SE7705053L - Substratmaterialavlegsnande - Google Patents

Substratmaterialavlegsnande

Info

Publication number
SE7705053L
SE7705053L SE7705053A SE7705053A SE7705053L SE 7705053 L SE7705053 L SE 7705053L SE 7705053 A SE7705053 A SE 7705053A SE 7705053 A SE7705053 A SE 7705053A SE 7705053 L SE7705053 L SE 7705053L
Authority
SE
Sweden
Prior art keywords
substrate material
material removal
etching
excess
areas
Prior art date
Application number
SE7705053A
Other languages
English (en)
Swedish (sv)
Inventor
R A Geshner
J Mitchell
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of SE7705053L publication Critical patent/SE7705053L/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
SE7705053A 1976-05-10 1977-05-02 Substratmaterialavlegsnande SE7705053L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68496576A 1976-05-10 1976-05-10

Publications (1)

Publication Number Publication Date
SE7705053L true SE7705053L (sv) 1977-11-11

Family

ID=24750240

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7705053A SE7705053L (sv) 1976-05-10 1977-05-02 Substratmaterialavlegsnande

Country Status (6)

Country Link
US (1) US4105468A (Sortimente)
JP (1) JPS5310975A (Sortimente)
DE (1) DE2719902A1 (Sortimente)
GB (1) GB1530978A (Sortimente)
PL (1) PL112654B1 (Sortimente)
SE (1) SE7705053L (Sortimente)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4350564A (en) * 1980-10-27 1982-09-21 General Electric Company Method of etching metallic materials including a major percentage of chromium
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
DE3249518T1 (de) * 1982-08-23 1984-09-06 Gravure Research Institute, Inc. (n.d.Ges.d. Staates Illinois), Port Washington, N.Y. Verfahren und Vorrichtung zur Herstellung von Tiefdruckzellen in einem Tiefdruckzylinder
GB2132789A (en) * 1982-11-24 1984-07-11 Western Electric Co Method of pattern generation
US4569695A (en) * 1983-04-21 1986-02-11 Nec Corporation Method of cleaning a photo-mask
US4778532A (en) * 1985-06-24 1988-10-18 Cfm Technologies Limited Partnership Process and apparatus for treating wafers with process fluids
US4984597B1 (en) * 1984-05-21 1999-10-26 Cfmt Inc Apparatus for rinsing and drying surfaces
US4911761A (en) * 1984-05-21 1990-03-27 Cfm Technologies Research Associates Process and apparatus for drying surfaces
US4713518A (en) * 1984-06-08 1987-12-15 Semiconductor Energy Laboratory Co., Ltd. Electronic device manufacturing methods
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
DE69233293T2 (de) * 1991-10-04 2004-11-18 CFMT, Inc., Wilmington Superreinigung von komplizierten Mikroteilchen
US6039059A (en) 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
US6165649A (en) * 1997-01-21 2000-12-26 International Business Machines Corporation Methods for repair of photomasks
US6843929B1 (en) * 2000-02-28 2005-01-18 International Business Machines Corporation Accelerated etching of chromium

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3539408A (en) * 1967-08-11 1970-11-10 Western Electric Co Methods of etching chromium patterns and photolithographic masks so produced
US3673018A (en) * 1969-05-08 1972-06-27 Rca Corp Method of fabrication of photomasks
US3947801A (en) * 1975-01-23 1976-03-30 Rca Corporation Laser-trimmed resistor

Also Published As

Publication number Publication date
PL112654B1 (en) 1980-10-31
JPS5310975A (en) 1978-01-31
GB1530978A (en) 1978-11-01
PL197962A1 (pl) 1978-01-02
JPS5337707B2 (Sortimente) 1978-10-11
US4105468A (en) 1978-08-08
DE2719902A1 (de) 1977-11-24

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