SE405977B - Ljusfornetbara polymerer innehallande enheter med sidostaende substituerade 1-karbonyloxi-1h-naftalen-2-on-grupper - Google Patents

Ljusfornetbara polymerer innehallande enheter med sidostaende substituerade 1-karbonyloxi-1h-naftalen-2-on-grupper

Info

Publication number
SE405977B
SE405977B SE7501652A SE7501652A SE405977B SE 405977 B SE405977 B SE 405977B SE 7501652 A SE7501652 A SE 7501652A SE 7501652 A SE7501652 A SE 7501652A SE 405977 B SE405977 B SE 405977B
Authority
SE
Sweden
Prior art keywords
naftalene
carbonyloxy
lightness
groups
polymer containing
Prior art date
Application number
SE7501652A
Other languages
English (en)
Swedish (sv)
Other versions
SE7501652L (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
G Buhr
H Steppan
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SE7501652L publication Critical patent/SE7501652L/xx
Publication of SE405977B publication Critical patent/SE405977B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SE7501652A 1974-02-14 1975-02-14 Ljusfornetbara polymerer innehallande enheter med sidostaende substituerade 1-karbonyloxi-1h-naftalen-2-on-grupper SE405977B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2407033A DE2407033C2 (de) 1974-02-14 1974-02-14 Lichtvernetzbare Polymere und Verfahren zu ihrer Herstellung

Publications (2)

Publication Number Publication Date
SE7501652L SE7501652L (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-08-15
SE405977B true SE405977B (sv) 1979-01-15

Family

ID=5907367

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7501652A SE405977B (sv) 1974-02-14 1975-02-14 Ljusfornetbara polymerer innehallande enheter med sidostaende substituerade 1-karbonyloxi-1h-naftalen-2-on-grupper

Country Status (11)

Country Link
US (1) US3985566A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5825683B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE825574A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1047197A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2407033C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2261289B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1448431A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1031699B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL7501749A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE405977B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ZA (1) ZA75787B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3061376D1 (en) * 1979-01-30 1983-01-27 Ciba Geigy Ag Light curable polymers with side groups derived from indenon, their production and utilization
US4323701A (en) * 1980-01-23 1982-04-06 Ciba-Geigy Corporation Process for the preparation of indenonecarboxylic acids
JPS60147776U (ja) * 1984-03-12 1985-10-01 三菱重工業株式会社 防振支持装置
US5258478A (en) * 1992-04-27 1993-11-02 Florida State University Low self-absorbing, intrinsically scintillating polymers
DE59304881D1 (de) * 1992-10-15 1997-02-06 Ciba Geigy Ag Polymerisierbare photochrome Napthacendione, Polymere dieser Monomeren, Verfahren zu deren Herstellung, und deren Verwendung
US5705570A (en) * 1995-06-07 1998-01-06 International Business Machines Corporation Ablatively photodecomposable compositions
US6232362B1 (en) * 1999-05-04 2001-05-15 General Electric Company Self-sensitized epoxysilicones curable by ultraviolet light and method of synthesis therefor
US7237893B2 (en) * 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
AU2004262823A1 (en) * 2003-08-08 2005-02-17 Calhoun Vision Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
TWI501030B (zh) * 2012-06-12 2015-09-21 Cheil Ind Inc 光可固化型組成物、包含該組成物之保護層及包含該組成物之封裝裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2326736A (en) * 1940-09-21 1943-08-17 Shell Dev Polymerizing unsaturated resinophoric compounds by action of ultraviolet light in conjunction with beta substituted naphthalene derivatives
US2584773A (en) * 1949-12-12 1952-02-05 Phillips Petroleum Co Emulsion polymerization of vinylidene compounds in the presence of hydroperoxides of alkyltetrahydronaphthalenes
US2716097A (en) * 1951-09-13 1955-08-23 Eastman Kodak Co Polymers of vinyl substituted benzal acetophenones
US3429852A (en) * 1967-03-30 1969-02-25 Nat Starch Chem Corp Ethylenically unsaturated derivatives of benzophenone and crosslinkable polymers thereof
US3827960A (en) * 1973-01-12 1974-08-06 Scm Corp Process for photopolymerization with carbonylated polynuclear sulfonyl chloride sensitizers

Also Published As

Publication number Publication date
BE825574A (fr) 1975-08-14
GB1448431A (en) 1976-09-08
SE7501652L (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-08-15
US3985566A (en) 1976-10-12
JPS50117884A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-09-16
DE2407033C2 (de) 1984-07-05
ZA75787B (en) 1976-01-28
JPS5825683B2 (ja) 1983-05-28
FR2261289B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-06-08
FR2261289A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-09-12
DE2407033A1 (de) 1975-09-04
IT1031699B (it) 1979-05-10
CA1047197A (en) 1979-01-23
NL7501749A (nl) 1975-08-18

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