SE369972B - - Google Patents

Info

Publication number
SE369972B
SE369972B SE06593/71A SE659371A SE369972B SE 369972 B SE369972 B SE 369972B SE 06593/71 A SE06593/71 A SE 06593/71A SE 659371 A SE659371 A SE 659371A SE 369972 B SE369972 B SE 369972B
Authority
SE
Sweden
Application number
SE06593/71A
Inventor
E Golda
A Taudien
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of SE369972B publication Critical patent/SE369972B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
SE06593/71A 1970-05-21 1971-05-21 SE369972B (2)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3957270A 1970-05-21 1970-05-21

Publications (1)

Publication Number Publication Date
SE369972B true SE369972B (2) 1974-09-23

Family

ID=21906180

Family Applications (1)

Application Number Title Priority Date Filing Date
SE06593/71A SE369972B (2) 1970-05-21 1971-05-21

Country Status (7)

Country Link
US (1) US3669660A (2)
JP (1) JPS5133001B1 (2)
CA (1) CA956829A (2)
DE (1) DE2124672A1 (2)
FR (1) FR2093585A5 (2)
NL (1) NL168058C (2)
SE (1) SE369972B (2)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5539825B2 (2) * 1972-05-12 1980-10-14
DE2353992C2 (de) * 1972-11-02 1982-12-02 Polychrome Corp., 10702 Yonkers, N.Y. Wäßriger Eintwickler für Flachdruckplatten und dessen Verwendung
JPS5119536A (en) * 1974-08-09 1976-02-16 Bunshodo Co Ltd Jiazofukushaniokeru aminkeigenzoeki
US3954472A (en) * 1974-08-26 1976-05-04 S. O. Litho Corporation Substractive developer for negative working lithographic plates
US4230492A (en) * 1978-01-17 1980-10-28 The Richardson Company Aryl sulfonic acid based stabilizers for presensitized planographic plates
WO1979000593A1 (en) * 1978-02-06 1979-08-23 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
US4414315A (en) * 1979-08-06 1983-11-08 Howard A. Fromson Process for making lithographic printing plate
NZ194648A (en) * 1979-08-20 1982-12-07 Vickers Ltd Producing lithographic printing plate from radiation sensitive plate plate finishing composition
US4391897A (en) * 1979-10-12 1983-07-05 Howard A. Fromson Diazo lithographic printing plate developing process
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4374920A (en) * 1981-07-27 1983-02-22 American Hoechst Corporation Positive developer containing non-ionic surfactants
JPS5864447U (ja) * 1981-10-26 1983-04-30 大日本印刷株式会社 洗浄装置
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US4692397A (en) * 1985-11-27 1987-09-08 American Hoechst Corporation Process for developing an aqueous alkaline development diazo photographic element
CA1305296C (en) * 1986-07-02 1992-07-21 Robert Bassemir Fountain solutions
US5081003A (en) * 1987-07-27 1992-01-14 Hoechst Celanese Corporation Developer compositions for newspaper plates
US5035982A (en) * 1989-07-14 1991-07-30 Eastman Kodak Company Aqueous developer composition for developing negative working lithographic printing plate
US5213950A (en) * 1991-01-30 1993-05-25 Sun Chemical Corporation Pre-bake printing plate composition
USH1299H (en) 1991-03-25 1994-04-05 Ppg Industries, Inc. Acid paint remover
US5955242A (en) * 1996-09-23 1999-09-21 International Business Machines Corporation High sensitivity, photo-active polymer and developers for high resolution resist applications

Also Published As

Publication number Publication date
JPS5133001B1 (2) 1976-09-17
CA956829A (en) 1974-10-29
NL168058C (nl) 1982-02-16
NL168058B (nl) 1981-09-16
FR2093585A5 (2) 1972-01-28
US3669660A (en) 1972-06-13
NL7107010A (2) 1971-11-23
DE2124672A1 (de) 1971-12-02

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