SG10201408200QA - Composition for titanium nitride hard mask and etch residue removal - Google Patents

Composition for titanium nitride hard mask and etch residue removal

Info

Publication number
SG10201408200QA
SG10201408200QA SG10201408200QA SG10201408200QA SG10201408200QA SG 10201408200Q A SG10201408200Q A SG 10201408200QA SG 10201408200Q A SG10201408200Q A SG 10201408200QA SG 10201408200Q A SG10201408200Q A SG 10201408200QA SG 10201408200Q A SG10201408200Q A SG 10201408200QA
Authority
SG
Singapore
Prior art keywords
composition
hard mask
titanium nitride
residue removal
etch residue
Prior art date
Application number
SG10201408200QA
Inventor
Jack Casteel William Jr
Inaoka Seiji
Bhaskara Rao Madhukar
Faye Ross Brenda
Lee Yi-Chia
Dar Liu Wen
Chen Tianniu
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of SG10201408200QA publication Critical patent/SG10201408200QA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
    • H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
SG10201408200QA 2013-12-20 2014-12-09 Composition for titanium nitride hard mask and etch residue removal SG10201408200QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361918943P 2013-12-20 2013-12-20
US14/547,864 US9472420B2 (en) 2013-12-20 2014-11-19 Composition for titanium nitride hard mask and etch residue removal

Publications (1)

Publication Number Publication Date
SG10201408200QA true SG10201408200QA (en) 2015-07-30

Family

ID=53399354

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201408200QA SG10201408200QA (en) 2013-12-20 2014-12-09 Composition for titanium nitride hard mask and etch residue removal

Country Status (8)

Country Link
US (1) US9472420B2 (en)
EP (1) EP2922086B1 (en)
JP (1) JP6027083B2 (en)
KR (1) KR101696711B1 (en)
CN (1) CN104730870B (en)
IL (1) IL236316B (en)
SG (1) SG10201408200QA (en)
TW (1) TWI554591B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104145324B (en) * 2011-12-28 2017-12-22 恩特格里斯公司 Composition and method for selective etch titanium nitride
US9957469B2 (en) * 2014-07-14 2018-05-01 Versum Materials Us, Llc Copper corrosion inhibition system
US9222018B1 (en) * 2014-07-24 2015-12-29 Air Products And Chemicals, Inc. Titanium nitride hard mask and etch residue removal
EP3280832A1 (en) * 2015-04-10 2018-02-14 Basf Se Process for inhibiting the corrosion of metal surfaces
US10072237B2 (en) * 2015-08-05 2018-09-11 Versum Materials Us, Llc Photoresist cleaning composition used in photolithography and a method for treating substrate therewith
EP3436621B1 (en) * 2016-03-29 2020-02-12 Technic France Solution and method for etching titanium based materials
WO2018061582A1 (en) * 2016-09-29 2018-04-05 富士フイルム株式会社 Treatment fluid and method for treating laminate
CN107678253A (en) * 2017-09-26 2018-02-09 合肥新汇成微电子有限公司 A kind of cleaning fluid for semiconductor crystal wafer plasma etch residues
US20190103282A1 (en) * 2017-09-29 2019-04-04 Versum Materials Us, Llc Etching Solution for Simultaneously Removing Silicon and Silicon-Germanium Alloy From a Silicon-Germanium/Silicon Stack During Manufacture of a Semiconductor Device
CN109971565B (en) * 2017-12-27 2021-10-22 安集微电子（上海）有限公司 Fluorine-containing cleaning solution
KR102665340B1 (en) * 2018-09-18 2024-05-14 삼성전자주식회사 Etching composition and method for manufacturing semiconductor device using the same
WO2021049330A1 (en) * 2019-09-11 2021-03-18 富士フイルム株式会社 Processing liquid, processing method
IL294958A (en) * 2020-01-30 2022-09-01 Showa Denko Kk Method for removing metal compound
CN113568286A (en) * 2020-04-28 2021-10-29 安集微电子科技（上海）股份有限公司 Cleaning solution for removing etching residues
CN113161234B (en) * 2021-04-27 2023-02-17 上海新阳半导体材料股份有限公司 Application of fluorine-containing cleaning liquid composition

