SE391405B - Forfarande for astadkommande av resistmonster pa ett substrat - Google Patents

Forfarande for astadkommande av resistmonster pa ett substrat

Info

Publication number
SE391405B
SE391405B SE7305532A SE7305532A SE391405B SE 391405 B SE391405 B SE 391405B SE 7305532 A SE7305532 A SE 7305532A SE 7305532 A SE7305532 A SE 7305532A SE 391405 B SE391405 B SE 391405B
Authority
SE
Sweden
Prior art keywords
monsters
resist
procedure
substrate
resistance
Prior art date
Application number
SE7305532A
Other languages
English (en)
Swedish (sv)
Inventor
M J S Bowden
E D Feit
L F Thompson
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE391405B publication Critical patent/SE391405B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Electron Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
SE7305532A 1972-05-01 1973-04-18 Forfarande for astadkommande av resistmonster pa ett substrat SE391405B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24930872A 1972-05-01 1972-05-01

Publications (1)

Publication Number Publication Date
SE391405B true SE391405B (sv) 1977-02-14

Family

ID=22942915

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7305532A SE391405B (sv) 1972-05-01 1973-04-18 Forfarande for astadkommande av resistmonster pa ett substrat

Country Status (8)

Country Link
JP (1) JPS512375B2 (OSRAM)
BE (1) BE798860A (OSRAM)
DE (1) DE2321684C3 (OSRAM)
FR (1) FR2183020B1 (OSRAM)
GB (1) GB1403834A (OSRAM)
IT (1) IT980926B (OSRAM)
NL (1) NL154015B (OSRAM)
SE (1) SE391405B (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1421805A (en) * 1972-11-13 1976-01-21 Ibm Method of forming a positive resist
US3893127A (en) * 1973-09-27 1975-07-01 Rca Corp Electron beam recording media
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
JPS59222928A (ja) * 1983-06-02 1984-12-14 Matsushita Electronics Corp マスク製作方法

Also Published As

Publication number Publication date
DE2321684B1 (de) 1974-01-31
DE2321684C3 (de) 1979-07-26
BE798860A (fr) 1973-08-16
FR2183020A1 (OSRAM) 1973-12-14
GB1403834A (en) 1975-08-28
NL154015B (nl) 1977-07-15
FR2183020B1 (OSRAM) 1976-11-12
IT980926B (it) 1974-10-10
JPS4942352A (OSRAM) 1974-04-20
DE2321684A1 (de) 1973-11-15
NL7305933A (OSRAM) 1973-11-05
JPS512375B2 (OSRAM) 1976-01-26

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