SE8600228D0 - WAY TO TRANSPORT ARTICLES THROUGH A MANUFACTURING AND / OR FINISHING PROCESS - Google Patents

WAY TO TRANSPORT ARTICLES THROUGH A MANUFACTURING AND / OR FINISHING PROCESS

Info

Publication number
SE8600228D0
SE8600228D0 SE8600228A SE8600228A SE8600228D0 SE 8600228 D0 SE8600228 D0 SE 8600228D0 SE 8600228 A SE8600228 A SE 8600228A SE 8600228 A SE8600228 A SE 8600228A SE 8600228 D0 SE8600228 D0 SE 8600228D0
Authority
SE
Sweden
Prior art keywords
magazine
products
equipment
vacuum
manufacturing
Prior art date
Application number
SE8600228A
Other languages
Swedish (sv)
Other versions
SE8600228L (en
SE456570B (en
Inventor
J Nordlander
Original Assignee
Applied Vacuum Scandinavia Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Vacuum Scandinavia Ab filed Critical Applied Vacuum Scandinavia Ab
Priority to SE8600228A priority Critical patent/SE456570B/en
Publication of SE8600228D0 publication Critical patent/SE8600228D0/en
Priority to EP19870900912 priority patent/EP0283477A1/en
Priority to JP50078487A priority patent/JPS63502176A/en
Priority to PCT/SE1987/000022 priority patent/WO1987004414A1/en
Publication of SE8600228L publication Critical patent/SE8600228L/en
Publication of SE456570B publication Critical patent/SE456570B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Packaging For Recording Disks (AREA)
  • Specific Conveyance Elements (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Warehouses Or Storage Devices (AREA)

Abstract

Method for transporting disc-shaped, circular or essentially circular products from a manufacturing process to and through another process comprising at least one process stage which is executed in to all intents and purposes dust-free conditions under vacuum. The invention is characterized in that the products (37) from the first-mentioned process are placed in a magazine (2; 3; 4) with a to all intents and purposes dust-free atmosphere. Once a pre-determined number of products (37) has been received, the magazine (2; 3; 4) is sealed, evacuated and transported to vacuum process equipment (1) in which the aforementioned process stage is executed. The magazine (2) is connected to the latter and is opened under vacuum, whereupon the products (37) are removed from the magazine (2), one by one, and are conveyed inside the equipment (1) via a process zone (16) into a second, originally empty magazine (3) connected to the equipment. Once the pre-determined number of products (37) has been received, the second magazine is closed, with the vacuum maintained, and is disconnected from the vacuum process equipment (1).
SE8600228A 1986-01-20 1986-01-20 WAY TO TRANSPORT ARTICLES THROUGH A MANUFACTURING AND / OR FINISHING PROCESS SE456570B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
SE8600228A SE456570B (en) 1986-01-20 1986-01-20 WAY TO TRANSPORT ARTICLES THROUGH A MANUFACTURING AND / OR FINISHING PROCESS
EP19870900912 EP0283477A1 (en) 1986-01-20 1987-01-20 Method of transporting products in a manufacturing process
JP50078487A JPS63502176A (en) 1986-01-20 1987-01-20 How to transfer products during the manufacturing process
PCT/SE1987/000022 WO1987004414A1 (en) 1986-01-20 1987-01-20 Method of transporting products in a manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8600228A SE456570B (en) 1986-01-20 1986-01-20 WAY TO TRANSPORT ARTICLES THROUGH A MANUFACTURING AND / OR FINISHING PROCESS

Publications (3)

Publication Number Publication Date
SE8600228D0 true SE8600228D0 (en) 1986-01-20
SE8600228L SE8600228L (en) 1987-07-21
SE456570B SE456570B (en) 1988-10-17

Family

ID=20363148

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8600228A SE456570B (en) 1986-01-20 1986-01-20 WAY TO TRANSPORT ARTICLES THROUGH A MANUFACTURING AND / OR FINISHING PROCESS

Country Status (4)

Country Link
EP (1) EP0283477A1 (en)
JP (1) JPS63502176A (en)
SE (1) SE456570B (en)
WO (1) WO1987004414A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308431A (en) * 1986-04-18 1994-05-03 General Signal Corporation System providing multiple processing of substrates
EP0246453A3 (en) * 1986-04-18 1989-09-06 General Signal Corporation Novel multiple-processing and contamination-free plasma etching system
US6103055A (en) * 1986-04-18 2000-08-15 Applied Materials, Inc. System for processing substrates
US4733631B1 (en) * 1986-09-30 1993-03-09 Apparatus for coating substrate devices
DE3827343A1 (en) * 1988-08-12 1990-02-15 Leybold Ag DEVICE ACCORDING TO THE CAROUSEL PRINCIPLE FOR COATING SUBSTRATES
FR2621023B1 (en) * 1987-09-24 1992-03-20 Stein Heurtey AUTOMATIC FAST THERMOCHEMICAL TREATMENT SYSTEM
US5156521A (en) * 1987-10-15 1992-10-20 Epsilon Technology, Inc. Method for loading a substrate into a GVD apparatus
US5092728A (en) * 1987-10-15 1992-03-03 Epsilon Technology, Inc. Substrate loading apparatus for a CVD process
US5435682A (en) * 1987-10-15 1995-07-25 Advanced Semiconductor Materials America, Inc. Chemical vapor desposition system
EP0322205A3 (en) * 1987-12-23 1990-09-12 Texas Instruments Incorporated Automated photolithographic work cell
US5076205A (en) * 1989-01-06 1991-12-31 General Signal Corporation Modular vapor processor system
FR2644567A1 (en) * 1989-03-17 1990-09-21 Etudes Const Mecaniques DEVICE FOR EXECUTING HEAT TREATMENTS CONTINUOUS IN VACUUM CONTINUOUS
US5174827A (en) * 1989-07-26 1992-12-29 Consorzio Ce.Te.V Centro Tecnologie Del Vuoto Double chamber vacuum apparatus for thin layer deposition
US5713711A (en) * 1995-01-17 1998-02-03 Bye/Oasis Multiple interface door for wafer storage and handling container
US5882171A (en) 1996-10-01 1999-03-16 Balzers Aktiengesellschaft Transport and transfer apparatus
NL1027638C2 (en) * 2004-12-01 2006-06-02 Ecim Technologies Bv Information carrier and method and device for its manufacture.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311427A (en) * 1979-12-21 1982-01-19 Varian Associates, Inc. Wafer transfer system
US4293249A (en) * 1980-03-03 1981-10-06 Texas Instruments Incorporated Material handling system and method for manufacturing line
GB2150098B (en) * 1983-11-24 1986-10-08 Dyna Pert Precima Limited Machine for placing electronic components on a substrate
NL8400658A (en) * 1984-03-01 1985-10-01 Bok Edward IMPROVED INSTALLATION FOR VACUUM PROCESSING OF SUBSTRATES.
US4544317A (en) * 1984-04-16 1985-10-01 International Business Machines Corporation Vacuum-to-vacuum entry system apparatus

Also Published As

Publication number Publication date
SE8600228L (en) 1987-07-21
JPS63502176A (en) 1988-08-25
EP0283477A1 (en) 1988-09-28
WO1987004414A1 (en) 1987-07-30
SE456570B (en) 1988-10-17

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