SE7907524L - Desensibilseringslosning och sett att behandla en ljuskenslig diazotryckplat - Google Patents

Desensibilseringslosning och sett att behandla en ljuskenslig diazotryckplat

Info

Publication number
SE7907524L
SE7907524L SE7907524A SE7907524A SE7907524L SE 7907524 L SE7907524 L SE 7907524L SE 7907524 A SE7907524 A SE 7907524A SE 7907524 A SE7907524 A SE 7907524A SE 7907524 L SE7907524 L SE 7907524L
Authority
SE
Sweden
Prior art keywords
desensilization
diazo
treat
light
solution
Prior art date
Application number
SE7907524A
Other languages
English (en)
Other versions
SE423003B (sv
Inventor
E L Langlais
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of SE7907524L publication Critical patent/SE7907524L/sv
Publication of SE423003B publication Critical patent/SE423003B/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SE7907524A 1978-02-06 1979-09-11 Desensibiliseringslosning och anvendning derav for att behandla en framkallad, ljuskenslig diazotryckplat SE423003B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87536778A 1978-02-06 1978-02-06

Publications (2)

Publication Number Publication Date
SE7907524L true SE7907524L (sv) 1979-09-11
SE423003B SE423003B (sv) 1982-04-05

Family

ID=25365677

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7907524A SE423003B (sv) 1978-02-06 1979-09-11 Desensibiliseringslosning och anvendning derav for att behandla en framkallad, ljuskenslig diazotryckplat

Country Status (9)

