SE7908083L - Forstoftningsapparat med effektmatning via ett flertal net - Google Patents

Forstoftningsapparat med effektmatning via ett flertal net

Info

Publication number
SE7908083L
SE7908083L SE7908083A SE7908083A SE7908083L SE 7908083 L SE7908083 L SE 7908083L SE 7908083 A SE7908083 A SE 7908083A SE 7908083 A SE7908083 A SE 7908083A SE 7908083 L SE7908083 L SE 7908083L
Authority
SE
Sweden
Prior art keywords
power supply
supply via
via several
spray appliance
several net
Prior art date
Application number
SE7908083A
Other languages
English (en)
Inventor
H J Weber
Original Assignee
Coulter Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/066,917 external-priority patent/US4284490A/en
Application filed by Coulter Systems Corp filed Critical Coulter Systems Corp
Publication of SE7908083L publication Critical patent/SE7908083L/sv

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3444Associated circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38Impedance-matching networks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
SE7908083A 1979-08-21 1979-09-28 Forstoftningsapparat med effektmatning via ett flertal net SE7908083L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/066,917 US4284490A (en) 1978-09-28 1979-08-21 R.F. Sputtering apparatus including multi-network power supply

Publications (1)

Publication Number Publication Date
SE7908083L true SE7908083L (sv) 1981-02-22

Family

ID=22072548

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7908083A SE7908083L (sv) 1979-08-21 1979-09-28 Forstoftningsapparat med effektmatning via ett flertal net

Country Status (7)

Country Link
JP (1) JPS56108875A (sv)
CA (1) CA1143005A (sv)
DE (1) DE2939167A1 (sv)
FR (1) FR2464009A1 (sv)
GB (1) GB2058470A (sv)
NL (1) NL7907241A (sv)
SE (1) SE7908083L (sv)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0633452B2 (ja) * 1985-06-25 1994-05-02 株式会社シンクロン スパツタ装置
JP2831961B2 (ja) * 1988-01-11 1998-12-02 忠弘 大見 薄膜形成装置のスパッタリング制御装置
JPH02156081A (ja) * 1988-12-09 1990-06-15 Tokuda Seisakusho Ltd スパッタ装置
EP1023771B1 (en) * 1997-09-17 2007-01-17 Tokyo Electron Limited Electrical impedance matching system and method
DE10015699B4 (de) * 2000-03-27 2004-03-18 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Schaltungsanordnung zur Impedanzkompensation
DE602005022221D1 (de) * 2004-11-12 2010-08-19 Oerlikon Trading Ag Impedanzanpassung eines kapazitiv gekoppelten hf-plasmareaktors mit eignung für grossflächige substrate
DE202008006477U1 (de) * 2008-05-06 2008-07-24 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Vorrichtung zur Modifizierung von Substratoberflächen
CN117004917B (zh) * 2023-08-14 2025-08-15 天津吉兆源科技有限公司 一种均匀性调节装置及磁控溅射真空镀膜机

Also Published As

Publication number Publication date
DE2939167A1 (de) 1981-04-02
JPS56108875A (en) 1981-08-28
FR2464009A1 (fr) 1981-02-27
CA1143005A (en) 1983-03-15
NL7907241A (nl) 1981-02-24
GB2058470A (en) 1981-04-08

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