee
HGST Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HGST Netherlands BV filed Critical HGST Netherlands BV
Publication of SG10201507997XA publication Critical patent/SG10201507997XA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3909—Arrangements using a magnetic tunnel junction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/098—Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)
SG10201507997XA 2014-09-28 2015-09-25 TUNNELING MAGNETORESISTIVE (TMR) DEVICE WITH MgO TUNNELING BARRIER LAYER AND NITROGEN-CONTAINING LAYER FOR MINIMIZATION OF BORON DIFFUSION SG10201507997XA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/499,218 US9099124B1 (en) 2014-09-28 2014-09-28 Tunneling magnetoresistive (TMR) device with MgO tunneling barrier layer and nitrogen-containing layer for minimization of boron diffusion

Publications (1)

Publication Number Publication Date
SG10201507997XA true SG10201507997XA (en) 2016-04-28

Family

ID=53719013

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201507997XA SG10201507997XA (en) 2014-09-28 2015-09-25 TUNNELING MAGNETORESISTIVE (TMR) DEVICE WITH MgO TUNNELING BARRIER LAYER AND NITROGEN-CONTAINING LAYER FOR MINIMIZATION OF BORON DIFFUSION

Country Status (6)

Country Link
US (1) US9099124B1 (zh)
EP (1) EP3002755B1 (zh)
JP (1) JP2016071925A (zh)
KR (1) KR20160037817A (zh)
CN (1) CN105469809B (zh)
SG (1) SG10201507997XA (zh)

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US20090122450A1 (en) * 2007-11-08 2009-05-14 Headway Technologies, Inc. TMR device with low magnetostriction free layer
US9240547B2 (en) 2013-09-10 2016-01-19 Micron Technology, Inc. Magnetic tunnel junctions and methods of forming magnetic tunnel junctions
US9373779B1 (en) 2014-12-08 2016-06-21 Micron Technology, Inc. Magnetic tunnel junctions
US9502642B2 (en) 2015-04-10 2016-11-22 Micron Technology, Inc. Magnetic tunnel junctions, methods used while forming magnetic tunnel junctions, and methods of forming magnetic tunnel junctions
US9520553B2 (en) * 2015-04-15 2016-12-13 Micron Technology, Inc. Methods of forming a magnetic electrode of a magnetic tunnel junction and methods of forming a magnetic tunnel junction
US9530959B2 (en) * 2015-04-15 2016-12-27 Micron Technology, Inc. Magnetic tunnel junctions
US9257136B1 (en) 2015-05-05 2016-02-09 Micron Technology, Inc. Magnetic tunnel junctions
US9960346B2 (en) 2015-05-07 2018-05-01 Micron Technology, Inc. Magnetic tunnel junctions
US10483320B2 (en) 2015-12-10 2019-11-19 Everspin Technologies, Inc. Magnetoresistive stack with seed region and method of manufacturing the same
EP3284091B1 (en) 2015-12-10 2021-08-18 Everspin Technologies, Inc. Magnetoresistive stack, seed region therefor and method of manufacturing same
US9590010B1 (en) * 2016-03-24 2017-03-07 Qualcomm Incorporated Perpendicular magnetic tunnel junction (pMTJ) devices employing a thin pinned layer stack and providing a transitioning start to a body-centered cubic (BCC) crystalline / amorphous structure below an upper anti-parallel (AP) layer
US10361361B2 (en) * 2016-04-08 2019-07-23 International Business Machines Corporation Thin reference layer for STT MRAM
US9680089B1 (en) 2016-05-13 2017-06-13 Micron Technology, Inc. Magnetic tunnel junctions
US10566015B2 (en) * 2016-12-12 2020-02-18 Western Digital Technologies, Inc. Spin transfer torque (STT) device with template layer for heusler alloy magnetic layers
US10794968B2 (en) * 2017-08-24 2020-10-06 Everspin Technologies, Inc. Magnetic field sensor and method of manufacture
US10867625B1 (en) 2019-03-28 2020-12-15 Western Digital Technologies, Inc Spin transfer torque (STT) device with template layer for Heusler alloy magnetic layers
DE102019126320B4 (de) * 2019-09-30 2024-03-28 Infineon Technologies Ag Magnetoresistiver Sensor und Fertigungsverfahren für einen magnetoresistiven Sensor
CN112993151A (zh) * 2019-12-02 2021-06-18 中芯国际集成电路制造(上海)有限公司 半导体结构及其形成方法
CN113449834A (zh) * 2020-03-26 2021-09-28 希捷科技有限公司 具有多层合成铁磁体自由层的读取器
US11283006B1 (en) * 2020-05-05 2022-03-22 Western Digital Technologies, Inc. Methods and apparatus of high moment free layers for magnetic tunnel junctions
US11528038B2 (en) 2020-11-06 2022-12-13 Western Digital Technologies, Inc. Content aware decoding using shared data statistics
US12035634B2 (en) * 2021-09-10 2024-07-09 Western Digital Technologies, Inc. Tunneling magnetoresistive (TMR) device with improved seed layer
US12040114B2 (en) 2022-09-14 2024-07-16 Western Digital Technologies, Inc. Magnetoresistive device comprising a synthetic antiferromagnetic coupling layer of RuAl having a (001) texture

