SE7908083L - Forstoftningsapparat med effektmatning via ett flertal net - Google Patents

Forstoftningsapparat med effektmatning via ett flertal net

Info

Publication number
SE7908083L
SE7908083L SE7908083A SE7908083A SE7908083L SE 7908083 L SE7908083 L SE 7908083L SE 7908083 A SE7908083 A SE 7908083A SE 7908083 A SE7908083 A SE 7908083A SE 7908083 L SE7908083 L SE 7908083L
Authority
SE
Sweden
Prior art keywords
power supply
supply via
via several
spray appliance
several net
Prior art date
Application number
SE7908083A
Other languages
English (en)
Inventor
H J Weber
Original Assignee
Coulter Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/066,917 external-priority patent/US4284490A/en
Application filed by Coulter Systems Corp filed Critical Coulter Systems Corp
Publication of SE7908083L publication Critical patent/SE7908083L/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
SE7908083A 1979-08-21 1979-09-28 Forstoftningsapparat med effektmatning via ett flertal net SE7908083L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/066,917 US4284490A (en) 1978-09-28 1979-08-21 R.F. Sputtering apparatus including multi-network power supply

Publications (1)

Publication Number Publication Date
SE7908083L true SE7908083L (sv) 1981-02-22

Family

ID=22072548

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7908083A SE7908083L (sv) 1979-08-21 1979-09-28 Forstoftningsapparat med effektmatning via ett flertal net

Country Status (7)

Country Link
JP (1) JPS56108875A (sv)
CA (1) CA1143005A (sv)
DE (1) DE2939167A1 (sv)
FR (1) FR2464009A1 (sv)
GB (1) GB2058470A (sv)
NL (1) NL7907241A (sv)
SE (1) SE7908083L (sv)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0633452B2 (ja) * 1985-06-25 1994-05-02 株式会社シンクロン スパツタ装置
JP2831961B2 (ja) * 1988-01-11 1998-12-02 忠弘 大見 薄膜形成装置のスパッタリング制御装置
JPH02156081A (ja) * 1988-12-09 1990-06-15 Tokuda Seisakusho Ltd スパッタ装置
JP2001516954A (ja) * 1997-09-17 2001-10-02 東京エレクトロン株式会社 電気インピーダンス整合システムとその方法
DE10015699B4 (de) * 2000-03-27 2004-03-18 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Schaltungsanordnung zur Impedanzkompensation
WO2006050632A2 (en) * 2004-11-12 2006-05-18 Oc Oerlikon Balzers Ag Impedance matching of a capacitively coupled rf plasma reactor suitable for large area substrates
DE202008006477U1 (de) * 2008-05-06 2008-07-24 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Vorrichtung zur Modifizierung von Substratoberflächen
CN117004917B (zh) * 2023-08-14 2025-08-15 天津吉兆源科技有限公司 一种均匀性调节装置及磁控溅射真空镀膜机

Also Published As

Publication number Publication date
FR2464009A1 (fr) 1981-02-27
NL7907241A (nl) 1981-02-24
GB2058470A (en) 1981-04-08
DE2939167A1 (de) 1981-04-02
JPS56108875A (en) 1981-08-28
CA1143005A (en) 1983-03-15

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