SE384599B - Omkopplings- och lagrings-halvledaranordning - Google Patents

Omkopplings- och lagrings-halvledaranordning

Info

Publication number
SE384599B
SE384599B SE7211839A SE1183972A SE384599B SE 384599 B SE384599 B SE 384599B SE 7211839 A SE7211839 A SE 7211839A SE 1183972 A SE1183972 A SE 1183972A SE 384599 B SE384599 B SE 384599B
Authority
SE
Sweden
Prior art keywords
switching
semiconductor device
storage semiconductor
storage
semiconductor
Prior art date
Application number
SE7211839A
Other languages
English (en)
Inventor
A Moser
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of SE384599B publication Critical patent/SE384599B/sv

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • H01L21/28581—Deposition of Schottky electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
    • H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table further characterised by the doping material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47—Schottky barrier electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47—Schottky barrier electrodes
    • H01L29/475—Schottky barrier electrodes on AIII-BV compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/812—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/872—Schottky diodes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/30—Resistive cell, memory material aspects
    • G11C2213/33—Material including silicon

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Static Random-Access Memory (AREA)
SE7211839A 1971-09-30 1972-09-14 Omkopplings- och lagrings-halvledaranordning SE384599B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1420171A CH539360A (de) 1971-09-30 1971-09-30 Halbleiterschalt- oder Speichervorrichtung

Publications (1)

Publication Number Publication Date
SE384599B true SE384599B (sv) 1976-05-10

Family

ID=4398777

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7211839A SE384599B (sv) 1971-09-30 1972-09-14 Omkopplings- och lagrings-halvledaranordning

Country Status (13)

Country Link
US (1) US3810128A (sv)
JP (1) JPS5619114B2 (sv)
CA (1) CA971289A (sv)
CH (1) CH539360A (sv)
DE (1) DE2235465C3 (sv)
ES (1) ES407127A1 (sv)
FR (1) FR2154538B1 (sv)
GB (1) GB1394183A (sv)
HU (1) HU165367B (sv)
IL (1) IL40282A (sv)
IT (1) IT967244B (sv)
NL (1) NL7209934A (sv)
SE (1) SE384599B (sv)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240081A (en) * 1975-09-26 1977-03-28 Hitachi Ltd Bi-polar rom
US4167791A (en) * 1978-01-25 1979-09-11 Banavar Jayanth R Non-volatile information storage arrays of cryogenic pin diodes
US4274105A (en) * 1978-12-29 1981-06-16 International Business Machines Corporation MOSFET Substrate sensitivity control
US4646427A (en) * 1984-06-28 1987-03-03 Motorola, Inc. Method of electrically adjusting the zener knee of a lateral polysilicon zener diode
US4965863A (en) * 1987-10-02 1990-10-23 Cray Computer Corporation Gallium arsenide depletion made MESFIT logic cell
US4901279A (en) * 1988-06-20 1990-02-13 International Business Machines Corporation MESFET sram with power saving current-limiting transistors
DE4412475A1 (de) * 1994-04-14 1995-10-19 Daimler Benz Ag Metall-Halbleiter-Diode und Verfahren zur Herstellung von Metall-Halbleiter-Dioden
US5825046A (en) * 1996-10-28 1998-10-20 Energy Conversion Devices, Inc. Composite memory material comprising a mixture of phase-change memory material and dielectric material
US7379317B2 (en) * 2004-12-23 2008-05-27 Spansion Llc Method of programming, reading and erasing memory-diode in a memory-diode array
US7460389B2 (en) * 2005-07-29 2008-12-02 International Business Machines Corporation Write operations for phase-change-material memory
WO2007086311A1 (en) * 2006-01-27 2007-08-02 Semiconductor Energy Laboratory Co., Ltd. Light-emitting material, light-emitting element, light-emitting device, and electronic appliance
EP1821579A3 (en) * 2006-02-17 2008-04-02 Semiconductor Energy Laboratory Co., Ltd. Light emitting element, light emitting device, and electronic appliance
US20070194321A1 (en) * 2006-02-17 2007-08-23 Semiconductor Energy Laboratory Co., Ltd. Light emitting element, light emitting device, and electronic device
US20070278947A1 (en) * 2006-06-02 2007-12-06 Semiconductor Energy Laboratory Co., Ltd. Light-emitting element, manufacturing method thereof, light-emitting device, and electronic device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3461356A (en) * 1965-08-19 1969-08-12 Matsushita Electric Ind Co Ltd Negative resistance semiconductor device having an intrinsic region
CA813537A (en) * 1967-10-17 1969-05-20 Joseph H. Scott, Jr. Semiconductor memory device
CH506188A (de) * 1970-09-02 1971-04-15 Ibm Feldeffekt-Transistor

Also Published As

Publication number Publication date
DE2235465A1 (de) 1973-04-19
US3810128A (en) 1974-05-07
DE2235465B2 (de) 1977-02-10
IT967244B (it) 1974-02-28
IL40282A (en) 1974-12-31
DE2235465C3 (de) 1981-04-02
JPS5619114B2 (sv) 1981-05-06
ES407127A1 (es) 1975-10-16
CA971289A (en) 1975-07-15
IL40282A0 (en) 1972-11-28
FR2154538A1 (sv) 1973-05-11
NL7209934A (sv) 1973-04-03
GB1394183A (en) 1975-05-14
FR2154538B1 (sv) 1976-08-13
JPS4843589A (sv) 1973-06-23
CH539360A (de) 1973-07-15
HU165367B (sv) 1974-08-28

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