SE7807170L - Forfarande for framstellning av plantryckformar med laserstralar - Google Patents
Forfarande for framstellning av plantryckformar med laserstralarInfo
- Publication number
- SE7807170L SE7807170L SE7807170A SE7807170A SE7807170L SE 7807170 L SE7807170 L SE 7807170L SE 7807170 A SE7807170 A SE 7807170A SE 7807170 A SE7807170 A SE 7807170A SE 7807170 L SE7807170 L SE 7807170L
- Authority
- SE
- Sweden
- Prior art keywords
- procedure
- production
- laser rays
- plane printing
- printing shapes
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2728858A DE2728858C2 (de) | 1977-06-27 | 1977-06-27 | Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE7807170L true SE7807170L (sv) | 1978-12-28 |
Family
ID=6012436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE7807170A SE7807170L (sv) | 1977-06-27 | 1978-06-22 | Forfarande for framstellning av plantryckformar med laserstralar |
Country Status (16)
| Country | Link |
|---|---|
| JP (1) | JPS5412907A (xx) |
| AU (1) | AU521791B2 (xx) |
| BE (1) | BE868456A (xx) |
| BR (1) | BR7804021A (xx) |
| CA (1) | CA1103507A (xx) |
| DE (1) | DE2728858C2 (xx) |
| DK (1) | DK285578A (xx) |
| ES (1) | ES471135A2 (xx) |
| FI (1) | FI782028A (xx) |
| FR (1) | FR2396337A2 (xx) |
| GB (1) | GB1583330A (xx) |
| IT (1) | IT7850029A0 (xx) |
| NL (1) | NL7806816A (xx) |
| NO (1) | NO782198L (xx) |
| SE (1) | SE7807170L (xx) |
| ZA (1) | ZA783642B (xx) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3581115D1 (de) * | 1984-06-08 | 1991-02-07 | Fromson H A | Verfahren zur herstellung von lithographischen druckplatten und so hergestellte druckplatten. |
| DE8706120U1 (xx) * | 1987-04-28 | 1988-05-26 | Grabensee, Hans, Champigny, Fr | |
| DE3716848A1 (de) * | 1987-05-20 | 1988-12-01 | Hoechst Ag | Verfahren zur bebilderung lichtempfindlichen materials |
| US5814431A (en) | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
| JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| ES2258416B1 (es) * | 2006-05-08 | 2008-03-01 | Luminosos Regui, S.A. | Sistema de fabricacion de rotulos en relieve. |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3396020A (en) * | 1965-11-16 | 1968-08-06 | Azoplate Corp | Planographic printing plate |
| ZA6807938B (xx) * | 1967-12-04 | |||
| US3867147A (en) * | 1969-05-20 | 1975-02-18 | Hoechst Co American | Light-sensitive diazo compounds and reproduction material employing the same |
| US3664737A (en) * | 1971-03-23 | 1972-05-23 | Ibm | Printing plate recording by direct exposure |
| JPS5120922B2 (xx) * | 1971-10-07 | 1976-06-29 | ||
| JPS5015603A (xx) * | 1973-06-15 | 1975-02-19 | ||
| DE2537724C3 (de) * | 1975-08-25 | 1981-02-26 | Hoechst Ag, 6000 Frankfurt | Verwendung eines Verfahrens zum elektrochemischen Aufrauhen von Aluminium bei der Herstellung von Flachdruckplattenträgern |
| DE2547221A1 (de) * | 1975-10-22 | 1977-05-05 | Johannes Ruediger | Verfahren zum belichten von druckplatten mittels hochenergiereicher, modulierbarer waermestrahlung z.b. laser oder elektronenstrahl |
-
1977
- 1977-06-27 DE DE2728858A patent/DE2728858C2/de not_active Expired
-
1978
- 1978-05-31 GB GB24957/78A patent/GB1583330A/en not_active Expired
- 1978-06-06 AU AU36874/78A patent/AU521791B2/en not_active Expired
- 1978-06-21 JP JP7530678A patent/JPS5412907A/ja active Granted
- 1978-06-22 SE SE7807170A patent/SE7807170L/xx unknown
- 1978-06-23 CA CA306,161A patent/CA1103507A/en not_active Expired
- 1978-06-23 NO NO782198A patent/NO782198L/no unknown
- 1978-06-23 NL NL7806816A patent/NL7806816A/xx not_active Application Discontinuation
- 1978-06-26 FI FI782028A patent/FI782028A/fi not_active Application Discontinuation
- 1978-06-26 IT IT7850029A patent/IT7850029A0/it unknown
- 1978-06-26 DK DK285578A patent/DK285578A/da unknown
- 1978-06-26 ZA ZA00783642A patent/ZA783642B/xx unknown
- 1978-06-26 FR FR7818953A patent/FR2396337A2/fr active Granted
- 1978-06-26 BE BE188841A patent/BE868456A/xx not_active IP Right Cessation
- 1978-06-26 ES ES471135A patent/ES471135A2/es not_active Expired
- 1978-06-26 BR BR7804021A patent/BR7804021A/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FR2396337B2 (xx) | 1983-07-29 |
| FR2396337A2 (fr) | 1979-01-26 |
| FI782028A (fi) | 1978-12-28 |
| IT7850029A0 (it) | 1978-06-26 |
| DE2728858C2 (de) | 1986-03-13 |
| NL7806816A (nl) | 1978-12-29 |
| DE2728858A1 (de) | 1979-01-18 |
| AU521791B2 (en) | 1982-04-29 |
| JPS5412907A (en) | 1979-01-31 |
| JPH0251732B2 (xx) | 1990-11-08 |
| CA1103507A (en) | 1981-06-23 |
| NO782198L (no) | 1978-12-28 |
| AU3687478A (en) | 1979-12-13 |
| ES471135A2 (es) | 1979-01-16 |
| BE868456A (fr) | 1978-12-27 |
| DK285578A (da) | 1978-12-28 |
| BR7804021A (pt) | 1979-04-03 |
| GB1583330A (en) | 1981-01-28 |
| ZA783642B (en) | 1979-06-27 |
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