Country Link
US (1) US4329422A (sv)
EP (1) EP0009031B1 (sv)
JP (1) JPS56500646A (sv)
CH (1) CH645996A5 (sv)
DE (1) DE2934897C1 (sv)
DK (1) DK378679A (sv)
GB (1) GB2036993B (sv)
SE (1) SE423003B (sv)
WO (1) WO1979000593A1 (sv)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5542890A (en) * 1978-09-22 1980-03-26 Fuji Photo Film Co Ltd Desensitizing solution for lithographic printing
NZ194648A (en) * 1979-08-20 1982-12-07 Vickers Ltd Producing lithographic printing plate from radiation sensitive plate plate finishing composition
DE3127668A1 (de) * 1981-07-13 1983-01-20 Hoechst Ag, 6000 Frankfurt Verfahren und loesung zum konservieren von flachdruckformen
DE3140186A1 (de) * 1981-10-09 1983-04-28 Hoechst Ag, 6230 Frankfurt Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten
DE3410522A1 (de) * 1984-03-22 1985-10-03 Hoechst Ag, 6230 Frankfurt Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform
JPS6231859A (ja) * 1985-08-01 1987-02-10 Fuji Photo Film Co Ltd 製版方法
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
CA1305296C (en) * 1986-07-02 1992-07-21 Robert Bassemir Fountain solutions
US4783395A (en) * 1987-02-17 1988-11-08 Hoechst Celanese Corporation Desensitizing solution for lithographic printing plates
US4728597A (en) * 1987-02-17 1988-03-01 Hoechst Celanese Corporation Desensitizing solution for lithographic printing plates
US6248506B1 (en) * 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
EP1751625B9 (en) 2004-05-19 2012-03-14 Agfa Graphics N.V. Method of making a photopolymer printing plate
US7816065B2 (en) * 2005-07-29 2010-10-19 Anocoil Corporation Imageable printing plate for on-press development
US8133658B2 (en) * 2005-07-29 2012-03-13 Anocoil Corporation Non-chemical development of printing plates
US8137897B2 (en) * 2005-07-29 2012-03-20 Anocoil Corporation Processless development of printing plate
US8377630B2 (en) * 2005-07-29 2013-02-19 Anocoil Corporation On-press plate development without contamination of fountain fluid
US8343707B2 (en) 2005-07-29 2013-01-01 Anocoil Corporation Lithographic printing plate for in-solidus development on press
EP2214056B1 (en) * 2005-11-18 2012-12-26 Agfa Graphics N.V. Method of making a lithographic printing plate
PL1788444T3 (pl) * 2005-11-18 2011-06-30 Agfa Nv Sposób wytwarzania kliszy do druku litograficznego
ATE473469T1 (de) * 2005-11-18 2010-07-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
PL1788443T3 (pl) * 2005-11-18 2014-12-31 Agfa Nv Sposób wytwarzania litograficznej płyty drukowej
WO2008138966A1 (en) * 2007-05-15 2008-11-20 Agfa Graphics Nv A method for making a lithographic printing plate precursor
JP5705607B2 (ja) * 2011-03-23 2015-04-22 メルクパフォーマンスマテリアルズＩｐ合同会社 リソグラフィー用リンス液およびそれを用いたパターン形成方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2354979A (en) * 1942-04-15 1944-08-01 Atlas Powder Co Antioffset composition
US2547632A (en) * 1947-06-07 1951-04-03 Ewing Dev Company Sun screen with plastic warp
US2780168A (en) * 1951-11-16 1957-02-05 John H Schneider Composition for use in eliminating oil and grease smudges from offset printing mats and plates
BE540225A (sv) * 1954-08-20
US3257941A (en) * 1960-04-04 1966-06-28 Anken Chemical And Film Corp Method and means of making planographic printing plates
BE625786A (sv) * 1961-12-09
NL287211A (sv) * 1962-01-11
DE1199791B (de) * 1963-10-04 1965-09-02 Kalle Ag Reinigerloesungen fuer Flachdruckformen
US3501522A (en) * 1965-09-07 1970-03-17 Allied Chem Derivatives of 1,3-bis(heptafluoroisopropyl)benzene
GB1198123A (en) * 1967-03-06 1970-07-08 Agfa Gevaert Nv Process for Preparing a Planographic Printing Master
US3398002A (en) * 1967-06-29 1968-08-20 Bondurant Universal fountain solution for planographic printing
US3696746A (en) * 1969-04-24 1972-10-10 James E Harper Desensitizing non-ferrous lithographic printing plates with aqueous phosphate glass compositions
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof
US3655387A (en) * 1970-09-15 1972-04-11 Eastman Kodak Co Antistatic photographic compositions
US3745028A (en) * 1971-04-26 1973-07-10 Eastman Kodak Co Lithographic plate desensitizer formulations
US3738850A (en) * 1971-10-04 1973-06-12 Eastman Kodak Co Lithographic plate desensitizer formulations
JPS5129441B2 (sv) * 1971-10-08 1976-08-25
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3891438A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US4022624A (en) * 1972-11-29 1977-05-10 Fuji Photo Film Co., Ltd. Desensitizer composition
US3844994A (en) * 1973-03-12 1974-10-29 Pitney Bowes Inc Windscreen wipers lithographic ink comprising polystyrene sulfonate
US4013008A (en) * 1975-03-17 1977-03-22 Dorvin Brown Methods and solutions for improvement of offset printing
JPS5266002A (en) * 1975-11-26 1977-06-01 Fuji Photo Film Co Ltd Desensitizer for lithographic press plate
JPS5816173B2 (ja) * 1976-03-25 1983-03-30 株式会社きもと 画像形成方法

Also Published As

Publication number Publication date
EP0009031A4 (en) 1981-08-28
CH645996A5 (de) 1984-10-31
DK378679A (da) 1979-09-11
JPS56500646A (sv) 1981-05-14
DE2934897A1 (en) 1980-12-11
GB2036993A (en) 1980-07-02
SE423003B (sv) 1982-04-05
DE2934897C1 (de) 1984-09-20
EP0009031A1 (en) 1980-03-19
US4329422A (en) 1982-05-11
GB2036993B (en) 1983-03-09
EP0009031B1 (en) 1984-04-25
WO1979000593A1 (en) 1979-08-23

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