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376057A (en) 1980-11-26 1983-03-08 International Business Machines Corporation Etchant composition and use thereof
US6030932A (en) * 1996-09-06 2000-02-29 Olin Microelectronic Chemicals Cleaning composition and method for removing residues
US6419554B2 (en) 1999-06-24 2002-07-16 Micron Technology, Inc. Fixed abrasive chemical-mechanical planarization of titanium nitride
US6677286B1 (en) * 2002-07-10 2004-01-13 Air Products And Chemicals, Inc. Compositions for removing etching residue and use thereof
TW200505975A (en) * 2003-04-18 2005-02-16 Ekc Technology Inc Aqueous fluoride compositions for cleaning semiconductor devices
TW200428512A (en) * 2003-05-02 2004-12-16 Ekc Technology Inc Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing
EP1664935B1 (en) 2003-08-19 2007-10-17 Mallinckrodt Baker, Inc. Stripping and cleaning compositions for microelectronics
JP2005232559A (en) 2004-02-23 2005-09-02 Meltex Inc Titanium removing solution
US20090212021A1 (en) 2005-06-13 2009-08-27 Advanced Technology Materials, Inc. Compositions and methods for selective removal of metal or metal alloy after metal silicide formation
EP1780309B8 (en) 2005-10-25 2010-12-15 ATOTECH Deutschland GmbH Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces
US8025811B2 (en) * 2006-03-29 2011-09-27 Intel Corporation Composition for etching a metal hard mask material in semiconductor processing
SG177915A1 (en) 2006-12-21 2012-02-28 Advanced Tech Materials Liquid cleaner for the removal of post-etch residues
US8623236B2 (en) * 2007-07-13 2014-01-07 Tokyo Ohka Kogyo Co., Ltd. Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film
JP5364250B2 (en) 2007-07-13 2013-12-11 東京応化工業株式会社 Titanium nitride stripping solution and method for stripping titanium nitride coating
WO2009064336A1 (en) 2007-11-16 2009-05-22 Ekc Technology, Inc. Compositions for removal of metal hard mask etching residues from a semiconductor substrate
MY158776A (en) 2009-05-07 2016-11-15 Basf Se Resist stripping compositions and methods for manufacturing electrical devices
KR101800803B1 (en) 2009-12-24 2017-11-27 주식회사 동진쎄미켐 Etchant and method for preparing electronic device
JP2013533631A (en) 2010-07-16 2013-08-22 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド Aqueous cleaning agent to remove residues after etching
TWI619800B (en) 2010-10-06 2018-04-01 恩特葛瑞斯股份有限公司 Composition and process for selectively etching metal nitrides
US20130045908A1 (en) 2011-08-15 2013-02-21 Hua Cui Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material
US9257270B2 (en) 2011-08-15 2016-02-09 Ekc Technology Method and composition for removing resist, etch residue, and copper oxide from substrates having copper, metal hardmask and low-k dielectric material
KR102009250B1 (en) 2011-09-09 2019-08-12 동우 화인켐 주식회사 Method for manufacturing display device and an etching solution composition for metal layer containing copper/metal oxide layer
CN104145324B (en) 2011-12-28 2017-12-22 恩特格里斯公司 Composition and method for selective etch titanium nitride
KR20130084932A (en) 2012-01-18 2013-07-26 삼성전자주식회사 Method of manufacturing semiconductor device
SG10202102525WA (en) 2012-03-12 2021-04-29 Entegris Inc Methods for the selective removal of ashed spin-on glass
CN103525599A (en) 2013-09-23 2014-01-22 杨桂望 Boiler scale remover
US9222018B1 (en) * 2014-07-24 2015-12-29 Air Products And Chemicals, Inc. Titanium nitride hard mask and etch residue removal

Also Published As

Publication number Publication date
KR20150073108A (en) 2015-06-30
KR101696711B1 (en) 2017-01-16
JP2015122496A (en) 2015-07-02
US20150175943A1 (en) 2015-06-25
EP2922086B1 (en) 2019-05-08
EP2922086A1 (en) 2015-09-23
JP6027083B2 (en) 2016-11-16
IL236316B (en) 2020-10-29
CN104730870B (en) 2020-09-08
TWI554591B (en) 2016-10-21
TW201525107A (en) 2015-07-01
CN104730870A (en) 2015-06-24
IL236316A0 (en) 2015-03-31
US9472420B2 (en) 2016-10-18

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