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US5465185A (en) 1993-10-15 1995-11-07 International Business Machines Corporation Magnetoresistive spin valve sensor with improved pinned ferromagnetic layer and magnetic recording system using the sensor
JP4731393B2 (ja) * 2006-04-28 2011-07-20 株式会社日立製作所 磁気再生ヘッド
JP5003109B2 (ja) * 2006-11-14 2012-08-15 富士通株式会社 強磁性トンネル接合素子、その製造方法、及びそれを用いた磁気ヘッド、磁気メモリ
JP2009140952A (ja) * 2007-12-03 2009-06-25 Fujitsu Ltd Ｃｐｐ構造磁気抵抗効果素子およびその製造方法並びに記憶装置
US8059374B2 (en) * 2009-01-14 2011-11-15 Headway Technologies, Inc. TMR device with novel free layer structure
JP2011123923A (ja) * 2009-12-08 2011-06-23 Hitachi Global Storage Technologies Netherlands Bv 磁気抵抗効果ヘッド、磁気記録再生装置
US8225489B2 (en) * 2010-03-26 2012-07-24 Tdk Corporation Method of manufacturing magnetoresistive element having a pair of free layers
US8907436B2 (en) * 2010-08-24 2014-12-09 Samsung Electronics Co., Ltd. Magnetic devices having perpendicular magnetic tunnel junction
US20120299132A1 (en) 2011-05-27 2012-11-29 Hitachi Global Storage Technologies Netherlands B.V. Tunneling magnetoresistance (tmr) read sensor with low-contact-resistance interfaces
KR20130008929A (ko) * 2011-07-13 2013-01-23 에스케이하이닉스 주식회사 개선된 자성층의 두께 마진을 갖는 자기 메모리 디바이스
US8817426B2 (en) * 2011-10-17 2014-08-26 HGST Netherlands B.V. Magnetic sensor having CoFeBTa in pinned and free layer structures
US8617644B2 (en) * 2012-03-08 2013-12-31 HGST Netherlands B.V. Method for making a current-perpendicular-to-the-plane (CPP) magnetoresistive sensor containing a ferromagnetic alloy requiring post-deposition annealing

Also Published As

Publication number Publication date
CN105469809B (zh) 2018-11-30
CN105469809A (zh) 2016-04-06
JP2016071925A (ja) 2016-05-09
KR20160037817A (ko) 2016-04-06
EP3002755A2 (en) 2016-04-06
EP3002755A3 (en) 2016-09-28
US9099124B1 (en) 2015-08-04
EP3002755B1 (en) 2021-06-16

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