SG10201407280RA - In-line type film forming apparatus and method of manufacturing magnetic recording medium using the same - Google Patents

In-line type film forming apparatus and method of manufacturing magnetic recording medium using the same

Info

Publication number
SG10201407280RA
SG10201407280RA SG10201407280RA SG10201407280RA SG10201407280RA SG 10201407280R A SG10201407280R A SG 10201407280RA SG 10201407280R A SG10201407280R A SG 10201407280RA SG 10201407280R A SG10201407280R A SG 10201407280RA SG 10201407280R A SG10201407280R A SG 10201407280RA
Authority
SG
Singapore
Prior art keywords
recording medium
forming apparatus
film forming
same
magnetic recording
Prior art date
Application number
SG10201407280RA
Inventor
Nagai Seiya
Ueno Satoru
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of SG10201407280RA publication Critical patent/SG10201407280RA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/85—Coating a support with a magnetic layer by vapour deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
SG10201407280RA 2013-11-07 2014-11-06 In-line type film forming apparatus and method of manufacturing magnetic recording medium using the same SG10201407280RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013231378A JP6303167B2 (en) 2013-11-07 2013-11-07 In-line film forming apparatus and method for manufacturing magnetic recording medium using the same

Publications (1)

Publication Number Publication Date
SG10201407280RA true SG10201407280RA (en) 2015-06-29

Family

ID=53007239

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201407280RA SG10201407280RA (en) 2013-11-07 2014-11-06 In-line type film forming apparatus and method of manufacturing magnetic recording medium using the same

Country Status (3)

Country Link
US (1) US10381034B2 (en)
JP (1) JP6303167B2 (en)
SG (1) SG10201407280RA (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6379318B1 (en) * 2017-06-14 2018-08-22 株式会社アルバック Film forming apparatus, film forming method, and solar cell manufacturing method
JP2021066895A (en) * 2018-02-26 2021-04-30 株式会社アルバック Film deposition method
MX2023008917A (en) * 2021-01-29 2024-01-24 Pink Gmbh Thermosysteme System and method for connecting electronic assemblies.
CN116868321A (en) * 2021-01-29 2023-10-10 平克塞莫系统有限公司 System and method for connecting electronic components

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US3976330A (en) * 1975-10-01 1976-08-24 International Business Machines Corporation Transport system for semiconductor wafer multiprocessing station system
US5215420A (en) 1991-09-20 1993-06-01 Intevac, Inc. Substrate handling and processing system
JP3732250B2 (en) 1995-03-30 2006-01-05 キヤノンアネルバ株式会社 In-line deposition system
JP4044994B2 (en) * 1997-11-14 2008-02-06 大日本スクリーン製造株式会社 Substrate processing equipment
US6517691B1 (en) 1998-08-20 2003-02-11 Intevac, Inc. Substrate processing system
JP4482170B2 (en) * 1999-03-26 2010-06-16 キヤノンアネルバ株式会社 Film forming apparatus and film forming method
TW552306B (en) * 1999-03-26 2003-09-11 Anelva Corp Method of removing accumulated films from the surfaces of substrate holders in film deposition apparatus, and film deposition apparatus
JP4526151B2 (en) * 2000-01-28 2010-08-18 キヤノンアネルバ株式会社 Substrate transfer device for substrate processing apparatus
JP4268303B2 (en) 2000-02-01 2009-05-27 キヤノンアネルバ株式会社 Inline type substrate processing equipment
JP4222589B2 (en) 2001-03-26 2009-02-12 キヤノンアネルバ株式会社 Substrate transport apparatus and substrate processing apparatus using the same
CN1831186A (en) 2001-10-25 2006-09-13 松下电器产业株式会社 Method of forming optical recording medium
US7959395B2 (en) 2002-07-22 2011-06-14 Brooks Automation, Inc. Substrate processing apparatus
JP4447279B2 (en) * 2003-10-15 2010-04-07 キヤノンアネルバ株式会社 Deposition equipment
JP4859485B2 (en) * 2006-02-27 2012-01-25 三菱重工業株式会社 Organic semiconductor manufacturing equipment
JP2008285698A (en) * 2007-05-15 2008-11-27 Canon Anelva Corp Film deposition apparatus
CN101779241B (en) * 2008-06-17 2012-08-29 佳能安内华股份有限公司 Carrier with contact preventing cover
JP5529484B2 (en) * 2008-10-28 2014-06-25 キヤノンアネルバ株式会社 Substrate transport apparatus and magnetic recording medium manufacturing method
JP5657948B2 (en) * 2009-09-02 2015-01-21 キヤノンアネルバ株式会社 Vacuum processing apparatus and substrate transfer method
JP5566669B2 (en) * 2009-11-19 2014-08-06 昭和電工株式会社 In-line film forming apparatus and method for manufacturing magnetic recording medium
US20110263065A1 (en) * 2010-04-22 2011-10-27 Primestar Solar, Inc. Modular system for high-rate deposition of thin film layers on photovoltaic module substrates
JP5247847B2 (en) * 2011-03-29 2013-07-24 キヤノンアネルバ株式会社 Film forming apparatus and stock chamber for film forming apparatus
JP5832372B2 (en) * 2011-05-16 2015-12-16 キヤノンアネルバ株式会社 Vacuum processing equipment

Also Published As

Publication number Publication date
JP2015089962A (en) 2015-05-11
US10381034B2 (en) 2019-08-13
US20150125597A1 (en) 2015-05-07
JP6303167B2 (en) 2018-04-04

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